The invention relates to an apparatus and a method for inspecting a sample. The apparatus includes a sample holder for holding the sample, at least the sample holder comprises a cooling system which is configured for cooling at least the sample, preferably to cryogenic temperatures; a charged particle exposure system includes an assembly for projecting a focused beam of primary charged particles onto the sample held by the sample holder; and a light optical microscope. The sample holder includes a sheet of a scintillator material, and the sample holder is configured to position the sample in between the charged particle optical column and the sheet of the scintillator material. The light optical microscope includes a detection system configured for acquiring an optical image of at least a part of the sheet of the scintillator material.

The invention relates to an apparatus and a method for inspecting a sample. The apparatus includes a sample holder for holding the sample, at least the sample holder comprises a cooling system which is configured for cooling at least the sample, preferably to cryogenic temperatures; a charged particle exposure system includes an assembly for projecting a focused beam of primary charged particles onto the sample held by the sample holder; and a light optical microscope. The sample holder includes a sheet of a scintillator material, and the sample holder is configured to position the sample in between the charged particle optical column and the sheet of the scintillator material. The light optical microscope includes a detection system configured for acquiring an optical image of at least a part of the sheet of the scintillator material.

A charged-particle detecting device 108, 108a, 108b, 108c, 108d, 108e, 108f, 108g or a radiation detecting device 203 detects charged particles or radiation as a detection target. These detection devices are each provided with: a scintillator 109 provided with a fluorescent layer 109a that converts the detection target into light 112; a light detector 111, 111b that detects the light 112 emitted from the scintillator 109; a light guide 110, 117 provided between the scintillator 109 and the light detector 111, 111b; and a blocking part 113, 114 that blocks a portion of the detection target incident on the scintillator 109 or the light emitted from the scintillator 109.

A method for operating a multi-beam particle beam microscope includes: scanning a multiplicity of particle beams over an object; directing electron beams emanating from impingement locations of the particle beams at the object onto an electron converter; detecting first signals generated by impinging electrons in the electron converter via a plurality of detection elements of a first detection system during a first time period; detecting second signals generated by impinging electrons in the electron converter via a plurality of detection elements of a second detection system during a second time period; and assigning to the impingement locations the signals which were detected via the detection elements of the first detection system during the first time period, for example on the basis of the detection signals which were detected via the detection elements of the second detection system during the second time period.

A method of manufacturing a phosphor panel includes: forming a phosphor layer having a plurality of phosphor particles on an exit window; forming an organic film on the phosphor layer; forming a metal reflection film on the organic film; forming an oxide film on the metal reflection film; removing the organic film by firing; and forming an oxide film integrally covering a surface of the metal reflection film and surfaces of the phosphor particles by atomic layer deposition.

A scintillator assembly including an entrance surface for receiving charged particles into the scintillator assembly, the charged particles including first charged particles at a first energy level and second charged particles at a second energy level. A first scintillator structure configured for receiving the first charged particles and generating a corresponding first signal formed of first photons with a first wavelength of λ1, a second scintillator structure configured for receiving the second charged particles and generating a corresponding second signal of second photons with a second wavelength of λ2, and an emitting surface for egress of a combined signal from the scintillator assembly, the combined signal including the first and second photons, and at least one beam splitter for receiving the combined signal and separating the combined signal to first and second photons.

The present disclosure is related to a Schottky thermal field (TFE) source for emitting an electron beam. Electron optics can adjust a shape of the electron beam before the electron beam impacts a scintillator screen. Thereafter, the scintillator screen generates an emission image in the form of light. An emission image can be adjusted and captured by a camera sensor in a camera at a desired magnification to create a final image of the Schottky TFE source's tip. The final image can be displayed and analyzed to for defects.

Lithography system, sensor and method for measuring properties of a massive amount of charged particle beams of a charged particle beam system, in particular a direct write lithography system, in which the charged particle beams are converted into light beams by using a converter element, using an array of light sensitive detectors such as diodes, CCD or CMOS devices, located in line with said converter element, for detecting said light beams, electronically reading out resulting signals from said detectors after exposure thereof by said light beams, utilizing said signals for determining values for one or more beam properties, thereby using an automated electronic calculator, and electronically adapting the charged particle system so as to correct for out of specification range values for all or a number of said charged particle beams, each for one or more properties, based on said calculated property values.

Pulsed beam prober systems, devices, and techniques are described herein related to providing a beam detection frequency that is less than a electrical test frequency. An electrical test signal at the electrical test frequency is provided to die under test. A pulsed beam is applied to the die such that the pulsed beam has packets of beam pulses or a frequency delta with respect to the electrical test frequency. The packets of beam pulses or the frequency delta elicits a detectable beam modulation in an imaging signal reflected from the die such that the imaging signal is modulated at a detection frequency less than the electrical test frequency.

Provided is a charged particle beam device that can impart a function of an energy filter to even a small BSE detector. The charged particle beam device includes a fluorescent substance that converts charged particles generated by irradiation of a sample with a charged particle beam into light; a detector that detects the light emitted from the fluorescent substance; a light guide element for guiding the light from the fluorescent substance to the detector; a light amount adjuster that adjusts the amount of light that is received by the detector through the fluorescent substance and the light guide element; and a control unit that controls the light amount adjuster.