Patent classifications
H01J2237/2445
Inspection device and measurement device
A detection circuit for accurately detecting a very small foreign material and an inspection/measurement device using the same are provided. The inspection/measurement device includes: an irradiation section that irradiates a laser beam to a surface of a specimen; and a detection section that detects scattered light from the surface of the specimen and generates a detection signal. The detection section includes: a photon counting sensor that outputs M output signals from photo-detecting elements of N pixels (M and N are natural numbers, and M<N); M current-voltage conversion sections that execute current-voltage conversion on the output signals of the photon counting sensor respectively; a voltage application section that applies reference voltages to the current-voltage conversion sections; and a detection signal generation section that generates a detection signal on the basis of the outputs of the current-voltage conversion sections.
Charged Particle Beam System
There is provided a charged particle beam system in which a detector can be placed in an appropriate analysis position. The charged particle beam system (100) includes: a charged particle source (11) for producing charged particles; a sample holder (20) for holding a sample (S); a detector (40) for detecting, in the analysis position, a signal produced from the sample (S) by impingement of the charged particles on the sample (S); a drive mechanism (42) for moving the detector (40) into the analysis position; and a controller (52) for controlling the drive mechanism (42). The controller (52) performs the steps of: obtaining information about the type of the sample holder (20); determining the analysis position on the basis of the obtained information about the type of the sample holder (20); and controlling the drive mechanism (42) to move the detector (40) into the determined analysis position.
Dual-mode silicon photomultiplier based LiDAR
Provided is a silicon photomultiplier (SiPM) device and a silicon photomultiplier based LiDAR. The SiPM device includes a first sub-region and a second sub-region. In the first sub-region, the photodiode is operated with a first internal gain. In the second sub-region, the photodiode is operated with a second internal gain and the second internal gain in smaller than the first internal gain. A first anode generates current from the first sub-region in response to a low flux event, and the second anode generates current from the second sub-region in response to a high flux event. A common cathode outputs current generated from the first sub-region or the second sub-region.
METHOD AND DEVICE FOR TIME-RESOLVED PUMP-PROBE ELECTRON MICROSCOPY
A method of time-resolved pump-probe electron microscopy, comprises the steps of irradiating a sample (1) with a photonic pump pulse (2) being directed on a pump pulse path (3) from a photonic source to the sample (1), irradiating the sample (1) with an electron probe pulse (4) being directed on an electron pulse path (5) from an electron pulse source (10) to the sample (1), wherein the photonic pump pulse (2) and the electron probe pulse (4) arrive at the sample (1) with a predetermined temporal relationship relative to each other, and detecting a sample response to the electron probe pulse (4) irradiation with a detector device (20), wherein the photonic source comprises a photonic lattice structure (30) being arranged adjacent to the electron pulse path (5), and the photonic pump pulse (2) is created by an interaction of the electron probe pulse (4) with the photonic lattice structure (30). Furthermore, an electron microscopy apparatus, configured for time-resolved pump-probe electron microscopy, and a sample supply device (200) for an electron microscopy apparatus (100) are described.
X-RAY ANALYZER
An X-ray analyzer includes an X-ray excitation device, an X-ray detection device, and a gate valve. The X-ray excitation device includes a sample chamber in which a sample as an analysis target can be disposed. The X-ray detection device includes a TES which can detect a characteristic X-ray emitted from the sample, and a room-temperature shield which surrounds the TES. The gate valve is disposed between the X-ray excitation device and the X-ray detection device. The inside of the room-temperature shield is provided to enable communication with the inside of the sample chamber. The gate valve includes a partition plate provided to enable blocking of a communication between the inside of the sample chamber and the inside of the room-temperature shield. The partition plate has a pressure-resistant X-ray window.
Charged particle microscope with improved spectroscopic functionality
An improved spectroscopic analysis apparatus and method are disclosed, comprising directing a beam of radiation onto a measurement location on a specimen, thereby causing a flux of X-rays to emanate from this location; examining the X-ray flux using a detector arrangement, thus acquiring a spectrum; choosing a set of different measurement directions originating from the location; recording outputs from the detector arrangement for different measurement directions; adopting a spectral model that is a convoluted mix of terms B and L.sub.p, where B is the Bremsstrahlung background spectrum and L.sub.p comprises spectral lines corresponding to the specimen composition at the measurement location; and then automatically deconvolving the set of measurements on the basis of the spectral model to calculate L.sub.p to determine the chemical composition of the specimen at the measurement location. The method includes corrections for differential X-ray absorption within the specimen along the different measurement directions.
Plasma processing apparatus and operational method thereof
A plasma processing apparatus includes: a detector configured to detect a change in an intensity of light emission from plasma formed inside a processing chamber; and a unit configured to adjust conditions for forming the plasma or processing a wafer arranged inside the processing chamber using an output from the detector, wherein the detector detects a signal of the intensity of light emission at plural time instants before an arbitrary time instant during processing, and wherein the adjusting unit removes the component of a temporal change of a long cycle of the intensity of light emission from this detected signal and detects the component of a short temporal change of the intensity of light emission, and adjusts the conditions for forming the plasma or processing a wafer arranged inside the processing chamber based on the short temporal change of the detected intensity of light emission.
APPARATUS AND METHOD FOR DETECTING ONE OR MORE SCANNING CHARGED PARTICLE BEAMS
A method and an apparatus are provided for inspecting a sample. The apparatus includes a sample holder for holding the sample, a charged particle column for generating and focusing one or more charged particle beams at one or more charged particle beam spots onto the sample, a scanning deflector for moving the charged particle beam spot(s) over the sample, a photon detector configured for detecting photons created when the one or more charged particle beams impinge on the sample or when the one or more charged particle beams impinge onto a layer of luminescent material after transmission through the sample, an optical assembly for projecting or imaging at least part of the photons from the charged particle beam spot(s) along an optical beam path onto the photon detector, and a shifting unit for shifting the optical beam path and/or the photon detector with respect to each other.
System and method for alignment of cathodoluminescence optics
Systems and methods for automated alignment of cathodoluminescence (CL) optics in an electron microscope relative to a sample under inspection are described. Accurate placement of the sample and the electron beam landing position on the sample with respect to the focal point of a collection mirror that reflects CL light emitted by the sample is critical to optimizing the amount of light collected and to preserving information about the angle at which light is emitted from the sample. Systems and methods are described for alignment of the CL mirror in the XY plane, which is orthogonal to the axis of the electron beam, and for alignment of the sample with respect to the focal point of the CL mirror along the Z axis, which is coincident with the electron beam.
SCANNING ELECTRON MICROSCOPE
A scanning electron microscope is disclosed. The scanning electron microscope includes: an electron optical column, arranged to generate electron beams and focus the electron beams on a specimen; a first detector, arranged to receive electrons generated by the electron beams acting on the specimen; and a second detector, arranged to receive photons generated by the electron beams acting on the specimen. The second detector includes a reflector and a photon detector. The reflector is in a ring shape and is arranged to cover the perimeter of the specimen. The reflector reflects the photons generated on the specimen onto the photon detector. The scanning electron microscope provided by the present disclosure can collect photons in a wide range, and the photon detector has a high reception efficiency.