A resonator includes a substrate, an acoustic Bragg mirror disposed above the substrate, and a bottom metal layer disposed above the acoustic Bragg mirror. The resonator also includes a piezoelectric plate disposed above the bottom metal layer. The resonator further includes a top metal layer disposed above the piezoelectric plate. The top metal layer comprises multiple fingers within a single plane and the width of each of the fingers is between 75%-125% of a thickness of the piezoelectric plate.

Acoustic resonators, filters, and methods. An acoustic resonator includes a substrate, piezoelectric plate, and a diaphragm comprising a portion of the piezoelectric plate spanning a cavity in a substrate. An interdigital transducer (IDT) on a front surface of the piezoelectric plate includes first and second sets of interleaved interdigital transducer (IDT) fingers extending from first and second busbars respectively. The interleaved IDT fingers are on the diaphragm. Overlapping portions of the interleaved IDT fingers define an aperture of the acoustic resonator. A first dielectric strip overlaps the IDT fingers in a first margin of the aperture and extends into a first gap between the first margin and the first busbar. A second dielectric strip overlaps the IDT fingers in a second margin of the aperture and extends into a second gap between the second margin and the second busbar.

In one embodiment, a resonator device includes a substrate comprising a piezoelectric material and a set of electrodes on the substrate. The electrodes are in parallel and a width of the electrodes is equal to a distance between the electrodes. The resonator device further includes a set of switches, with each switch coupled to a respective electrode. The switches are to connect to opposite terminals of an alternating current (AC) signal source and select between the terminals of the AC signal source based on an input signal.

An acoustic wave device includes a support including a cavity, a piezoelectric layer on or above the support and made of one of lithium niobate or lithium tantalate, an interdigital transducer electrode embedded in the piezoelectric layer and including surfaces opposed to each other in a thickness direction, one of the surfaces being in contact with the piezoelectric layer, and a dielectric film on the piezoelectric layer and covering the interdigital transducer electrode. The interdigital transducer electrode includes electrode fingers, at least one of which overlaps the cavity in plan view. Assuming a thickness of the piezoelectric layer is d and an electrode finger pitch of the interdigital transducer electrode is p, p/d≥ about 4.25.

An elastic wave device includes a supporting substrate, an acoustic reflection layer on the supporting substrate, a piezoelectric layer on the acoustic reflection layer, and an IDT electrode on the piezoelectric layer. The acoustic reflection layer includes three or more low-acoustic impedance layers and two or more high-acoustic impedance layers. At least one of a first relationship in which in which, a film thickness of a first low-acoustic impedance layer closest to the piezoelectric layer is thinner than a film thickness of a low-acoustic impedance layer closest to the first low-acoustic impedance layer, and a second relationship in which a film thickness of a first high-acoustic impedance layer closest to the piezoelectric layer is thinner than a film thickness of a high-acoustic impedance layer closest to the first high-acoustic impedance layer, is satisfied.

A transducer structure for a surface acoustic device comprises a composite substrate comprising a piezoelectric layer, a pair of inter-digitated comb electrodes, comprising a plurality of electrode means with a pitch p satisfying the Bragg condition, wherein the inter-digitated comb electrodes are embedded in the piezoelectric layer such that, in use, the excitation of a wave propagating mode in the volume of the electrode means is taking place and is the predominant propagating mode of the structure. The present disclosure relates also to an acoustic wave device comprising at least one transducer structure as described above and to a method for fabricating the transducer structure. The present disclosure relates also to the use of the frequency of the bulk wave propagating in the electrode means of the transducer structure in an acoustic wave device to generate contribution at high frequency, in particular, above 3 GHz.

An acoustic wave device includes a piezoelectric substrate and an IDT electrode including electrode fingers, a first layer on the piezoelectric substrate, and a second layer on the first layer and including Cu as a main component. The first layer includes a first principal surface on a side closest to the piezoelectric substrate and a second principal surface in contact with the second layer. The second layer includes a third principal surface in contact with the first layer, a fourth principal surface opposite to the third principal surface, and a side surface connected to the third and fourth principal surfaces. The IDT electrode includes a barrier layer on the side surface of the second layer. A boundary between the side surface of the second layer and the barrier layer is on the second principal surface of the first layer, and the barrier layer does not reach the piezoelectric substrate.

An acoustic wave device includes a piezoelectric substrate and an IDT electrode including electrode fingers, a barrier layer on the piezoelectric substrate, and a first layer on the barrier layer, and including Cu as a main component. The first layer includes a first principal surface on a side closest to the piezoelectric substrate, a second principal surface opposite to the first principal surface, and a side surface connected to the first principal surface and the second principal surface. The barrier layer covers the first principal surface 5a and the side surface of the first layer. A thickness of a portion of the barrier layer covering the first principal surface of the first layer is smaller than a thickness of a portion of the barrier layer covering the side surface of the first layer.

An acoustic wave device includes a support substrate including a cavity portion and a support portion, a piezoelectric film on the support portion and including a first and second main surfaces, a functional electrode on the first main surface, and a heat dissipation film on at least one of the first and second main surfaces and includes a semiconductor or an insulator. The functional electrode includes at least one pair of first and second electrodes. When a thickness of the piezoelectric film is dx and a middle-to-middle distance between the first and second electrodes is p, dx/p is about 0.5 or less. The heat dissipation film overlaps at least a portion of the support portion in plan view. A thermal conductivity of the heat dissipation film is higher than a thermal conductivity of the piezoelectric film, and a thickness of the heat dissipation film is less than the thickness of the piezoelectric film.

A micro-electrical-mechanical system (MEMS) guided wave device includes a piezoelectric layer including multiple thinned regions of different thicknesses each bounding in part a different recess, different groups of electrodes on or adjacent to different thinned regions and arranged for transduction of lateral acoustic waves of different wavelengths in the different thinned regions, and at least one bonded interface between the piezoelectric layer and a substrate. Optionally, a buffer layer may be intermediately bonded between the piezoelectric layer and the substrate. Methods of producing such devices include locally thinning a piezoelectric layer to define multiple recesses, bonding the piezoelectric layer on or over a substrate layer to cause the recesses to be bounded in part by either the substrate or an optional buffer layer, and defining multiple groups of electrodes on or over the different thinned regions.