A guide pin includes a support part and a frictional column coupled to the support part, and the support part includes a lower support member including a screw structure on an outer surface thereof, and an upper support member on the lower support member. The frictional column surrounds an outer surface of the upper support member. A hardness of the frictional column is lower than a hardness of the support part.

(Task) To repeatedly perform an operation of extracting a sample piece formed by processing a sample with an ion beam and of transferring the extracted sample piece to a sample piece holder.

(Problem Solving Means) A charged particle beam apparatus includes a computer that sets a shaping processing region including a bottom portion of s ample piece in a thickness direction of the sample piece corresponding to a depth direction at the time of processing a sample after a needle holds the sample piece, and controls a focused ion beam irradiation optical system to irradiate the shaping processing region with a focused ion beam to thereby shape the sample piece.

A method of preparing a specimen in a dual-beam charged particle microscope having: an ion beam column, that can produce an ion beam that propagates along an ion axis; an electron beam column, that can produce an electron beam that propagates along an electron axis,
comprising the following steps: Providing a precursor sample on a sample holder; Using said ion beam to cut a furrow around a selected portion of said sample; Attaching a manipulator needle to said portion, severing said portion from the rest of said sample, and using the needle to perform a lift-out of the portion away from the rest of the sample,
particularly comprising: Configuring the manipulator needle to have multiple degrees of motional freedom, comprising at least: Eucentric tilt a about a tilt axis that passes through an intersection point of said ion and electron axes and is perpendicular to said electron axis; Rotation about a longitudinal axis of the needle; Whilst maintaining said portion on said needle, using said ion beam to machine at least one surface of said portion, so as to create said specimen; Whilst maintaining said portion on said needle, inspecting it with said electron beam, for at least two different values of said rotation.

A charged particle beam includes: a computer that controls a needle actuating mechanism so as to approach a needle to a sample piece using a template formed from an absorbed current image obtained by irradiating the needle with a charged particle beam and a tip coordinate of the needle acquired from a secondary electron image obtained by irradiating the needle with the charged particle beam.

According to one embodiment, an automatic sample preparation apparatus includes: a charged particle beam irradiation optical system configured to perform irradiation with a charged particle beam; a sample stage configured to move with the sample placed thereon; a sample piece transfer device for holding and transferring the sample piece separated and extracted from the sample; a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred; a gas supply portion configured to irradiate gas forming a deposition film with the charged particle beam; and a computer configured to control the charged particle beam irradiation optical system, the sample piece transfer device, and the gas supply portion to transfer and stop the sample piece held by the sample piece transfer device with a gap between the sample piece holder and the sample piece, and connect the sample piece to the sample piece holder.

A probe includes a solid elongate body disposed along a long axis of the probe and terminating in a probe tip, and a solid planar beveled surface at or adjacent an end of the probe tip formed at a non-zero beveled angle relative to a normal of the long axis of the probe, The solid planar beveled surface is configured to impart Van der Waal attractive force to a sample surface positioned immediately adjacent the solid beveled surface of the probe so that the sample can be detached from and lifted from the bulk material and transported to a grid for investigation. Various embodiments of the beveled surface are described, including an elliptical probe tip surface beveled between 10 and 45 degrees to the normal to the probe long axis and planar surfaces formed in the sides of the probe body that are parallel to the probe long axis.

Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.

A system and method is provided for of characterizing nanostructured surfaces. A nanostructure sample is placed in an SEM chamber and imaged. The system and method locates one of the nanostructures using images from the SEM imaging, excises a top portion of the nanostructure, places said top portion on a substrate such that the nanostructures are perpendicular to the substrate and a base of the top portion contacts the substrate, performs high energy ion beam assisted deposition of metal at the base to attach the top portion to the substrate, SEM imaging the top portions in the SEM chamber, determining coordinates of the top portions relative to the substrate from the SEM imaging of the top portions, placing the substrate in an AFM chamber, and performing AFM imaging of the top portions using the coordinates previously determined.

A charged particle beam device (10a) includes a computer (21) which controls multiple charged particle beam irradiation optical systems, the needle (18), and a gas supply portion (17) to transfer a sample piece Q to a predetermined position of the sample piece holder P, based on at least images of a sample piece holder (P), a needle (18), and the sample piece (Q) previously acquired by multiple charged particle beams.

Systems and methods for pre-aligning samples for more efficient processing of multiple samples with a BIB system according to the present invention comprises affixing a sample to an adjustable portion of a sample holder, nesting the sample holder with a first mask having a first mask edge, wherein the first mask is positioned outside of a BIB system, and aligning the sample such that it has a desired geometric relationship to the first mask edge. The first mask may be geometrically similar with a second mask within the BIB system that has a second mask edge such that the geometric relationship between the first mask edge and the sample when the sample holder is nested with the first mask is the same as the geometric relationship between the second mask edge and the sample when the sample holder is nested with the second mask.