The present invention provides a wafer-level fan-out structure and a manufacturing method thereof. The wafer-level fan-out structure includes a plurality of chips, a sheet-like structure and a plastic packaging layer. The plastic packaging layer covers the plurality of chips and the sheet-like structure. The sheet-like structure includes a first region and a second region. The first region includes a plurality of spaced apertures, and each aperture is adjacent to the second region. The plurality of chips and the plurality of apertures are in one-to-one correspondence, and each chip is located in the corresponding aperture. A Young’s modulus of the plastic packaging layer is smaller than that of the sheet-like structure, and a ratio of an area of the first region to an area of the second region is (0.5-2):1. The wafer-level fan-out structure can remarkably reduce package warpage and achieves better package strength.

A semiconductor package includes a bottom substrate and a top substrate space apart from the bottom substrate such that the bottom substrate and the top substrate define a gap therebetween. A logic die is mounted on a top surface of the bottom substrate in a flip-chip fashion. The logic die has a thickness of 125-350 micrometers. The logic die comprises an active front side, a passive rear side, and an input/output pad provided on the active front side. A plurality of copper cored solder balls is disposed between the bottom substrate and the top substrate around the logic die to electrically connect the bottom substrate with the top substrate. A sealing resin fills in the gap between the bottom substrate and the top substrate and seals the logic die and the plurality of copper cored solder balls in the gap.

Semiconductor memory dies bonded to logic dies and associated systems and methods are disclosed. In an embodiment, a semiconductor die assembly includes a logic die and one or more memory dies directly bonded to the logic die. The logic die includes integrated circuits generated using relatively high temperature process steps whereas the memory dies include memory cells with materials generated using relatively low temperature process steps. The logic die and the memory dies have been separately fabricated in two different wafers such that process steps generating them can be optimized independently of each other. The resulting semiconductor device including the memory dies bonded to the logic die functions as a single device as if they were formed in a monolithic substrate. The resulting semiconductor device may be configured to perform artificial intelligence tasks.

A semiconductor package includes a first semiconductor chip, a second semiconductor chip on the first semiconductor chip, a first semiconductor structure and a second semiconductor structure that are on the first semiconductor chip and spaced apart from each other across the second semiconductor chip, and a resin-containing member between the second semiconductor chip and the first semiconductor structure and between the second semiconductor chip and the second semiconductor structure. The semiconductor package may be fabricated at a wafer level.

Provided is a semiconductor structure, configured to form a pad, including a substrate, a top-layer conductive line, N layers of secondary-top-layer conductive lines and a plurality of dielectric layers, N being an integer greater than or equal to 2. The top-layer conductive line and the N layers of the secondary-top-layer conductive lines are arranged above the substrate. The N layers of the secondary-top-layer conductive lines are arranged on a side of the top-layer conductive line close to the substrate. Each of the plurality of dielectric layers is located between two respective adjacent layers of the secondary-top-layer conductive lines in a vertical direction. For the N layers of the secondary-top-layer conductive lines, an area in which projections of any two layers of the secondary-top-layer conductive lines on a top surface of the substrate overlap with each other is less than a first threshold.

A display device includes a display panel including a display area and a non-display area defined therein and including a plurality of signal pads overlapping the non-display area, an electronic component including a base layer with an upper surface and a lower surface, a plurality of driving pads disposed on the lower surface of the base layer, and a plurality of driving bumps respectively disposed on the plurality of driving pads, the plurality of driving bumps being respectively connected to the signal pads, and a filler disposed between the display panel and the electronic component. A first hole is defined in the upper surface of the base layer, and the first hole does not overlap the plurality of driving bumps in a plan view.

A semiconductor structure is disclosed. The semiconductor structure includes: a semiconductor substrate including a front surface and a back surface; a backside metallization layer formed over the semiconductor substrate, the backside metallization layer being closer to the back surface than to the front surface of the semiconductor substrate, at least a portion of the backside metallization layer forming an inductor structure; and an electrically non-conductive material formed in the semiconductor substrate, the electrically non-conductive material at least partially overlapping the inductor structure from a top view, and the electrically non-conductive material including a top surface, a bottom surface, and sidewalls, the top surface being adjacent to the back surface of the semiconductor substrate. A method for manufacturing a semiconductor structure is also disclosed.

A display device includes a display panel including a display area and a non-display area defined therein and including a plurality of signal pads overlapping the non-display area, an electronic component including a base layer with an upper surface and a lower surface, a plurality of driving pads disposed on the lower surface of the base layer, and a plurality of driving bumps respectively disposed on the plurality of driving pads, the plurality of driving bumps being respectively connected to the signal pads, and a filler disposed between the display panel and the electronic component. A first hole is defined in the upper surface of the base layer, and the first hole does not overlap the plurality of driving bumps in a plan view.

A semiconductor device according to the invention of the present application includes a support, a semiconductor chip provided on the support and a die bond material for bonding a back surface of the semiconductor chip to the support, wherein a plurality of cutouts is formed at edges formed between the back surface and side surfaces of the semiconductor chip connected to the back surface, and the die bond material is provided integrally over the plurality of cutouts.

A semiconductor device includes a die stack having dies selected into the stack based on their thicknesses. After the dies are formed on a wafer and thinned, a metrology tool is used to determine the thicknesses of the dies in the wafer. These thicknesses are stored in a known thickness die (KTD) map, along with other information such as their standard and average deviations and their classification into a binning class. In one example, dies which have been classified into bin 1 (having an optimal thickness) are selected to provide a high capacity highly reliable semiconductor device. In a further example, dies of different bins are mixed and matched to provide a uniform, highly controlled overall die stack height.