A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

The invention relates to a transport apparatus for transferring a sample between two devices. The transport apparatus comprises a transport tube provided with a carrier for holding a sample. The carrier is movable within said transport tube along a length thereof. The transport apparatus further comprises an actuator tube extending substantially next to said transport tube and which is provided with an actuator element that is movable within said actuator tube. Said actuator element comprises a first magnet part, and said sample carrier is provided with a second magnet part, wherein said first magnet part and said second magnet part are configured such that movement of the sample carrier through said transport tube is linked to movement of the magnetic actuator element through the actuator tube. In this way, movement of the magnetic actuator causes movement of the sample carrier, allowing safe, reliable and protected transport of the sample.

Provided are a thin film sample creation method and a charged particle beam apparatus capable of preventing a thin film sample piece from being damaged. The method includes a process of processing a sample by irradiating a surface of the sample with a focused ion beam (FIB) from a second direction that crosses a normal line to the surface of the sample to create a thin film sample piece and a connection portion positioned at and connected to one side of the thin film sample piece, a process of rotating the sample around the normal line, a process of connecting the thin film sample piece to a needle for holding the thin film sample piece, and a process of separating the thin film sample piece from the sample by irradiating the connection portion with a focused ion beam from a third direction that crosses the normal line.

A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

A charged particle beam apparatus automatically prepares a sample piece from a sample. The apparatus includes a charged particle beam irradiation optical system that emits a charged particle beam. A sample stage with a sample placed thereon is movable relative to the charged particle beam irradiation optical system. A sample piece transferring device holds and transports a sample piece separated and extracted from the sample, and a holder fixing base holds a sample piece holder to which the sample piece is to be transferred. An electrical conduction sensor detects electrical conduction between the sample piece transferring device and an object, and a computer sets a time management mode when electrical conduction between the sample piece transferring device and the sample piece is not detected when the sample piece transferring device and the sample piece are connected to each other.

According to one embodiment, an automatic sample preparation apparatus includes: a charged particle beam irradiation optical system configured to perform irradiation with a charged particle beam; a sample stage configured to move with the sample placed thereon; a sample piece transfer device for holding and transferring the sample piece separated and extracted from the sample; a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred; a gas supply portion configured to irradiate gas forming a deposition film with the charged particle beam; and a computer configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion to transfer and stop the sample piece held by the sample piece transfer device with a gap between the sample piece holder and the sample piece, and connect the sample piece to the sample piece holder.

A charged particle beam apparatus which automatically prepares a sample piece from a sample, includes: a charged particle beam irradiation optical system configured to perform irradiation of a charged particle beam; a sample stage configured to move, the sample being placed on the sample stage; a sample piece relocation unit configured to hold and transport the sample piece which is separated and picked up from the sample; a holder fixing stage which holds a sample piece holder to which the sample piece is relocated; and a computer which performs positional control in relation to a target object based on a template and positional information which is obtained from an image of the target object, the template being generated based on an absorption current image of the target object which is acquired using the irradiation of the charged particle beam.

Disclosed is a charged particle beam apparatus including a stage supporting a sample holder; a stage driving mechanism; a sample chamber; a focused ion beam column; an electron beam column; a detector detecting secondary ions or secondary electrons generated from the sample; a reading unit reading identification information attached to the sample holder; a memory unit storing holder shape information indicating a correspondence relationship between the identification information and a shape of the sample holder, and design information that is shape information of an internal structure of the sample chamber; and a stage driving range limiting unit limiting a driving range of the stage supporting the sample holder on the basis of the shape of the sample holder that is acquired from the identification information read by the reading unit and the holder shape information, and on the basis of a shape of the internal structure.

Disclosed are a charged particle beam apparatus and a sample processing observation method, the method including: a sample piece formation process in which a sample is irradiated with a focused ion beam such that a sample piece is cut out from the sample; a cross-section processing process in which the sample piece support holds the sample piece and a cross section thereof is irradiated with the ion beam to process the cross section; a sample piece approach movement process in which the sample piece support holds the sample piece and the sample piece is moved to a position that is closer to an electron beam column than an intersection point of beam optical axes of the ion beam and an electron beam is; and a SEM image acquisition process in which the cross section is irradiated with the electron beam to acquire the SEM image of the cross section.

A method of preparing a specimen in a dual-beam charged particle microscope having: an ion beam column, that can produce an ion beam that propagates along an ion axis; an electron beam column, that can produce an electron beam that propagates along an electron axis,
comprising the following steps: Providing a precursor sample on a sample holder; Using said ion beam to cut a furrow around a selected portion of said sample; Attaching a manipulator needle to said portion, severing said portion from the rest of said sample, and using the needle to perform a lift-out of the portion away from the rest of the sample,
particularly comprising: Configuring the manipulator needle to have multiple degrees of motional freedom, comprising at least: Eucentric tilt about a tilt axis that passes through an intersection point of said ion and electron axes and is perpendicular to said electron axis; Rotation about a longitudinal axis of the needle; Whilst maintaining said portion on said needle, using said ion beam to machine at least one surface of said portion, so as to create said specimen; Whilst maintaining said portion on said needle, inspecting it with said electron beam, for at least two different values of said rotation.