A supply unit for driving an electrode of a charged particle beam column, the supply unit includes a first amplifier and a second amplifier that are configured to receive an input signal, an output of the first amplifier is coupled, via the first resistor, to a signal line of the coaxial cable, an output of the second amplifier is coupled, via the second resistor, to a main shield of the coaxial cable, one port of the first amplifier and one port of the second amplifier are coupled to a power supply return port. The signal line is configured to provide a first driving signal to an that is coupled between the signal line and the power supply return port.

Systems and methods of observing a sample in a multi-beam apparatus are disclosed. A multi-beam apparatus may comprise an array of deflectors configured to steer individual beamlets of multiple beamlets, each deflector of the array of deflectors having a corresponding driver configured to receive a signal for steering a corresponding individual beamlet. The apparatus may further include a controller having circuitry to acquire profile data of a sample and to control each deflector by providing the signal to the corresponding driver based on the acquired profile data, and a steering circuitry comprising the corresponding driver configured to generate a driving signal, a corresponding compensator configured to receive the driving signal and a set of driving signals from other adjacent drivers associated with adjacent deflectors and to generate a compensation signal to compensate a corresponding deflector based on the driving signal and the set of driving signals.

The invention provides an electron-impact ion source device having high brightness as compared to known Nier-type ion sources, while providing similar advantages in terms of flexibility of the generated ion species, for example. The ionization chamber of the device operates at high pressures and provides for a large number of interactions between the electron beam and the gas molecules.

The present disclosure relates a multi-leaf collimator. The multi-leaf collimator may include a plurality of leaves. At least two leaves of the plurality of leaves may be movable parallel to each another. For each leaf of at least some of the plurality of leaves, at least one portion of the leaf may have thicknesses varying along a longitudinal direction of the each leaf. The each leaf may have a first end and a second end along the longitudinal direction of the each leaf.

A control unit for controlling a deflector in an imaging apparatus. The imaging apparatus includes an electron gun arranged to provide electron beam to scan a specimen, and the deflector. The deflector is arranged to move the electron beam in a first scanning direction and a second scanning direction that are in the same plane for scanning the specimen. The control unit is configured to determine the first scanning direction and the second scanning direction, and process the determined first scanning direction and the determined second scanning direction based on predetermined equations. The control unit is further configured to provide, based on the processing, a control signal to the deflector to adjust one or both of the first scanning direction and the second scanning direction such that they become substantially orthogonal.

A control unit for controlling a deflector in an imaging apparatus. The imaging apparatus includes an electron gun arranged to provide electron beam to scan a specimen, and the deflector. The deflector is arranged to move the electron beam in a first scanning direction and a second scanning direction that are in the same plane for scanning the specimen. The control unit is configured to determine the first scanning direction and the second scanning direction, and process the determined first scanning direction and the determined second scanning direction based on predetermined equations. The control unit is further configured to provide, based on the processing, a control signal to the deflector to adjust one or both of the first scanning direction and the second scanning direction such that they become substantially orthogonal.

With strength of an objective lens set to first strength, a first scanned image of a sample is produced. The strength of the objective lens is set to second strength. A rotation amount difference of a charged particle beam between the case where the strength is set to the first strength and the case where the strength is set to the second strength is specified. At the second strength, with a scanner controlled such that the rotation for canceling the rotation amount difference is supplied to the charged particle beam, a second scanned image of the sample is produced. Based on a relative positional relationship between the first and second scanned images, a deflector is controlled such that positions of the first and second scanned images coincide with each other.

An electromagnetic mechanical pulser implements a transverse wave metallic comb stripline TWMCS kicker having inwardly opposing teeth that retards a phase velocity of an RF traveling wave to match the kinetic velocity of a continuous electron beam, causing the beam to oscillate before being chopped into pulses by an aperture. The RF phase velocity is substantially independent of RF frequency and amplitude, thereby enabling independent tuning of the electron pulse widths and repetition rate. The TWMCS further comprises an electron pulse picker (EPP) that applies a pulsed transverse electric field across the TWMCS to deflect electrons out of the beam, allowing only selected electrons and/or groups of electrons to pass through. The EPP pulses can be synchronized with the RF traveling wave and/or with a pumping trigger of a transverse electron microscope (TEM), for example to obtain dynamic TEM images in real time.

The present invention relates to a deflection scanning device with a multi-phase winding and a deflection scanning system. The deflection scanning device is of an axisymmetric structure, and comprises a ferromagnetic frame and a deflection scanning winding, wherein the inner side of the ferromagnetic frame is longitudinally provided with 2aw wire slots equally distributed along the circumference; and the deflection scanning winding comprises a w-phase winding, wherein the axis of the each phase winding is symmetrically distributed. The deflection scanning system comprises a deflection scanning device, a drive power supply unit and, a central, control unit. The deflection scanning device of the present invention can improve the uniformity of the magnetic induction intensity in the charged particle beam channel, and then reduce the defocusing effect and improve the scanning accuracy.

An electromagnetic mechanical pulser implements a transverse wave metallic comb stripline TWMCS kicker having inwardly opposing teeth that retards a phase velocity of an RF traveling wave to match the kinetic velocity of a continuous electron beam, causing the beam to oscillate before being chopped into pulses by an aperture. The RF phase velocity is substantially independent of RF frequency and amplitude, thereby enabling independent tuning of the electron pulse widths and repetition rate. The TWMCS further comprises an electron pulse picker (EPP) that applies a pulsed transverse electric field across the TWMCS to deflect electrons out of the beam, allowing only selected electrons and/or groups of electrons to pass through. The EPP pulses can be synchronized with the RF traveling wave and/or with a pumping trigger of a transverse electron microscope (TEM), for example to obtain dynamic TEM images in real time.