H01L21/677

Systems for integrating load locks into a factory interface footprint space

The disclosure describes devices, systems, and methods for integrating load locks into a factory interface footprint space. A factory interface for an electronic device manufacturing system can include an interior volume defined by a bottom, a top and a plurality of sides, a first load lock disposed within the interior volume of the factory interface, and a first factory interface robot disposed within the interior volume of the factory interface, wherein the first factory interface robot is configured to transfer substrates between a first set of substrate carriers and the first load lock.

Micro LED transfer system

The present invention relates to provide a hot air supplying head for transferring a micro LED and a micro LED transfer system using the same, the hot air supplying head effectively transferring micro LEDs.

Load port unit, storage apparatus including the same, and exhaust method

A storage apparatus for storing an object includes a load port unit that a receptacle is loaded onto or unloaded from, in which the receptacle accommodates the object in a storage space formed by a body and a cover that covers the body, and a controller. The load port unit includes a housing having an interior space, a stage member that is provided on the housing and that opens the storage space by moving the body, the receptacle being seated on the stage member, and an exhaust tube that evacuates a spacing space between the body and the cover spaced apart from each other. One end of the exhaust tube faces toward the spacing space, and an opposite end of the exhaust tube faces toward the interior space.

Heat treatment apparatus and film deposition method

A heat treatment apparatus includes: a processing container configured to accommodate and process a plurality of substrates in multiple tiers under a reduced-pressure environment; a first heater configured to heat the plurality of substrates accommodated in the processing container; a plurality of gas supply pipes configured to supply a gas to positions having different heights in the processing container; and a second heater provided on a gas supply pipe that supplies a gas to a lowermost position among the plurality of gas supply pipes, and configured to heat the gas in the gas supply pipe.

SUBSTRATE-CONVEYING SUPPORT TAPE AND ELECTRONIC APPARATUS/DEVICE PRODUCTION METHOD
20230039482 · 2023-02-09 ·

A substrate-conveying support tape includes: a support film; a primer layer provided on the support film; and a temporary fixing material layer provided on the primer layer, in which the support film is a polyimide film, the temporary fixing material layer contains a thermoplastic resin, and the primer layer contains at least one selected from the group consisting of a silane coupling agent having an epoxy group or a ureido group, an epoxy resin, a polyurethane rubber, and an acrylic rubber having an acid value of 5 mgKOH/g or more.

TRANSFER DEVICE, PROCESSING SYSTEM, AND TRANSFER METHOD
20230038276 · 2023-02-09 ·

According to one aspect of the present disclosure, a transfer device has a first holding part configured to contact an edge part of a substrate when holding the substrate, and a second holding part formed with an elastic member and configured to contact only a back surface of the substrate when holding the substrate.

SEMICONDUCTOR PROCESSING TOOL AND METHOD FOR PASSIVATION LAYER FORMATION AND REMOVAL

A semiconductor processing tool performs passivation layer deposition and removal in situ. A transport mechanism included in the semiconductor processing tool transfers a semiconductor structure through different deposition chambers (e.g., without breaking or removing a vacuum environment). Accordingly, the semiconductor processing tool deposits a target layer that is thinner on, or even absent from, a metal layer, such that contact resistance is reduced between a conductive structure formed over the target layer and the metal layer. As a result, electrical performance of a device including the conductive structure is improved. Moreover, because the process is performed in situ (e.g., without breaking or removing the vacuum) in the semiconductor processing tool, production time and risk of impurities in the conductive structure are reduced. As a result, throughput is increased, and chances of spoiled wafers are decreased.

SEMICONDUCTOR APPARATUS AND METHOD OF COLLECTING RESIDUES

A semiconductor apparatus and a method for collecting residues of curable material are provided. The semiconductor apparatus includes a chamber containing a wafer cassette, and a collecting module disposed in the chamber for collecting residues of curable material in the chamber. The collecting module includes a flow-directing structure disposed below a ceiling of the chamber, a baffle structure disposed below the flow-directing structure, and a tray disposed on the wafer cassette. The flow-directing structure includes a first hollow region, the baffle structure includes a second hollow region, and the tray is moved together with the wafer cassette to pass through the second hollow region of the baffle structure and is positioned to cover the first hollow region of the flow-directing structure.

LOAD PORT

There is provided a load port, including: a frame including an opening via which a transfer target object is capable of passing in a substantially horizontal posture; a load port door configured to engage with a container door capable of opening and closing a loading/unloading port of a storage container including slots capable of accommodating the transfer target object in a multi-stage manner, and to open and close the opening of the frame; and a mapping mechanism configured to map information on an accommodation state including presence or absence of the transfer target object in each of the slots in the storage container via the opening and the loading/unloading port.

ACCOMMODATION CONTAINER AND CHARGING METHOD FOR SUBSTRATE-SHAPED SENSOR
20230041619 · 2023-02-09 ·

With respect to an accommodation container that accommodates a substrate-shaped sensor, the accommodation container includes a container body that has an opening, a support that is disposed inside the container body and configured to support the substrate-shaped sensor, a contact pin that is disposed inside the container body and configured to come into contact with a terminal portion of the substrate-shaped sensor, a driving mechanism that is disposed inside the container body and configured to drive the contact pin, a rotation shaft member that drives the driving mechanism from an outside of the container body, a jack that is disposed outside the container body and electrically connected to the contact pin, and a lid that is configured to close the opening of the container body.