Some embodiments include a high voltage, high frequency switching circuit. The switching circuit may include a high voltage switching power supply that produces pulses having a voltage greater than 1 kV and with frequencies greater than 10 kHz and an output. The switching circuit may also include a resistive output stage electrically coupled in parallel with the output and between the output stage and the high voltage switching power supply, the resistive output stage comprising at least one resistor that discharges a load coupled with the output. In some embodiments, the resistive output stage may be configured to discharge over about 1 kilowatt of average power during each pulse cycle. In some embodiments, the output can produce a high voltage pulse having a voltage greater than 1 kV and with frequencies greater than 10 kHz with a pulse fall time less than about 400 ns.

The present disclosure relates to a method for a remote control of a radiation detection apparatus. The method comprises providing a remote system comprising a remote computer system and a hardware controller. The remote computer system is configured to operate in a client-server configuration with a local computer system, wherein the local computer system is a server locally connected to the detection apparatus. Output data of an imaging system of the detection apparatus may be received from the local computer system over a first network connection established between the local computer system and the remote computer system. A second network connection may be established between the hardware controller and the imaging system. And, the imaging system may be controlled by sending via the second network connection control signals to the imaging system. The second network connection is logically independent from the first network connection.

The invention described herein relates to a method for controlling a unit of a particle beam device for imaging, analyzing and/or processing an object. Moreover, the invention described herein relates to a particle beam device for carrying out the method. The method comprises identifying at least one part of at least one hand (134) of a user or at least one complete hand (134) of a user by means of an identification unit (130, 131), wherein the identification unit (130, 131) is at least one of: (i) a first camera unit (130), (ii) a first touchless motion sensor (131) or (iii) a first wireless motion sensor; tracking an absolute movement and/or a relative movement of the at least one part of the at least one hand (134) of the user or the at least one complete hand (134) of the user by means of a tracking unit (130, 131), wherein the tracking unit (130, 131) is at least one of: (i) a second camera unit (130), (ii) a second touchless motion sensor (131) or (iii) a second wireless motion sensor; transforming the movement of the at least one part of the at least one hand (134) of the user or the at least one complete hand (134) of the user into a command for a control of the unit of the particle beam device by means of a transformation unit (128); and providing the control of the unit of the particle beam device by means of the command, wherein the command is used as an input in a control unit for controlling the unit of the particle beam device.

Some embodiments include a high voltage waveform generator comprising: a generator inductor; a high voltage nanosecond pulser having one or more solid state switches electrically and/or inductively coupled with the generator inductor, the high voltage nanosecond pulser configured to produce a pulse burst having a burst period, the pulse burst comprising a plurality of pulses having different pulse widths; and a load electrically and/or inductively coupled with the high voltage nanosecond pulser, the generator inductor, and the generator capacitor, the voltage across the load having an output pulse with a pulse width substantially equal to the burst period and the voltage across the load varying in a manner that is substantially proportional with the pulse widths of the plurality of pulses.

The present disclosure relates to a method for a remote control of a radiation detection apparatus. The method comprises providing a remote system comprising a remote computer system and a hardware controller. The remote computer system is configured to operate in a client-server configuration with a local computer system, wherein the local computer system is a server locally connected to the detection apparatus. Output data of an imaging system of the detection apparatus may be received from the local computer system over a first network connection established between the local computer system and the remote computer system. A second network connection may be established between the hardware controller and the imaging system. And, the imaging system may be controlled by sending via the second network connection control signals to the imaging system. The second network connection is logically independent from the first network connection.

Described herein is a technique capable of uniformly processing substrates. According to the technique described herein, there is provided a substrate processing apparatus including: a process chamber where a substrate is processed; a gas supply configured to supply a gas into the process chamber; a plasma generator configured to plasma-excite the gas supplied into the process chamber, the plasma generator including an electrode electrically connected to a high frequency power source; an impedance meter configured to measure an impedance of the plasma generator; a determiner configured to determine an amount of active species generated by the plasma generator based on the impedance measured by the impedance meter; and a controller configured to control the high frequency power source based on the amount of active species determined by the determiner.

Some embodiments include a high voltage waveform generator comprising: a generator inductor; a high voltage nanosecond pulser having one or more solid state switches electrically and/or inductively coupled with the generator inductor, the high voltage nanosecond pulser configured to produce a pulse burst having a burst period, the pulse burst comprising a plurality of pulses having different pulse widths; and a load electrically and/or inductively coupled with the high voltage nanosecond pulser, the generator inductor, and the generator capacitor, the voltage across the load having an output pulse with a pulse width substantially equal to the burst period and the voltage across the load varying in a manner that is substantially proportional with the pulse widths of the plurality of pulses.

A charged particle beam apparatus that includes a magnetic lens having an electromagnetic coil composed of a pair of coils includes: a setting unit that sets a maximum current value that defines a maximum magnetomotive force of the magnetic lens based on an operation of a user; and a current control unit that controls a current to be supplied to each of the pair of coils within a current range corresponding to a set maximum current value so that thermal power consumed by the electromagnetic coil is maintained constant at thermal power corresponding to the set maximum current value.

A plasma processing method in which a stable process region can be ensured in a wide range, from low microwave power to high microwave power. The plasma processing method includes making production of plasma easy in a region in which production of plasma by continuous discharge is difficult, and plasma-processing an object to be processed, with the generated plasma, wherein the plasma is produced by pulsed discharge in which ON and OFF are repeated, radio-frequency power for producing the pulsed discharge, during an ON period, is a power to facilitate production of plasma by continuous discharge, and a duty ratio of the pulsed discharge is controlled so that an average power of the radio-frequency power per cycle is power in the region in which production of plasma by continuous discharge is difficult.

To assist an operator in setting an observation conditions, so as to acquire an image with a desired image quality (such as contrast) in a charged particle beam device without falling into trial and error based on the experience of the operator. Therefore, the charged particle beam device includes a stage 115 on which a sample is placed, a charged particle optical system configured to irradiate the sample with a charged particle beam, detectors 121 and 122 configured to detect an electron generated by an interaction between the charged particle beam and the sample, a control unit 103 configured to control the stage and the charged particle optical system according to an observation condition set by the operator and configured to form an image based on a detection signal from the detectors, and a display 104 configured to display an observation assist screen for setting the observation condition. The control unit displays, on the observation assist screen 401, information 510 related to an irradiation electron amount per pixel irradiated onto the sample by the charged particle optical system under the observation condition.