The vibration control system configured to control vibration of a vibration-controlled object is disclosed. The vibration control system comprises: (i) actuator units each including a piezoelectric element configured to expand and contract; (ii) a drive power source configured to supply drive voltages to the piezoelectric elements of the actuator units for causing the piezoelectric elements to expand and contract; (iii) a vibration detector configured to detect a status of vibration of the vibration-controlled object; and (iv) a vibration controller configured to control the vibration of the vibration-controlled object by controlling the voltages supplied by the drive power source to the piezoelectric elements of the actuator units based on the status of vibration detected by the vibration detector, respectively.

These electron beam separator designs address thermally-induced beam drift in an electron-optical system. A heater coil wrapped around the beam separator unit can maintain constant power. Additional coils also can be wrapped around the beam separator in a bifilar manner, which can maintain constant power in the beam separator coils. Wien power can be determined, and then heater coil current can be determined.

Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: a support body for supporting the radiation projection system; electrical wiring for supplying voltages to components within the radiation projection system and/or for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system; optical fibers, for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system, and a cooling arrangement comprising one or more fluid conduits for cooling the radiation projection system; the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.

In this invention, vibrations generated by a freezer from a cooling mechanism for cooling an ion source emitter tip are prevented from being transmitted to the emitter tip as much as possible, while the cooling capability of the cooling mechanism is improved widely. The ion beam device (10) is equipped with: an ion source housing (22) provided with an emitter tip (45) and defining an ion source chamber (27) supplied with an ionization gas or gas molecules; a gas pot (51) provided in the ion source chamber (27) so as to be thermally connected to the emitter tip (45) and accommodated so as to have no direct physical contact with a cooling stage (57) of a freezer (52); and a spacer (59) provided on the peripheral surface of the cooling stage (57) housed by the gas pot (51) and maintaining a given interval or greater between the peripheral surface of the cooling stage (57) and the internal peripheral surface of the gas pot (52).

The vibration-suppressing mechanism includes: a first arcuate member that has an inner wall surface shaped along an outer wall of a column of a charged particle beam device; a second arcuate member that has an inner wall surface shaped along an outer wall of a column of the charged particle beam device and is connected to the first arcuate member to form an annular member surrounding the outer wall of the column of the charged particle beam device; a fastening member fastening both the first arcuate member and the second arcuate member together; a vibration sensor attached to the arcuate member; and an actuator that operates in response to an output of the vibration sensor, and can be detached by releasing connection obtained by a connecting member.

A cryotransfer holder for mounting a specimen held at cryogenic temperature in an electron microscope is described. The holder includes a cylindrical dewar configured to maintain a constant center of mass about the holder axis regardless of orientation of the dewar. The holder further includes a sample shutter control mechanism that can be decoupled from the shutter to reduce vibration during imaging. There is also described a workstation for mounting specimens into the cryotransfer holder at cryogenic temperature. The workstation allows rotation about the cryotransfer holder axis to improve access to the sample placement area on the holder and to facilitate easy removal and retrieval of the sample after imaging.

An object of the present invention is to provide a charged particle beam device capable of correcting an image drift caused by stage deformation or the like during imaging immediately after stage movement. In order to achieve the above object, proposed is a charged particle beam device including: a sample chamber; a sample stage arranged in the sample chamber; a charged particle beam source which releases a charged particle beam; a deflector which deflects the charged particle beam released from the charged particle beam source; a focusing lens which focuses the charged particle beam; and a control device that controls the sample stage and the deflector, in which the control device calculates a deflection signal to be supplied to the deflector based on a thrust information when driving of the sample stage and a coefficient assigned for each position of the sample stage.

In a side entry type sample holder, vibrations in the radial direction of the sample holder provoke a resolving power decrease in the measurement results. In the present invention, the side entry type sample holder has a stepped portion in the radial direction of an axial portion. The sample stage has a support part contacting the stepped portion in a cylindrical portion capable of moving as one body in the axis direction of the sample holder, and, through the contact between the stepped portion and the support part, a frictional force is generated, opposing the radial direction of the axial portion in the sample holder. In this manner, the vibrations in the radial direction of the sample holder are suppressed, and the resolving power decrease in the measurement results is suppressed.

An exposure apparatus is equipped with: an irradiation device that irradiates a target with an electron beam; a stage that holds the target; a stage driving system that includes an electromagnetic motor to drive the stage; and a control system that controls the stage driving system on the basis of an irradiation state of the electron beam on the target. The control system changes the control content with respect to the stage driving system between the irradiation time and the non-irradiation time of the electron beam on the target. Accordingly, it becomes possible to use the electromagnetic motor as a drive source of the stage and also to suppress the irradiation position displacement of the electron beam on the target at the time of driving of the stage.

Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.