A fingerprint recognition module according to an embodiment includes a substrate; a conductive pattern portion disposed on the substrate; a protective layer partially disposed on the substrate and the conductive pattern portion; a first connection portion disposed on a conductive pattern portion exposed through a first open region of the protective layer; and a first chip disposed on the first connection portion; wherein the first connection portion includes an anisotropic conductive adhesive disposed on the conductive pattern portion exposed through the first open region and having a closed loop shape and including conductive particles.

A method for forming a semiconductor device is provided. The method includes the following steps: providing a semiconductor substrate; forming a pad layer on the semiconductor substrate; forming a first passivation layer on the pad layer; forming a second passivation layer on the first passivation layer, wherein the second passivation layer comprises polycrystalline silicon; forming an oxide layer on the second passivation layer; forming a nitride layer on the oxide layer; removing a portion of the oxide layer and a portion of the nitride layer to expose a portion of the second passivation layer; removing the portion of the second passivation layer that has been exposed to expose a portion of the first passivation layer; and removing the portion of the first passivation layer that has been exposed to expose a portion of the pad layer.

A method for forming a semiconductor device is provided. The method includes the following steps: providing a semiconductor substrate; forming a pad layer on the semiconductor substrate; forming a first passivation layer on the pad layer; forming a second passivation layer on the first passivation layer, wherein the second passivation layer comprises polycrystalline silicon; forming an oxide layer on the second passivation layer; forming a nitride layer on the oxide layer; removing a portion of the oxide layer and a portion of the nitride layer to expose a portion of the second passivation layer; removing the portion of the second passivation layer that has been exposed to expose a portion of the first passivation layer; and removing the portion of the first passivation layer that has been exposed to expose a portion of the pad layer.

Power semiconductor devices comprise a wide bandgap semiconductor layer structure, a gate pad on the wide bandgap semiconductor layer structure, a plurality of gate fingers on the wide bandgap semiconductor layer structure, and a plurality of lumped gate resistors electrically coupled between the gate pad and the gate fingers.

All of four of built-in gate resistance trenches function as practical built-in gate resistance trenches. A first end portion of each of four of the built-in gate resistance trenches is electrically connected to a wiring side contact region of a gate wiring via a wiring contact. A second end portion of each of four of the built-in gate resistance trenches is electrically connected to a pad side contact region of a gate pad via a pad contact. In each of four of the built-in gate resistance trenches, a distance between the wiring contact and the pad contact is defined as an inter-contact distance.

Embodiments include semiconductor packages and methods to form the semiconductor packages. A semiconductor package includes a plurality of first dies on a substrate, an interface layer over the first dies, a backside metallization (BSM) layer directly on the interface layer, where the BSM layer includes first, second, and third conductive layer, and a heat spreader over the BSM layer. The first conductive layer includes a titanium material. The second conductive layer includes a nickel-vanadium material. The third conductive layer includes a gold material, a silver material, or a copper material. The copper material may include copper bumps. The semiconductor package may include a plurality of second dies on a package substrate. The substrate may be on the package substrate. The second dies may have top surfaces substantially coplanar to top surface of the first dies. The BSM and interface layers may be respectively over the first and second dies.

This application discloses a package structure and a package system. The package structure may be used for packaging various types of chips, and is coupled to a PCB, so as to form the package system. The package structure includes a package base layer, a chip, a package body, and a connecting assembly. The package base layer has a first surface and a second surface that are opposite to each other. The chip is coupled to the first surface, and there is a chip pad on a surface that is of the chip and that is away from the package base layer. The package body covers the package base layer and the chip to protect the structure, and the chip pad is wired to a surface of the package body through the connecting assembly.

This application discloses a package structure and a package system. The package structure may be used for packaging various types of chips, and is coupled to a PCB, so as to form the package system. The package structure includes a package base layer, a chip, a package body, and a connecting assembly. The package base layer has a first surface and a second surface that are opposite to each other. The chip is coupled to the first surface, and there is a chip pad on a surface that is of the chip and that is away from the package base layer. The package body covers the package base layer and the chip to protect the structure, and the chip pad is wired to a surface of the package body through the connecting assembly.

An integrated circuit includes first and second active regions extending in a first direction, a first gate line extending in a second direction substantially perpendicular to the first direction and crossing the first and second active regions, and a first contact jumper including a first conductive pattern intersecting the first gate line above the first active region and a second conductive pattern extending in the second direction above the first gate line and connected to the first conductive pattern.

An integrated circuit includes first and second active regions extending in a first direction, a first gate line extending in a second direction substantially perpendicular to the first direction and crossing the first and second active regions, and a first contact jumper including a first conductive pattern intersecting the first gate line above the first active region and a second conductive pattern extending in the second direction above the first gate line and connected to the first conductive pattern.