The present invention relates to a method, an apparatus and a computer program for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography.

A method for analyzing and/or processing of a mask for lithography, in particular a mask for EUV lithography, is described, which method comprises the following steps: 1a.) generating at least one particle beam vortex; and 1b.) using the particle beam vortex for analyzing and/or processing of the mask.

A phase shifting device for a charged particle imaging system includes means for passing an electric current in a direction that has a nonzero component parallel to at least one section of the imaging beam. Preferably, the electric current is passed parallel along the section of the imaging beam. The amount of phase shift then centrosymmetrically depends on the distance between the electric current axis and the imaging beam axis. The magnetic field produced by the electric current exhibits the same effect on the phase of the beam as a localized charge according to the prior art.

To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathode 101 with negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beam 13 generated from the photocathode by excitation light 12 irradiated through the excitation optical system onto a sample, the excitation optical system including a light source device 107 for the excitation light; and an optical modulation means 108 which is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.

The present disclosure relates to an apparatus and methods for generating a hybrid image by high-dynamic-range counting. In an embodiment, the apparatus includes a processing circuitry configured to acquire an image from a pixelated detector, obtain a sparsity map of the acquired image, the sparsity map indicating low-flux regions of the acquired image and high-flux regions of the acquired image, generate a low-flux image and a high-flux image based on the sparsity map, perform event analysis of the acquired image based on the low-flux image and the high-flux image, the event analysis including detecting, within the low-flux image, incident events by an event counting mode, multiply, by a normalization constant, resulting intensities of the high-flux image and the detected incident events of the low-flux image, and generate the hybrid image by merging the low-flux image and the high-flux image.

An electron beam phase plate is provided where patterned radiation is provided to the phase plate to creates a corresponding electrical pattern, This electrical pattern provides a corresponding patterned modulation of the electron beam. Such modulation can be done in transmission or in reflection. This approach has numerous applications in electron microscopy, such as providing phase and/or amplitude shaping, aberration correction and providing phase contrast.

A method for imaging a sample with charged particles comprises directing charged particles towards the sample along a primary axis, and simultaneously detecting a first portion and a second portion of the charged particles transmitted through the sample with a first detector and a second detector, respectively. The second detector is positioned downstream of the first detector. Each of the transmitted charged particles exits the sample at an exit angle between a direction of the transmitted charged particle and the primary axis. The exit angles of the first portion of the transmitted charged particles overlap with the exit angles of the second portion of the transmitted charged particles. In this way, complimentary information, such as the structural and compositional information, may be obtained simultaneously.

Disclosed among other aspects is a charged particle inspection system including a phaseplate configured and arranged to modify the local phase of charged particles in a beam to reduce the effects of lens aberrations. The phaseplate is made up of an array of apertures with the voltage and/or a degree of obscuration of the apertures being controlled individually or in groups.

The present application relates to a method and an apparatus for determining a wavefront of a massive particle beam, including the steps of: (a) recording two or more images of a reference structure using the massive particle beam under different recording conditions; (b) generating point spread functions for the two or more recorded images with a modified reference image of the reference structure; and (c) performing a phase reconstruction of the massive particle beam on the basis of the generated point spread functions and the different recording conditions, for the purposes of determining the wavefront.

The present invention is to generate a spatially phase modulated electron wave. A laser radiating apparatus, a spatial light phase modulator, and a photocathode are provided. The photocathode has a semiconductor film having an NEA film formed on a surface thereof, and a thickness of the semiconductor film is smaller than a value obtained by multiplying a coherent relaxation time of electrons in the semiconductor film by a moving speed of the electrons in the semiconductor film. According to the configuration, a spatial distribution of phase and a spatial distribution of intensity of spatial phase modulated light are transferred to an electron wave, and the electron wave emitted from an NEA film is modulated into the spatial distribution of phase and the spatial distribution of intensity of the light. Since the spatial distribution of phase of the light can be modulated as intended by a spatial phase modulation technique for light, it is possible to generate an electron wave having a spatial distribution of phase modulated as intended.

Systems and method for the preparation and delivery of biological samples for charged particle analysis are disclosed herein. An example system at least includes an ion filter coupled to select a sample ion from an ionized sample supply, the ion filter including a quadrupole filter to select the sample ion from the sample supply, an energy reduction cell coupled to receive the selected sample ion and reduce a kinetic energy of the sample ion, a validation unit coupled to receive the sample ion and determine whether the sample ion is a target sample ion, a substrate coupled to receive the sample, wherein the substrate is electron transparent, an ion transport module coupled to receive the sample ion from the ion filter and transport the sample ion to the substrate, and an imaging system arranged to image, with a low energy charged particle beam, the sample located on the substrate, wherein the substrate is arranged in an analysis location. The imaging system including a charge particle emitter coupled to direct coherent charged particles toward the sample; and a detector arranged to detect interference patterns formed from interaction of the coherent charged particles and the sample.