H01J2237/201

APPARATUS AND METHODS FOR ULTRAMICROTOME SPECIMEN PREPARATION

A plurality of accessory components for use in respective reel to reel sectioning, serial sectioning, and array tomography sectioning described herein incorporate mechanical and electro-mechanical engineering to provide accessory tools for attachment to and use with a microtome, as shown in several of the figures of this disclosure.

Sample plate holder
11404239 · 2022-08-02 · ·

A first spring array and a second spring array are provided in a holder body. Three sample plates can be mounted in the holder body. On each sample plate, pressing-up forces from the first spring array and the second spring array are applied, but upward movement of each sample plate is restricted by an inner surface of a cover.

Load Lock Device Having Optical Measuring Device for Acquiring Distance
20220285195 · 2022-09-08 ·

The present disclosure provides a substrate processing apparatus including at least one input/output chamber. The load lock device includes a base, a guide rail, a platform and an optical measuring module. The guide rail is connected to the base. The platform, carrying a cassette for holding a batch of spaced substrates, is movably disposed on the guide rail. The optical measuring module is configured to acquire an actual moving distance traveled by the platform along the guide rail based on at least one optical signal reflected from the platform.

RAPID AND AUTOMATIC VIRUS IMAGING AND ANALYSIS SYSTEM AS WELL AS METHODS THEREOF

A rapid and automatic virus imaging and analysis system includes (i) electron optical sub-systems (EOSs), each of which has a large field of view (FOV) and is capable of instant magnification switching for rapidly scanning a virus sample; (ii) sample management sub-systems (SMSs), each of which automatically loads virus samples into one of the EOSs for virus sample scanning and then unloads the virus samples from the EOS after the virus sample scanning is completed; (iii) virus detection and classification sub-systems (VDCSs), each of which automatically detects and classifies a virus based on images from the EOS virus sample scanning; and (iv) a cloud-based collaboration sub-system for analyzing the virus sample scanning images, storing images from the EOS virus sample scanning, and storing and analyzing machine data associated with the EOSs, the SMSs, and the VDCSs.

Sample holder for electron microscopy
11295929 · 2022-04-05 ·

A sample holder tip for use in transmission electron microscopy (TEM) or scanning electron microscopy (SEM) for performing in-situ experiments is described which facilitates in situ analysis of air-sensitive samples and allows physical manipulation of the sample. This includes, but is not limited to translation, rotation, electrical biasing, and heating/cooling for one or more individual cradles. The sample holder tip incorporates a compact design which eases sample loading and enables direct linkages between consecutive cradles, allowing a single tilt actuator to rotate each cradle around its respective eucentric position. Each of the connecting wires incorporates one or more bends or kinks which enable conductive access to the sample holder tip while also preserving the ability to also retract/extend the tip and tilt individual cradles with at least two degrees of freedom.

Substrate joining method, substrate joining system and method for controlling hydrophilic treatment device

The substrate joining method is a substrate joining method for joying two substrates, including a hydrophilic treatment step of hydrophilizing at least one of respective joint surfaces of the two substrates that are to be joined to each other and a joining step of joining the two substrates after the hydrophilic treatment step. The hydrophilic treatment step includes a step of performing a N.sub.2 RIE treatment to perform reactive ion etching using N.sub.2 gas on the joint surfaces of the substrates and a step of performing a N.sub.2 radical treatment to irradiate the joint surfaces of the substrates with N.sub.2 radicals after the step of performing the N.sub.2 RIE treatment.

SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS
20230395358 · 2023-12-07 ·

A semiconductor substrate processing apparatus includes a chamber dimensioned to accommodate a plurality of strip magazines, each strip magazine configured to receive a plurality of substrates therein, a plasma generator coupled to the chamber and configured to generate plasma used to remove foreign substances on the substrates in the chamber, and a rotation support mechanism configured to rotate the plurality of strip magazines within the chamber. Each of the strip magazines includes first and second side wall plates, an upper plate and a lower plate, and a plurality of guides on inner sides of the first and second side wall plates to support the substrates. The rotation support mechanism includes: a shaft, a motor configured to rotate the shaft, and a plurality of support frames fixed to side surfaces of the shaft and configured to fixedly support the strip magazines.

Ultrathin atomic layer deposition film accuracy thickness control

Methods for depositing films by atomic layer deposition using cyclic siloxane precursors are provided. Methods involve exposing the substrate to a cyclic siloxane precursor during operation of an atomic layer deposition cycle to form silicon oxide.

DEVICE AND METHOD FOR SUBSTRATE TRANSPORT IN VACUUM PROCESSING SYSTEMS
20230402266 · 2023-12-14 ·

Disclosed herein are devices, systems, and methods for transporting a substrate for vacuum processing. The transport may be provided by a substrate carrying device that includes a support area by which a substrate carrier may be moveably supported. The substrate carrying device includes a plurality of electrodes that are galvanically separated from one another. The substrate carrying device includes a plurality of substrate carrying regions arranged consecutively in series with respect to one another, each substrate carrying region including an electrode of the plurality of electrodes and also including a substrate receiving device configured to receive a substrate placed in the substrate carrying region, preferably in physical contact with the electrode.

PLASMA PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
20230402256 · 2023-12-14 ·

With respect to a plasma processing method of depositing a nitride film on a substrate by using plasma, the plasma processing method includes (a) supplying a plasma processing gas that includes a nitrogen-containing gas to a plasma processing space inside a processing container, and (b) supplying high-frequency power from a high-frequency power supply to an antenna disposed on a quartz portion exposed to the plasma processing space to generate the plasma in the plasma processing space at a time of performing (a). (b) includes supplying a pulse wave of the high-frequency power to the antenna. The pulse wave repeats on and off.