A method for applying a bonding layer that is comprised of a basic layer and a protective layer on a substrate with the following method steps: application of an oxidizable basic material as a basic layer on a bonding side of the substrate, at least partial covering of the basic layer with a protective material that is at least partially dissolvable in the basic material as a protective layer. In addition, the invention relates to a corresponding substrate.

A method and device for input/output connections is provided. Devices and methods for connection structure are shown with improved mechanical properties such as hardness and abrasion resistance. Land grid array structures are provided that are less expensive to manufacture due to reductions in material cost such as gold. Ball grid array structures are provided with improved resistance to corrosion during fabrication. Ball grid array structures are also provided with improved mechanical properties resulting in improved shock testing results.

An anisotropic conductive film or other filler-containing film 10A of the present invention includes a filler dispersed-layer 3 including a resin layer 2, a first filler layer with a filler 1A dispersed in a single layer in the resin layer 2, and a second filler layer with a filler 1B dispersed in a single layer in the resin layer 2 at a depth different from the depth of the first filler layer. The filler 1A of the first filler layer is exposed from one surface 2a of the resin layer 2, or is in close proximity to the surface 2a, and the filler 1B of the second filler layer is exposed from the other surface 2b of the resin layer 2, or is in close proximity to the surface 2b.

An anisotropic conductive film or other filler-containing film 10A of the present invention includes a filler dispersed-layer 3 including a resin layer 2, a first filler layer with a filler 1A dispersed in a single layer in the resin layer 2, and a second filler layer with a filler 1B dispersed in a single layer in the resin layer 2 at a depth different from the depth of the first filler layer. The filler 1A of the first filler layer is exposed from one surface 2a of the resin layer 2, or is in close proximity to the surface 2a, and the filler 1B of the second filler layer is exposed from the other surface 2b of the resin layer 2, or is in close proximity to the surface 2b.

A method and device for input/output connections is provided. Devices and methods for connection structure are shown with improved mechanical properties such as hardness and abrasion resistance. Land grid array structures are provided that are less expensive to manufacture due to reductions in material cost such as gold. Ball grid array structures are provided with improved resistance to corrosion during fabrication. Ball grid array structures are also provided with improved mechanical properties resulting in improved shock testing results.

A semiconductor device includes a semiconductor substrate, a dielectric structure, an electrical insulating and thermal conductive layer and a circuit layer. The electrical insulating and thermal conductive layer is disposed over the semiconductor substrate. The dielectric structure is disposed over the electrical insulating and thermal conductive layer, wherein a thermal conductivity of the electrical insulating and thermal conductive layer is substantially greater than a thermal conductivity of the dielectric structure. The circuit layer is disposed in the dielectric structure.

A semiconductor device includes a semiconductor substrate, a dielectric structure, an electrical insulating and thermal conductive layer and a circuit layer. The electrical insulating and thermal conductive layer is disposed over the semiconductor substrate. The dielectric structure is disposed over the electrical insulating and thermal conductive layer, wherein a thermal conductivity of the electrical insulating and thermal conductive layer is substantially greater than a thermal conductivity of the dielectric structure. The circuit layer is disposed in the dielectric structure.

An integrated fan-out package including a die, an insulating encapsulation, a filler, and a redistribution circuit structure is provided. The insulating encapsulation encapsulates sidewalls of the die, and the insulating encapsulation includes a recess on a top surface thereof. The filler covers the top surface of the insulating encapsulation and is being at least partially filled in the recess. The redistribution circuit structure covers an active surface of the die and the filler while being electrically connected to the die. The redistribution structure includes a dielectric layer covering the die and the filler. In addition, a method of manufacturing integrated fan-out packages is also provided.

A three-dimensional chip stack includes a first chip bonded to a second chip to form an electrical interconnection therebetween. The bonded interconnection includes a first conductive pillar overlying a first substrate of the first chip, a second conductive pillar overlying a second substrate of the second chip, and a joint structure between the first conductive pillar and the second conductive pillar. The joint structure includes a first IMC region adjacent to the first conductive pillar, a second IMC region adjacent to the second conductive pillar, and a metallization layer between the first IMC region and the second IMC region.

A three-dimensional chip stack includes a first chip bonded to a second chip to form an electrical interconnection therebetween. The bonded interconnection includes a first conductive pillar overlying a first substrate of the first chip, a second conductive pillar overlying a second substrate of the second chip, and a joint structure between the first conductive pillar and the second conductive pillar. The joint structure includes a first IMC region adjacent to the first conductive pillar, a second IMC region adjacent to the second conductive pillar, and a metallization layer between the first IMC region and the second IMC region.