A method of performing x-ray spectroscopy surface material analysis of a region of interest of a sample with an evaluation system that includes a scanning electron microscope (SEM) column, an x-ray detector and an x-ray polarizer, comprising: positioning a sample within a field of view of the scanning electron microscope; generating an electron beam having a landing energy about equal to an ionization energy of the materials within the region of interest of the sample; scanning the region of interest with the electron beam set to collide with the sample thereby generating x-rays emitted from near a surface of the sample, the x-rays including characteristic x-rays and Bremsstrahlung radiation; and detecting x-rays generated while the region of interest is scanned by the electron after the x-rays pass through the x-ray polarizer that blocks a higher percentage of the Bremsstrahlung radiation than the characteristic x-rays.

Disclosed herein is an electron-optical assembly testing system for testing an electron-optical assembly, the system comprising: a source of charged particles configured to emit a beam of charged particles; an electron-optical assembly holder configured to hold an electron-optical assembly to be tested such that, when the system is in use with an electron-optical assembly held by the electron-optical assembly holder, the electron-optical assembly is illuminated by the beam; and a sub-beam detector for detecting sub-beams of charged particles that have been transmitted through the electron-optical assembly.

A scanning electron microscope includes: an electron optical column, arranged to generate electron beams and focus the electron beams on a specimen; a first detector, arranged to receive electrons generated by the electron beams acting on the specimen; and a second detector, arranged to receive photons generated by the electron beams acting on the specimen. The second detector includes a reflector and a photon detector. The reflector is in a ring shape and is arranged to cover the perimeter of the specimen. The reflector reflects the photons generated on the specimen onto the photon detector. The scanning electron microscope provided by the present disclosure can collect photons in a wide range, and the photon detector has a high reception efficiency.

An ion detection system comprising an upper plate configured for propagation of ions therethrough, a lower plate comprising a converter configured for converting ions impinging thereon to secondary electrons, a secondary electron multiplication assembly configured for receiving the secondary electrons and comprising at least one or optionally a series of oppositely facing pairs of dynodes, wherein in the optional series of oppositely facing pairs of dynodes, each pair is spaced apart from an adjacent pair, and wherein a first electric field is created in between the oppositely facing pair of dynodes. A magnetic system is provided for generating a magnetic field.

A method of performing x-ray spectroscopy material analysis of a region of interest within a cross-section of a sample using an evaluation system that includes a focused ion beam (FIB) column, a scanning electron microscope (SEM) column, and an x-ray detector, including: forming a lamella having first and second opposing side surfaces in the sample by milling, with the FIB column, first and second trenches in the sample to expose the first and second sides surface of the lamella, respectively; depositing background material in the second trench, wherein the background material is selected such that the background material does not include any chemical elements that are expected to be within the region of interest of the sample; generating a charged particle beam with the SEM column and scanning the charged particle beam across a region of interest on the first side surface of the lamella such that the charged particle beam collides with the first side surface of the lamella at a non-vertical angle; and detecting x-rays generated while the region of interest is scanned by the charged particle beam.

A fiber optic plate 122 including a plurality of core glasses 122a, a clad glass 122b covering the core glass 122a, and a light-absorbing glass 122c disposed between the plurality of core glasses 122a, wherein a content of TiO.sub.2 in the core glass 122a is 7% by mass or less, a content of B.sub.2O.sub.3 in the core glass 122a is 15% by mass or more, and a content of WO.sub.3 in the core glass 122a is more than 0% by mass.

Provided is a silicon photomultiplier (SiPM) device and a silicon photomultiplier based LiDAR. The SiPM device includes a first sub-region and a second sub-region. In the first sub-region, the photodiode is operated with a first internal gain. In the second sub-region, the photodiode is operated with a second internal gain and the second internal gain in smaller than the first internal gain. A first anode generates current from the first sub-region in response to a low flux event, and the second anode generates current from the second sub-region in response to a high flux event. A common cathode outputs current generated from the first sub-region or the second sub-region.

A particle beam system comprises a particle beam column, a detection system and a controller. The particle beam column is configured to generate a particle beam and to direct it onto a sample, as a result of which charged particles are emitted by the sample. The detection system detects charged particles and comprises: an electrode, which can accelerate the charged particles; a potential source, which applies an adjustable electrical potential to the electrode; a scintillator; and a light detector, which outputs a detection signal. The controller controls the potential source and is configured to change the potential on the basis of the detection signal such that the scintillator operates outside its saturation and such that the light detector operates outside its saturation.

Methods for revitalizing components of a plasma processing apparatus that includes a sensor for detecting a thickness or roughness of a peeling weakness layer on a protective surface coating of a plasma processing tool and/or for detecting airborne contaminants generated by such peeling weakness layer. The method includes detecting detrimental amounts of peeling weakness layer buildup or airborne concentration of atoms or molecules from the peeling weakness layer, and initiating a revitalization process that bead beats the peeling weakness layer to remove it from the component while maintaining the integrity of the protective surface coating.

A method of manufacturing a phosphor panel includes: forming a phosphor layer having a plurality of phosphor particles on an exit window; forming an organic film on the phosphor layer; forming a metal reflection film on the organic film; forming an oxide film on the metal reflection film; removing the organic film by firing; and forming an oxide film integrally covering a surface of the metal reflection film and surfaces of the phosphor particles by atomic layer deposition.