Patent classifications
H01J2237/2449
Charged particle beam device
This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.
Particle beam system and method for operating a particle beam system
A particle beam system for examining and processing an object includes an electron beam column and an ion beam column with a common work region, in which an object may be disposed and in which a principal axis of the electron beam column and a principal axis of the ion beam column meet at a coincidence point. The particle beam system further includes a shielding electrode that is disposable between an exit opening of the ion beam column and the coincidence point. The shielding electrode is able to be disposed closer to the coincidence point than the electron beam column.
Ion plasma disintegrator
An electronic device incorporating a high voltage power supply connected to a pair of metal plates spaced to maintain a continuous high current arc of electricity creating an Ion Plasma discharge for the purpose of vaporizing documents placed between the plates. Magnetic containment coils around the outside of the metal plates are phase synchronized to the magnetic field created by the Ion Plasma arc to maintain the position of the arc between the plates and to direct the position of the arc in a predetermined pattern to search for any material between the plates that has not been disintegrated.
HIGH FRAMERATE AND HIGH DYNAMIC RANGE ELECTRON MICROSCOPY
Methods and systems for acquiring transmission electron microscope video data on a rolling-shutter detector at an enhanced frame rate and without temporal distortions are described. Also described are methods to enhance the dynamic range of image and diffraction data acquired using a transmission electron microscope. The disclosed methods and systems may also be applicable to photon detection and imaging systems.
SCANNING ELECTRON MICROSCOPE
A scanning electron microscope. The scanning electron microscope may include a sliding vacuum seal between the electron optical imaging system and the sample carrier with a first plate having a first aperture associated with the electron optical imaging system and resting against a second plate having a second aperture associated with the sample carrier. The first plate and/or the second plate includes a groove circumscribing the first and/or second aperture. The scanning electron microscope may include a detector movable relative to the electron beam. The scanning electron microscope may include a motion control unit for moving a sample carrier along a collision free path.
Charged particle beam device
A charged particle beam device includes a deflection unit that deflects a charged particle beam released from a charged particle source to irradiate a sample, a reflection plate that reflects secondary electrons generated from the sample, and a control unit that controls the deflection unit based on an image generated by detecting the secondary electrons reflected from the reflection plate. The deflection unit includes an electromagnetic deflection unit that electromagnetically scans with the charged particle beam by a magnetic field and an electrostatic deflection unit that electrostatically scans with the charged particle beam by an electric field. The control unit controls the electromagnetic deflection unit and the electrostatic deflection unit, superimposes an electromagnetic deflection vector generated by the electromagnetic scanning and an electrostatic deflection vector generated by the electrostatic scanning, and controls at least a trajectory of the charged particle beam.
Secondary electron detection efficiency
Systems and devices for improving the efficiency of secondary electron detection in charged particle beam systems include a charged particle detector, a first elongate member coupled with the charged particle detector, and a second elongate member coupled with the charged particle detector. The first elongate member and the second elongate member each extend away from the charged particle detector. The system also includes at least one drawing member that is coupled with the first elongate member. Additionally, at least one electrical connection point is arranged to supply at least one bias voltage to the first elongate member, the second elongate member, and the drawing member. The drawing member is configured to generate an electromagnetic field that applies a drawing force that draws charged particles away from the charged particle source, and/or reduces the amount of charged particles from the charged particle source that strike the charged particle tool.
Charged Particle Beam Device
This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.
SECONDARY ELECTRON DETECTION EFFICIENCY
Systems and devices for improving the efficiency of secondary electron detection in charged particle beam systems include a charged particle detector, a first elongate member coupled with the charged particle detector, and a second elongate member coupled with the charged particle detector. The first elongate member and the second elongate member each extend away from the charged particle detector. The system also includes at least one drawing member that is coupled with the first elongate member. Additionally, at least one electrical connection point is arranged to supply at least one bias voltage to the first elongate member, the second elongate member, and the drawing member. The drawing member is configured to generate an electromagnetic field that applies a drawing force that draws charged particles away from the charged particle source, and/or reduces the amount of charged particles from the charged particle source that strike the charged particle tool.
ION PLASMA DISINTEGRATOR
An electronic device incorporating a high voltage power supply connected to a pair of metal plates spaced to maintain a continuous high current arc of electricity creating an Ion Plasma discharge for the purpose of vaporizing documents placed between the plates. Magnetic containment coils around the outside of the metal plates are phase synchronized to the magnetic field created by the Ion Plasma arc to maintain the position of the arc between the plates and to direct the position of the arc in a predetermined pattern to search for any material between the plates that has not been disintegrated.