A light-emitting diode chip includes a semiconductor layer sequence having a phosphide compound semiconductor material. The semiconductor layer sequence contains a p-type semiconductor region, an n-type semiconductor region, and an active layer arranged between the p-type semiconductor region and the n-type semiconductor region. The active region serves to emit electromagnetic radiation. The n-type semiconductor region faces a radiation exit area of the light-emitting diode chip, and the p-type semiconductor region faces a carrier of the light-emitting diode chip. A current spreading layer having a thickness of less than 500 nm is arranged between the carrier and the p-type semiconductor region. The current spreading layer has one or a plurality of p-doped Al.sub.xGa.sub.1-xAs layers with 0.5<x≦1.

A display device includes pixel electrodes spaced apart from one another on a substrate; light-emitting elements disposed on the pixel electrodes; a common electrode layer disposed on the light-emitting elements; and an undoped semiconductor layer disposed on the common electrode layer. The display device includes nanostructures disposed in the common electrode layer and spaced apart from one another, and the common electrode layer includes a first common electrode layer disposed between the undoped semiconductor layer and the nanostructures, and a second common electrode layer disposed between adjacent nanostructures and disposed between the light-emitting elements and the nanostructures.

Embodiments of the disclosure provide a backlight module using MJT LEDs and a backlight unit including the same. More specifically, embodiments of the disclosure provide a backlight module, which includes MJT LEDs configured to increase an effective light emitting area of each of light emitting cells and optical members capable of uniformly dispersing light emitted from the MJT LEDs. In addition, embodiments of the disclosure provide a backlight unit using the backlight module, thereby reducing the number of LEDs constituting the backlight unit while allowing operation at low current.

A semiconductor device includes: a first semiconductor structure; a second semiconductor structure on the first semiconductor structure; an active region between the first semiconductor structure and the second semiconductor structure, wherein the active region includes multiple alternating well layers and barrier layers, wherein each of the barrier layers has a band gap, the active region further includes an upper surface facing the second semiconductor structure and a bottom surface opposite the upper surface; an electron blocking region between the second semiconductor structure and the active region, wherein the electron blocking region includes a band gap, and the band gap of the electron blocking region is greater than the band gap of one of the barrier layers; a first aluminum-containing layer between the electron blocking region and the active region, wherein the first aluminum-containing layer has a band gap greater than the band gap of the electron blocking region; a confinement layer between the first aluminum-containing layer and the active region, wherein the confinement layer includes a thickness smaller than the thickness of one of the barrier layers; and a p-type dopant above the bottom surface of the active region and comprising a concentration profile comprising a peak shape having a peak concentration value, wherein the peak concentration value lies in the electron blocking region.

A semiconductor light emitting device includes a conductive substrate and a first metal layer disposed on the substrate. The first metal layer is formed so as to be electrically connected with the substrate, and the first metal layer includes an Au based material. A joining layer is formed on the first metal layer. The joining layer includes a second metal layer including Au and a third metal layer including Au. A metallic contact layer and an insulating layer are formed on the joining layer. A semiconductor layer is formed on the metallic contact layer and the insulating layer and includes a red-based light emitting layer. An electrode is formed on the semiconductor layer and is made of metal. The insulating layer includes a patterned aperture, and at least a part of the metallic contact layer is formed in the aperture.

Provided is a photonic device in which emission intensity in a short wavelength region is suppressed even in the case of increasing carrier injection density so as to obtain a wide spectrum half-maximum width as well as a high output. The photonic device includes: a first cladding layer; a second cladding layer; and an active layer including an emitting layer and a barrier layer and being provided between the first cladding layer and the second cladding layer, the emitting layer emitting light in a spectrum having a center wavelength λc and a spectrum half-maximum width Δλ, in which at least one of the first cladding layer and the second cladding layer includes a light absorbing part for absorbing light having a wavelength of λs or less represented by the following Expression (1):
λs<(λc−(Δλ/2))  (1).

Provided is a photonic device in which emission intensity in a short wavelength region is suppressed even in the case of increasing carrier injection density so as to obtain a wide spectrum half-maximum width as well as a high output. The photonic device includes: a first cladding layer; a second cladding layer; and an active layer including an emitting layer and a barrier layer and being provided between the first cladding layer and the second cladding layer, the emitting layer emitting light in a spectrum having a center wavelength λc and a spectrum half-maximum width Δλ, in which at least one of the first cladding layer and the second cladding layer includes a light absorbing part for absorbing light having a wavelength of λs or less represented by the following Expression (1):
λs<(λc−(Δλ/2))  (1).

A light emitting device includes a first conductivity type semiconductor layer including a first conductivity type dopant, an active layer disposed on the first conductivity type semiconductor layer and including a plurality of barrier layers and a plurality of well layers, an electron blocking structure layer disposed on the active layer, and a second conductivity type semiconductor layer disposed on the electron blocking structure layer. The active layer includes a first barrier layer adjacent to the electron blocking structure layer and a first well layer adjacent to the first barrier layer. The plurality of barrier layers include a first conductivity type dopant. The electron blocking structure layer includes a plurality of semiconductor layers including a second conductivity type dopant and AlGaN-based semiconductor. The plurality of semiconductor layers include a first semiconductor layer having a first region adjacent to the first barrier layer. The first region of the first semiconductor layer includes AlGaN-based semiconductor having aluminum composition of 95% or more. A light emitting structure including the active layer and the electron blocking structure layer emits different peak wavelengths.

A light emitting device includes a first conductivity type semiconductor layer including a first conductivity type dopant, an active layer disposed on the first conductivity type semiconductor layer and including a plurality of barrier layers and a plurality of well layers, an electron blocking structure layer disposed on the active layer, and a second conductivity type semiconductor layer disposed on the electron blocking structure layer. The active layer includes a first barrier layer adjacent to the electron blocking structure layer and a first well layer adjacent to the first barrier layer. The plurality of barrier layers include a first conductivity type dopant. The electron blocking structure layer includes a plurality of semiconductor layers including a second conductivity type dopant and AlGaN-based semiconductor. The plurality of semiconductor layers include a first semiconductor layer having a first region adjacent to the first barrier layer. The first region of the first semiconductor layer includes AlGaN-based semiconductor having aluminum composition of 95% or more. A light emitting structure including the active layer and the electron blocking structure layer emits different peak wavelengths.

A light emitting diode according to one embodiment comprises: a substrate; a light emitting structure including a first conductive semiconductor layer, an active layer, and a second conductive semiconductor layer, which are on the substrate; a first pad electrode part on the first conductive semiconductor layer; a current blocking layer on the second conductive semiconductor layer; a second electrode on the first conductive semiconductor layer and the current blocking layer; and a second pad electrode part on the second electrode, wherein the width of the current blocking layer can become thicker as the current blocking layer becomes closer to the first pad electrode part from the second pad electrode part.