A manufacturing method of an electronic device is provided. The manufacturing method of the electronic device includes following steps: providing a substrate; bonding at least one electronic component to the substrate, wherein the at least one electronic component is mainly driven by a reverse bias in an operating mode; applying a forward bias to the at least one electronic component, and determining whether the at least one electronic component is normal or failed; and transporting the substrate configured with the at least one electronic component determined to be normal to a next production site or repairing the at least one electronic component determined to be failed.

Test line structures are provided. A test line structure includes a semiconductor substrate, a plurality of diagnosis units and a plurality of first micro pad units. The diagnosis units are formed over the semiconductor substrate. Each of the diagnosis units includes a first interconnect structure having a first routing pattern. The first interconnect structures of the diagnosis units are connected in series to form a first test chain through the first micro pad units, and each of the first micro pad units is configured to connect the first interconnect structures of two adjacent diagnosis units in the first test chain. The first routing patterns of the first interconnect structures in the diagnosis units are different.

A semiconductor structure including a semiconductor base and a test element group is provided. The test element group includes a first metal layer, a second metal layer, and a through-silicon via. The first metal layer is located on the semiconductor base. Reserved space running through the first metal layer is formed on the first metal layer. The second metal layer is located above the first metal layer and is spaced away from the first metal layer. The through-silicon via is located inside the semiconductor base and runs through the reserved space, and the through-silicon via is connected to the second metal layer. The cross-sectional area of the through-silicon via is less than the cross-sectional area of the reserved space, so that the through-silicon via is spaced away from the first metal layer.

An example apparatus includes a semiconductor wafer with a plurality of probe pads each formed centered in scribe streets and intersected by saw kerf lanes. Each probe pad includes a plurality of lower level conductor layers arranged in lower level conductor frames, a plurality of lower level vias extending vertically through lower level insulator layers and electrically coupling the lower level conductor frames; a plurality of upper level conductor layers, each forming two portions on two outer edges of the probe pad, the two portions aligned with, spaced from, and on opposite sides of the saw kerf lane, the coverage of the upper level conductor layers being less than about twenty percent; and a plurality of upper level vias extending vertically through upper level insulator layers and coupling the upper level conductor layers electrically to one another and to the lower level conductor layers. Methods are disclosed.

A semiconductor apparatus includes a mounting board, a system on chip (SOC) package and a memory package which are provided on the mounting board. The SOC package includes a semiconductor chip and a package substrate on which the semiconductor chip is mounted. The semiconductor apparatus further includes a signal wiring line through which a signal between the semiconductor chip and the memory package is transmitted, being provided on the package substrate and in the mounting board and a measurement terminal connected to the signal wiring line on main surface of the package substrate.

A semiconductor package provided herein includes a first semiconductor die, a second semiconductor die and an insulating encapsulation. The second semiconductor die is stacked on the first semiconductor die. The insulating encapsulation laterally surrounds the first semiconductor die and the second semiconductor die in a one-piece form, and has a first sidewall and a second sidewall respectively adjacent to the first semiconductor die and the second semiconductor die. The first sidewall keeps a lateral distance from the second sidewall.

A chip-on-film package includes a base film having a top surface and a bottom surface, and a circuit region; a source driver chip and a gate driver chip mounted on the circuit region; a first conductive line on the top surface of the base film, a second conductive line on the bottom surface of the base film, and a conductive via that connects the first and second conductive lines to each other; a first row of bonding pads on the circuit region and connected to the source driver chip; a second row of bonding pads on the circuit region and connected to the source driver chip and the gate driver chip; and a test pad outside the circuit region and connected to the first and second conductive lines and the conductive via.

A semiconductor device may include function circuits and a test line structure beside the function circuits. The test line structure includes standard cell circuit blocks including a first components and environment circuit regions between the standard cell circuit blocks. The environment circuit regions include second components. The first components are different from the second components in structure, arrangement or a combination thereof.

The present disclosure relates to a semiconductor device and a forming method thereof. The forming method includes: providing a substrate; forming node contacts inside the substrate; forming landing pads on an upper surface of the substrate, where the landing pad is in contact with the node contact; forming a barrier layer on exposed surfaces of the landing pads and the node contacts; and after performing an electrical test on the semiconductor device on which the barrier layer is formed, removing the barrier layer on an upper surface of the landing pads.

A semiconductor structure includes: a substrate, a conductive pattern layer, a support layer and a re-distribution layer. The conductive pattern layer is arranged on the substrate. The support layer covers the conductive pattern layer and is provided with a via hole. The re-distribution layer is arranged on the support, and the re-distribution layer includes a test pad at least located in the via hole. The test pad includes a plurality of test contact portions and a plurality of recesses that are arranged alternately and connected mutually, and the recess is in corresponding contact with a portion of the conductive pattern layer in the via hole.