H01J2237/28

Array of carbon nanotube micro-tip structures

An array of carbon nanotube micro-tip structure includes an insulating substrate and a plurality of patterned carbon nanotube film structures. The insulating substrate includes a surface. The surface includes an edge. A plurality of patterned carbon nanotube film structures spaced from each other. Each of the plurality of patterned carbon nanotube film structures is partially arranged on the surface of the insulating substrate. Each of the plurality of patterned carbon nanotube film structures comprises two strip-shaped arms joined together forming a tip portion protruding and suspending from the edge of the surface of the insulating substrate. Each of the two strip-shaped arms comprises a plurality of carbon nanotubes parallel to the surface of the insulating substrate.

Testing assembly including a multiple degree of freedom stage

A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.

Detecting method and detecting equipment therefor

A detecting method and a detecting equipment therefor are provided. The detecting method includes: inspecting whether a display panel has a defective position; after acquiring the defective position of the display panel by the inspecting, using a first focused ion beam generated by a first ion overhaul apparatus to cut the defective position of the display panel, so as to strip a defect at the defective position and observe morphology of defect; using a repair apparatus to perform a repair treatment on the defective position after the defect is stripped. An inspection apparatus for the inspecting of the defective position, the first ion overhaul apparatus and the repair apparatus are sequentially installed on the same production line.

Chicane blanker assemblies for charged particle beam systems and methods of using the same
09767984 · 2017-09-19 ·

A chicane blanker assembly for a charged particle beam system includes an entrance and an exit, at least one neutrals blocking structure, a plurality of chicane deflectors, a beam blanking deflector, and a beam blocking structure. The entrance is configured to accept a beam of charged particles propagating along an axis. The at least one neutrals blocking structure intersects the axis. The plurality of chicane deflectors includes a first chicane deflector, a second chicane deflector, a third chicane deflector, and a fourth chicane deflector sequentially arranged in series between the entrance and the exit and configured to deflect the beam along a path that bypasses the neutrals blocking structure and exits the chicane blanker assembly through the exit. In embodiments, the chicane blanker assembly includes a two neutrals blocking structures. In embodiments, the beam blocking structure is arranged between the third chicane deflector and the fourth chicane deflector.

Ion beam device and emitter tip adjustment method

The objective of the present invention is to provide an ion beam device capable of forming a nanopyramid stably having one atom at the front end of an emitter tip even when the cooling temperature is lowered in order to observe a sample with a high signal-to-noise ratio. In the present invention, the ion beam device, wherein an ion beam generated from an electric field-ionized gas ion source is irradiated onto the sample to observe or process the sample, holds the temperature of the emitter tip at a second temperature higher than a first temperature for generating the ion beam and lower than room temperature, sets the extraction voltage to a second voltage higher than the first voltage used when generating the ion beam, and causes field evaporation of atoms at the front end of the emitter tip, when forming the nanopyramid having one atom at the front end of the emitter tip.

Device And Method For Detecting A Concentration Of Predetermined Particles On The Basis Of Their Morphological Properties In Air
20220236163 · 2022-07-28 ·

A device (1) for detecting a concentration of predetermined particles, particularly viruses, in air (3) with organic and/or inorganic aerosol particles, has a supply unit (10), an imaging unit (20), an image acquisition unit (40) and an evaluation unit (50). The supply unit (10) binds the aerosol particles as particles in a fluid (4). The imaging unit (20) operates on the functional principle of a scanning electron microscope in order to generate an enlarged image of the particles contained in the fluid (4). The image acquisition unit (40) acquires and transmits the image. The evaluation unit (50) evaluates the particles depicted in the image. The evaluation unit (50) automatically detects morphological properties of the particles depicted in the image and compares the detected morphological properties with morphological properties of the predetermined particles. Through the comparison, it determines a proportion and/or number of predetermined particles in the image and the concentration of the predetermined particles in the air (3).

ELECTRON MICROSCOPE USING ARTIFICIAL INTELLIGENCE TRAINING DATA
20220199360 · 2022-06-23 ·

The present disclosure relates to an electron microscope having a deep learning module in which electron microscopy images and control parameters are used as training input information of the deep learning model, and the deep learning model trained using focus, contrast and brightness among the control parameters as targets of the deep learning model generates a command for optimal target it is possible to automatically provide a sample image with high quality based on data trained based on artificial intelligence without any manual manipulation of control parameter values, thereby allowing beginners as well as people with advanced skills to easily use the electron microscope, which contributes to thriving electron microscope market.

MATERIAL PROCESSING METHOD AND MATERIAL PROCESSING SYSTEM FOR PERFORMING THE METHOD
20220193819 · 2022-06-23 ·

A material processing system includes a particle beam column for directing a particle beam at a first processing region and a laser scanner for directing a laser beam at a second processing region. A method for operating the material processing system includes: scanning a first mark placed on an object with the particle beam; scanning the first mark with the laser beam for a first time and producing a second mark on the object with the laser beam; scanning the second mark with the particle beam; and scanning the first mark with the laser beam for a second time and removing material of the object with the laser beam based on the scanning of the second mark with the particle beam.

INSPECTION METHOD, INSPECTION SYSTEM, AND SEMICONDUCTOR FABRICATION USING THE SAME
20220197149 · 2022-06-23 ·

Provided is an inspection method including providing a pattern layout including measurement points, generating a first measurement map including first measurement regions that overlap the measurement points and do not overlap each other in a two-dimensional plan view, providing preliminary measurement regions on the measurement points, producing a polygon by grouping ones of the preliminary measurement regions that overlap each other in the two-dimensional plan view, providing a second measurement region on a center of the polygon, selecting the second measurement region when all of the measurement points in the polygon overlap the second measurement region in the two-dimensional plan view, generating a second measurement map including the selected second measurement region, generating a third measurement map by using the first and second measurement maps, and inspecting patterns on a semiconductor substrate by using the third measurement map. The third measurement map includes the selected second measurement region and ones of the first measurement regions that do not overlap the selected second measurement region in the two-dimensional plan view.

Charged Particle Beam Apparatus
20230274910 · 2023-08-31 ·

Light which is radiant energy is emitted from a sample which is heated, and is detected by a backscattered electron detector. A detection signal from the backscattered electron detector includes a radiant component. A radiant component removal section extracts the radiant component from the detection signal using a filter, and then removes the radiant component from the detection signal. An optical detector which detects the radiant component may be provided. A divided detector may be provided as the backscattered electron detector.