An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

Provided are an X-ray generator capable of easily measuring a beam size of an electron beam on an electron target, and an adjustment method therefor. The X-ray generator includes an electron target including a first metal, a second metal different from the first metal, and a third metal different from the second metal, which are sequentially arranged side by side along a first direction in a continuous manner.

Provided is an anode for an X-ray generating tube, which reduces a drop in the quality of an emitted X-ray due to the history of X-ray emitting operation. A target layer is formed on the inside of the edge of a support substrate. An end portion of an extended portion of a joining member, which protrudes over a support surface of the support substrate, is covered with a conductive member higher in melting point than the joining member. The conductive member is electrically connected to the target layer, thereby electrically connecting the joining member to the target layer.

The disclosed technology relates to an X-ray conversion target. In one aspect, the X-ray conversion target includes target body and a target part arranged within the target body, the target part having a first face configured to produce X-rays. The X-ray conversion target further comprises a cooling passage having a side wall, at least a part of the side wall being consisted of a portion of the target part.

An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

According to some aspects, a monochromatic x-ray source is provided. The monochromatic x-ray source comprises an electron source configured to generate electrons, a primary target arranged to receive electrons from the electron source to produce broadband x-ray radiation in response to electrons impinging on the primary target, and a secondary target comprising at least one layer of material capable of producing monochromatic x-ray radiation in response to incident broadband x-ray radiation emitted by the primary target.

An X-ray target assembly includes a cylindrical base and a cylindrical multilayered X-ray target that includes at least a heat transfer layer, an X-ray source layer and an adhesion layer provided between the heat transfer layer and the X-ray source layer, wherein the X-ray target is oriented such that the heat transfer layer is closest to the base, wherein the X-ray target is placed on top of a cylindrical carrying element, wherein the in-plane coefficient of thermal expansion of each of the heat transfer layer, the X-ray source layer, the adhesion layer and of the material of the carrying element is different, wherein the in-plane coefficient of thermal expansion of the heat transfer layer is the lowest and that of the material of the carrying element the highest.

An energy converter unit and X-ray source system are presented. The energy converter unit comprises a multilayered crystal structure having a selected layers' arrangement comprising at least first and second of layers of at least first and second material compositions. The layers-arrangement is formed of a pattern of n1 layers of said first layer type and n2 layers of said second layer type generating a selected lattice periodicity of said layers. The lattice periodicity is selected such that said multilayered crystal structure responds to the charged particle beam of predetermined parameters by coherent emission of X-ray radiation having selected spectral content and emission direction.

The present disclosure relates to multi-layer X-ray sources having decreased hydrogen within the layer stack and/or tungsten carbide inter-layers between the primary layers of X-ray generating and thermally-conductive materials. The resulting multi-layer target structures allow increased X-ray production, which may facilitate faster scan times for inspection or examination procedures.

An X-ray generation device which can be efficiently used is provided. The X-ray generation device has an electron gun, a target unit, a tubular portion, a reflected electron detector, and a coil unit. The target unit includes a plurality of targets and a plurality of mark portions having a predetermined relationship with the targets, wherein each mark portion having a surface area larger than a surface area of the target when said target unit is viewed from a direction which is normal to principal faces of the target unit.