Systems and methods are provided for dynamically compensating position errors of a sample. The system can comprise one or more sensing units configured to generate a signal based on a position of a sample and a controller. The controller can be configured to determine the position of the sample based on the signal and in response to the determined position, provide information associated with the determined position for control of one of a first handling unit in a first chamber, a second handling unit in a second chamber, and a beam location unit in the second chamber.

An automated grid handling apparatus for an electron microscope including a transport module having a multistage shuttle comprising a first shuttle stage having a single degree of freedom of motion and a second shuttle stage having a single degree of freedom of motion independent of the first stage, an end effector connected to at least one of the first and second shuttle stages, the end effector configured to hold a grid carrier and transport the grid carrier into and out of an electron microscope through a transport interface that communicates with a multi-axis positioning stage port of the microscope, the end effector having a range of motion defined by the first and second stage degrees of freedom of motions and the multi-axis positioning stage internal to the electron microscope, and an automated loading module connected to the frame and communicating with the transport module, the automated loading module including a load port module through which grids are loaded into the automated loading and transport modules.

A paint hardening device is a device for hardening paint applied to a workpiece and includes an electron beam emission portion configured to emit an electron beam to harden the paint, and a storage chamber in which the electron beam emission portion is accommodated. The paint hardening device is configured to move the workpiece and the electron beam emission portion relative to each other while the electron beam is being applied to the paint from the electron beam emission portion in a state where an inert gas atmosphere is formed at least in an electron-beam passing region where the electron beam passes in the storage chamber, the electron beam being applied to the paint from the electron beam emission portion.

The present invention is in the field of a cryo transfer system for use in microscopy, and a microscope comprising said system. The present invention is in the field of microscopy, specifically in the field of electron and focused ion beam microscopy (EM and FIB), and in particular Transmission Electron Microscopy (TEM). However its application is extendable in principle to any field of microscopy, especially wherein a specimen (or sample) is cooled or needs cooling.

The present invention discloses an ion beam lithography method based on an ion beam lithography system. The ion beam lithography system includes a roll-roll printer placed in a vacuum, and a medium-high-energy wide-range ion source, a medium-low-energy wide-range ion source and a low-energy ion source installed on the roll-roll printer. The ion beam lithography method includes: first coating a polyimide (PI) substrate with a dry film, etching the dry film according to a preset circuit pattern, then using the ion beam lithography system to deposit a wide-energy-range metal ion on the circuit pattern to form a film substrate, and finally stripping the dry film off the film substrate to obtain a printed circuit board (PCB).

A portable vacuum antioxidant bag installed in an electron microscope to prevent oxidation of a sample includes a magnet fixing part formed by attaching a flexible magnet to an opening of the portable vacuum antioxidant bag, a gas inlet and a gas outlet formed on two sides of the portable vacuum antioxidant bag, the gas inlet through which gas is injected into the portable vacuum antioxidant bag, and the gas outlet through which air exits the portable vacuum antioxidant bag by the injected gas, and a pair of gloves formed in a shape of hands toward an inside of the portable vacuum antioxidant bag, wherein the portable vacuum antioxidant bag is tightly contact with the electron microscope due to the magnetic force by the magnet fixing part.

In accordance with various embodiments, a coating arrangement may comprise: an electron beam gun for providing an electron beam; a beam trap for trapping the electron beam; a control device for driving the electron beam gun and/or the beam trap, wherein the control device is configured to switch over the driving between a plurality of configurations, of which: in a first configuration, the electron beam is directed onto the beam trap; and in a second configuration, the electron beam is directed past the beam trap.

A scanning electron microscope. The scanning electron microscope may include a sliding vacuum seal between the electron optical imaging system and the sample carrier with a first plate having a first aperture associated with the electron optical imaging system and resting against a second plate having a second aperture associated with the sample carrier. The first plate and/or the second plate includes a groove circumscribing the first and/or second aperture. The scanning electron microscope may include a detector movable relative to the electron beam. The scanning electron microscope may include a motion control unit for moving a sample carrier along a collision free path.

A workstation is described for mounting specimens into a cryotransfer holder at cryogenic temperature. The workstation allows rotation about the cryotransfer holder axis to improve access to the sample placement area on the holder and to facilitate easy removal and retrieval of the sample after imaging. The cryotransfer holder includes a cylindrical dewar configured to maintain a constant center of mass about the holder axis regardless of orientation of the dewar.

A sample attachment device includes a mount, a mounted depression, and a pressure release depression. Liquid and air bubbles can pass the pressure release depression. The mounted depression is on the mount. A cartridge is mounted on the mounted depression. The pressure release depression is in the mounted depression. The pressure release depression is vertically under the cartridge when the cartridge is mounted on the mounted depression.