A semiconductor device includes: a substrate; a first dielectric layer over the substrate; a memory cell over the substrate in a first region of the semiconductor device, where the memory cell includes a first ferroelectric structure in the first dielectric layer, where the first ferroelectric structure includes a first bottom electrode, a first top electrode, and a first ferroelectric layer in between; and a tunable capacitor over the substrate in a second region of the semiconductor device, where the tunable capacitor includes a second ferroelectric structure, where the second ferroelectric structure includes a second bottom electrode, a second top electrode, and a second ferroelectric layer in between, where at least a portion of the second ferroelectric structure is in the first dielectric layer.

Some embodiments include ferroelectric assemblies. Some embodiments include a capacitor which has ferroelectric insulative material between a first electrode and a second electrode. The capacitor also has a metal oxide between the second electrode and the ferroelectric insulative material. The metal oxide has a thickness of less than or equal to about 30 Å. Some embodiments include a method of forming an assembly. A first capacitor electrode is formed over a semiconductor-containing base. Ferroelectric insulative material is formed over the first electrode. A metal-containing material is formed over the ferroelectric insulative material. The metal-containing material is oxidized to form a metal oxide from the metal-containing material. A second electrode is formed over the metal oxide.

A new class of logic gates are presented that use non-linear polar material. The logic gates include multi-input majority gates and threshold gates. Input signals in the form of analog, digital, or combination of them are driven to first terminals of non-ferroelectric capacitors. The second terminals of the non-ferroelectric capacitors are coupled to form a majority node. Majority function of the input signals occurs on this node. The majority node is then coupled to a first terminal of a capacitor comprising non-linear polar material. The second terminal of the capacitor provides the output of the logic gate, which can be driven by any suitable logic gate such as a buffer, inverter, NAND gate, NOR gate, etc. Any suitable logic or analog circuit can drive the output and inputs of the majority logic gate. As such, the majority gate of various embodiments can be combined with existing transistor technologies.

A semiconductor device includes a work piece comprising a first material, a first side, a second side opposite to the first side, and a first coefficient of thermal expansion (first CTE). Recesses extend into the work piece from the first side and includes a pattern. A second material having a second CTE is within the recesses and is over the first material between the recesses; and A third material having a third CTE is over one of the second side or the second material. The third CTE and the second CTE are different than the first CTE.

Embodiments described herein may be related to apparatuses, processes, and techniques related to stacked MIM capacitors with multiple metal and dielectric layers that include insulating spacers on edges of one or more of the multiple layers to prevent unintended electrical coupling between metal layers during manufacturing. The dielectric layers may include Perovskite-based materials. Other embodiments may be described and/or claimed.

Embodiments of the present disclosure are directed to advanced integrated circuit structure fabrication and, in particular, integrated circuits with high dielectric constant (HiK) interfacial layering between an electrode and a ferroelectric (FE) or anti-ferroelectric (AFE) layer. Other embodiments may be disclosed or claimed.

Embodiments described herein may be related to apparatuses, processes, and techniques related MIM capacitors that have a multiple trench structure to increase a charge density, where a dielectric of the MIM capacitor includes a perovskite-based material. In embodiments, a first electrically conductive layer may be coupled with a top metal layer of the MIM, and/or a second conductive layer may be coupled with a bottom metal layer of the MIM to reduce RC effects. Other embodiments may be described and/or claimed.

Embodiments of the disclosure are directed to advanced integrated circuit structure fabrication and, in particular, to ferroelectric random access memory (FRAM) devices with an enhanced capacitor architecture. Other embodiments may be disclosed or claimed.

The present disclosure provides a memory circuit, a memory device and an operating method of the memory device. The memory device includes a storage transistor, a variable capacitance device and a control transistor. The variable capacitance device is electrically connected to the gate of the storage transistor, and the control transistor is connected to the storage transistor in series.

Embodiments of the disclosure are in the field of advanced integrated circuit structure fabrication and, in particular, to memory devices having ferroelectric capacitors coupled between intersecting bitlines and wordlines. Other embodiments may be disclosed or claimed.