The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.

System and method for imaging an integrated circuit (IC). The imaging system comprises an x-ray source including a plurality of spatially and temporally addressable electron sources, an x-ray detector arranged such that incident x-rays are oriented normal to an incident surface of the x-ray detector and a three-axis stage arranged between the x-ray source and the x-ray detector, the three-axis stage configured to have mounted thereon an integrated circuit through which x-rays generated by the x-ray source pass during operation of the imaging system. The imaging system further comprises at least one controller configured to move the three-axis stage during operation of the imaging system and selectively activate a subset of the electron sources during movement of the three-axis stage to acquire a set of intensity data by the x-ray detector as the three-axis stage moves along a three-dimensional trajectory.

Among other things, one or more techniques and/or systems for calibration of a radiation system to compute a gain correction(s) are provided. A calibration procedure is performed during which a portion of the detector array is shadowed by an object, causing the detector array to be non-uniformly exposed to radiation. A portion of a projection generated from the calibration procedure and indicative of radiation that did not traverse the object is separated from a portion of the projection indicative of radiation that did traverse the object, and a gain correction(s) is computed from the portion of the projection indicative of radiation that did not traverse the object (e.g., and is thus indicative of radiation that merely traversed air).

An x-ray device is presented. The x-ray device includes a cathode configured to emit an electron beam. Also, the x-ray device includes an anode configured to rotate about a longitudinal axis of the x-ray device and positioned to receive the emitted electron beam, where the anode includes a target element disposed on an anode surface of the anode and a track element embedded in the target element, where the track element is configured to generate x-rays in response to the emitted electron beam impinging on a focal spot on the track element, where at least a portion of the track element is configured to transition from a first phase to a second phase based on heat generated in at least a portion of the track element, and where at least the portion of the track element is configured to distribute the generated heat across the anode.

An X-ray generating apparatus and an imaging device. The X-ray generating apparatus includes: a casing; a heat-conduction member, the heat-conduction member being arranged to run through the casing, and a through-channel being provided in the interior of the heat-conduction member, the through-channel being configured to circulate a cooling medium; an anode target, the anode target being configured to receive electron bombardment in order to generate X-rays, and the anode target is arranged in the casing and surrounding the heat-conduction member in a rotatable fashion. The imaging device includes a cooling system and an X-ray generating apparatus. The cooling system is in communication with two ends of the heat-conduction member, and the cooling system is configured to convey a cooling medium into the heat-conduction member.

An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

A target assembly for generating radiation may comprise a target, a substrate and a window. The target may be capable of generating first radiation when impinged by a beam. The window may be at least partially permeable to the beam. The window and the substrate may form at least part of a hermetically sealed chamber and the target may be positioned in the chamber. The chamber may be filled with air having a normal or reduced content of oxygen.

A liquid metal or spiral groove bearing structure for an x-ray tube and associated process for manufacturing the bearing structure is provided that includes a bearing shaft rotatably disposed in a bearing housing or shell. The shell includes a thrust seal engaged with a sleeve to maintain co-axiality for the rotating liquid metal seal formed in the shell about the shaft. The shaft has a bore for the introduction of a cooling fluid into the bearing assembly in which is disposed a cooling tube. The cooling tube includes turbulence-inducing features to increase the turbulence of the cooling fluid flowing through the cooling tube, consequently enhancing the heat exchange between the cooling fluid and the shaft. This maximizes the heat transfer from the shaft to the oil, allowing materials with lower thermal conductivities, such as non-refractory materials, to be used to form the bearing shaft and shell.

An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be the same or different material, and may be embedded or placed atop a substrate formed of a heat-conducting material. The x-ray source may emit x-rays towards an optic system, which can include one or more optics that are matched to one or more target microstructures. The matching can be achieved by selecting optics with the geometric shape, size, and surface coating that collects as many x-rays as possible from the source and at an angle that satisfies the critical reflection angle of the x-ray energies of interest from the target. The x-ray illumination beam system allows for an x-ray source that generates x-rays having different spectra and can be used in a variety of applications.

An x-ray source has a target assembly including a target, an electron source for generating electrons to impact the target, and a flight tube assembly separating the target assembly from the electron source and transporting a coolant to the target assembly. The flight tube assembly includes a flight tube interface ring, a target cartridge tube, and an electrical isolation ring between the flight tube interface ring and the target cartridge tube.