In one embodiment, a multi charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a shaping aperture array member having a plurality of first apertures, and allowing the charged particle beam to pass through the first apertures to form multiple beams, an X-ray shielding plate having a plurality of second apertures through each of which a corresponding one of the multiple beams that have passed through the first apertures passes, and a blanking aperture array member having a plurality of third apertures through each of which a corresponding one of the multiple beams that have passed through the first apertures and the second apertures passes, the blanking aperture array member including a blanker performing blanking deflection on the corresponding beam. The X-ray shielding plate blocks X-rays produced by irradiation of the shaping aperture array member with the charged particle beam.

An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

The invention relates to a method for generating an image of an object (114) using a particle beam device (100) generating a beam of charged particles. Moreover, the invention relates to a particle beam device (100) for carrying out this method. In particular, the particle beam device (100) is an electron beam device and/or an ion beam device. The method comprises selecting a desired value of a depth of field from a plurality of values of the depth of field by a user, wherein each value of the plurality of values of the depth of field is associated with a specific resolution of the particle beam device (100), the specific resolution being achieved when using the desired value of the depth of field. Moreover, the method comprises adjusting the depth of field to the desired value of the depth of field by controlling at least one of: (i) a condenser lens (105, 106), (ii) a relative position of the object (114) to an objective lens (107) and (iii) a position of an aperture unit (108, 109) and/or a size of an aperture unit opening (108A, 118), and imaging the object (114) with the desired value of the depth of field and with the specific resolution associated with the value of the depth of field.

Embodiments of methods and/or apparatus for a radiographic imaging can include a plurality of x-ray sources disposed in a curve and a detector configured to revolve relative thereto. In one embodiment, a CBCT imaging method and/or apparatus can include performing a first scan at a first speed using stationary angularly distributed x-ray sources to acquire first CBCT projection data that impinge a detector of a first field of view (FOV), identifying an area of interest within the first FOV, and performing a second scan at a second speed using the x-ray sources acquire second CBCT projection data that impinge a portion of the detector of a second smaller FOV including the area of interest within the first FOV using second emissions by the x-ray sources, where the second speed is greater than the first speed.

The present invention relates to adjustment of a mask position by driving an R-axis of an electron microscope in order to adjust the mask position with high accuracy while performing observation by the electron microscope without providing a heat generation source inside the electron microscope. The R-axis originally exists in a sample chamber of the electron microscope, which enables control with high accuracy. The R-axis driving of a sample stage can be substituted by raster rotation, therefore, the mask position can be adjusted with high accuracy while performing observation by the electron microscope according to the present invention.

To realize a focused-ion-beam machining apparatus capable of machining a thin sample with a wide area and a uniform film thickness and a needle-like sample with a sharp tip, in a focused-ion-beam machining apparatus including: an ion source (1); an electronic lens (3) focusing an ion beam extracted from the ion source (1) and irradiating the ion beam to a sample (5); and a sample holder (13) holding the sample (5), the sample holder (13) is provided with a shield electrode (7) arranged in a manner such as to cover the sample (5), and the sample (5) and the shield electrode (7) are insulated from each other in a manner such that voltages can be applied to them separately from each other.

The invention comprises an alignment guide apparatus and a method of use thereof for aligning an imaging beam, longitudinally passing through an exit nozzle of an imaging system, to an imaging zone of a sample, includes the steps of: (1) providing an alignment guide, the alignment guide comprising: (a) a guide wall at least partially circumferentially enclosing an aperture, (b) a first laser element connected to the guide wall, and (c) a second laser element connected to the guide wall; (2) inserting the exit nozzle of the imaging system into the aperture; (3) projecting a first line from the first laser element onto the sample; (4) projecting a second line from the second laser element onto the sample; and (5) moving the sample relative to the exit nozzle of the imaging system to position an intersection of the first line and the second line at the imaging zone to align the imaging beam to the imaging zone.

Provided is a technology for suppressing a heat rise in a sample, the heat rise being generated due to ion beam irradiation at a low acceleration voltage. A blocking plate, which is different from a mask, is disposed in front of a sample. The blocking plate has an opening that overlaps a processing surface, and ion beams pass only through the opening of the blocking plate, and in the areas excluding the opening, the ion beams are blocked by the blocking plate, and the sample is not irradiated thereby. Furthermore, the heat rise in the sample is further suppressed by cooling the blocking plate.

Provided is a technology for suppressing a heat rise in a sample, the heat rise being generated due to ion beam irradiation at a low acceleration voltage. A blocking plate, which is different from a mask, is disposed in front of a sample. The blocking plate has an opening that overlaps a processing surface, and ion beams pass only through the opening of the blocking plate, and in the areas excluding the opening, the ion beams are blocked by the blocking plate, and the sample is not irradiated thereby. Furthermore, the heat rise in the sample is further suppressed by cooling the blocking plate.

The present disclosure relates to a collimator. The collimator may include a motor, a transmission unit having a first end and a second end, and a leaf unit having a leaf. The first end of the transmission unit may be connected to the motor and the second end of the transmission unit may be connected to the leaf. The present disclosure also relates to a collimator system. The collimator system may include a leaf module having a leaf, a driving module having a motor configured to drive the leaf, and a processing module to generate a movement profile of the leaf. The movement profile of the leaf may include a first speed during a first stage, a second speed of the leaf during a second stage, and a third speed of the leaf during a third stage.