A germanium waveguide is formed from a P-type silicon substrate that is coated with a heavily-doped N-type germanium layer and a first N-type doped silicon layer. Trenches are etched into the silicon substrate to form a stack of a substrate strip, a germanium strip, and a first silicon strip. This structure is then coated with a silicon nitride layer.

A method of manufacturing a semiconductor optical device includes a step of bonding a semiconductor element to a substrate that includes silicon, the semiconductor element being made of a III-V compound semiconductor and having optical gain; after the step of bonding the semiconductor element, a step of molding the semiconductor element by wet-etching; and after the step of molding the semiconductor element, a step of forming a mesa at the semiconductor element. The substrate includes a waveguide, a groove that extends along the waveguide, a terrace that is positioned on a side of the groove opposite to the waveguide, and a wall that covers the groove. The step of bonding the semiconductor element is a step of bonding the semiconductor element to the waveguide, the groove, the terrace, and the wall of the substrate.

Embodiments of the present disclosure are directed to a semiconductor optical amplifier including a semiconductor-based gain medium configured to receive a drive current and a variable-width waveguide coupled to the in the semiconductor-based gain medium, the variable-width waveguide including a plurality of narrow width regions and a plurality of wide width regions positioned alternately along a longitudinal axis of the waveguide. The variable-width waveguide further includes a plurality of transition regions having an adiabatically varying widths. Each transition region connects adjacent ones of the plurality of narrow width and width regions and the waveguide has a reduced drive current density in the plurality of wide width regions relative to the drive current density in the plurality of narrow width regions.

A method for forming a contact surface on a top of a mesa structure formed on a semiconductor substrate deposited with an insulating layer. The method includes depositing a first resist layer over the insulating layer, depositing a second resist layer over the first resist layer, defining a first portion of the second resist layer, wherein the first portion overlaps the top of the mesa structure, forming a first opening in the first portion by treating the second resist layer to expose a second portion of the first resist layer beneath thereof, forming a second opening in the first resist layer, by treating the exposed second portion to expose a third portion of the insulating layer beneath thereof, and etching the exposed third portion to form the contact surface on the top of the mesa structure.

A semiconductor laser device of an edge emission type, where a waveguide mode is multi-mode, is provided. The semiconductor laser device includes a first facet of the waveguide on an emission direction front side, the first facet having a first width in a horizontal direction perpendicular to a longitudinal direction of the waveguide; and a second facet of the waveguide on an emission direction rear side, the second facet having the first width, wherein a width of the waveguide, in the horizontal direction, is at least partially narrower than the first width, between the first facet and the second facet.

An optical device is provided that includes a waveguide layer and at least one grating structure. A coupling coefficient of the at least one grating structure to a fundamental optical mode supported by the waveguide layer is greater than a coupling coefficient of the at least one grating structure to at least one higher order transverse optical mode supported by the waveguide layer.

Embodiments of the present disclosure may relate to a digitized grating that may include a first unit cell that has a first period and a first length, where the first period includes a first grating element width and a first space between adjacent grating elements, and where the first length includes a number of first periods. The digitized grating may further include a second unit cell that has a second period and a second length, where the second period is different than the first period and includes a second grating element width and a second space between adjacent grating elements, and where the second length includes a number of second periods.

Structures for response shaping in frequency and time domain, include an optical response shaper and/or a modulator device with multiple injection. The device comprises a resonator having an enclosed geometric structure, for example a ring or racetrack structure, at least two injecting optical waveguides approaching the resonator to define at least two coupling regions between the resonator and the injecting waveguides, and may define at least two Free Spectral Range states. One or both of the coupling regions has a coupling coefficient selected for a predetermined frequency or time response, and the coupling coefficient or other device parameters may be variable, in some case in real time to render the response programmably variable.

Methods for designing a mode-selective optical device including one or more optical interfaces defining an optical cavity include: defining a loss function within a simulation space encompassing the optical device, the loss function corresponding to an electromagnetic field having an operative wavelength within the optical device resulting from an interaction between an input electromagnetic field at the operative wavelength and the one or more optical interfaces of the optical device; defining an initial structure for each of the one or more optical interfaces, each initial structure being defined using a plurality of voxels; determining values for at least one structural parameter and/or at least one functional parameter of the one or more optical interfaces by solving Maxwell's equations; and defining a final structure of the one or more optical interfaces based on the values for the one or more structural and/or functional parameters.

A quantum cascade laser includes a first and a second mesa waveguides disposed on a substrate, a first electrode, a second electrode, and a current blocking region disposed burying the first and second mesa waveguides. The first and second mesa waveguides extend in a first direction. The first and second mesa waveguides are arranged apart from each other by a distance in a second direction intersecting with the first direction. The current blocking region has a first portion disposed between the first and second mesa waveguides and a second portion disposed on the first portion. The end of the first electrode and the end of the second electrode are facing each other in the second direction. The second portion protrudes from a reference plane which includes a surface of the end of the first electrode and extends in the first and second directions.