An AT-cut crystal resonator plate (2) includes a first main surface (2a) on which a first excitation electrode (211) is formed and a second main surface (2b) on which a second excitation electrode (212) is formed. The AT-cut crystal resonator plate (2) further includes: a substantially rectangular-shaped vibrating part (21) that is piezoelectrically vibrated when a voltage is applied to the first excitation electrode (211) and the second excitation electrode (212); a holding part (22) protruding from a corner part (21a) of the vibrating part (21) in a Z′ axis direction of the AT-cut crystal; and an external frame part (23) configured to surround an external circumference of the vibrating part (21) and to hold the holding part (22).

An elastic wave device includes a support substrate made of silicon, a piezoelectric film disposed directly or indirectly on the support substrate, and an interdigital transducer electrode disposed on one surface of the piezoelectric film. A higher-order mode acoustic velocity of propagation through the piezoelectric film is equal or substantially equal to an acoustic velocity V.sub.si=(V.sub.1).sup.1/2 of propagation through silicon or higher than the acoustic velocity V.sub.si, where V.sub.si is specified by V.sub.1 among solutions V.sub.1, V.sub.2, and V.sub.3 with respect to x derived from Ax.sup.3+Bx.sup.2+Cx+D=0.

An elastic wave device includes a support substrate made of silicon, a piezoelectric film disposed directly or indirectly on the support substrate, and an interdigital transducer electrode disposed on one surface of the piezoelectric film. A higher-order mode acoustic velocity of propagation through the piezoelectric film is equal or substantially equal to an acoustic velocity V.sub.si=(V.sub.1).sup.1/2 of propagation through silicon or higher than the acoustic velocity V.sub.si, where V.sub.si is specified by V.sub.1 among solutions V.sub.1, V.sub.2, and V.sub.3 with respect to x derived from Ax.sup.3+Bx.sup.2+Cx+D=0.

A surface acoustic wave device includes a piezoelectric substrate, an interdigital transducer (IDT) electrode on the substrate, a cover over the substrate and IDT electrode, and hollow spaces between the IDT electrode and the cover. The hollow spaces are defined by partition supports between the substrate and the cover. The partition supports include a first and second partition supports extending in a first direction without contacting each other. The first and second partition supports each include first and second ends along the first direction. The first and second direction perpendicular to the first direction. The first end of the first partition support is closer to an outer periphery of the substrate than is the second end, and the first end of the second partition support is farther away from the outer periphery than is the second end.

A high-frequency apparatus includes a resin substrate, a first device including a substrate and provided on the resin substrate, and a second device provided adjacent to the first device on the resin substrate. Each of the first device and the second device includes an acoustic wave device. The second device includes a piezoelectric substrate and a functional element provided on the piezoelectric substrate. The substrate of the first device includes Si or a laminated material including Si. The piezoelectric substrate of the second device includes LiTaO.sub.3, LiNbO.sub.3, or a laminated material including LiTaO.sub.3 or LiNbO.sub.3. The resin substrate includes glass.

Methods for forming a film bulk acoustic resonator (FBAR) are provided. In the method, formation of several mutually overlapped and hence connected sacrificial material layers above and under a resonator sheet facilitates the removal of the sacrificial material layers. Cavities left after the removal overlap at a polygonal area with non-parallel sides. This reduces the likelihood of boundary reflections of transverse parasitic waves causing standing wave resonance in the FBAR, thereby enhancing its performance in parasitic wave crosstalk. Further, according to the disclosure, the FBAR is enabled to be integrated with CMOS circuitry and hence exhibits higher reliability.

An electronic component includes: a first substrate having a first surface; a second substrate having a second surface facing the first surface across an air gap; a first coil pattern that is located on the first surface so as to face the second surface across the air gap; a second coil pattern that is located in a second region on the second surface and faces the first surface across the air gap, at least a part of the second region overlapping with a first region in plan view, the first region being formed of a region in which the first coil pattern is located and a region surrounded by the first coil pattern; and a connection terminal connecting the first coil pattern and the second coil pattern.

A piezoelectric device includes a support substrate, an intermediate layer on the support substrate, a piezoelectric layer on the intermediate layer, a functional element on the piezoelectric layer, an insulation layer, and a wiring electrode. The insulation layer is on the support substrate and in contact with the intermediate layer and the piezoelectric layer. The wiring electrode extends from a top of the insulation layer to a top of the piezoelectric layer and is connected to the functional element. The insulation layer includes first and second regions. The first region is thinner than a thickness of the multilayer body. The second region connects the first region and the multilayer body, and includes a portion slanted from the first region toward an upper surface of the piezoelectric layer. The second region of the insulation layer does not extend to the top of the piezoelectric layer.

The invention relates to a method for manufacturing an electroacoustic resonator comprising the steps of: Providing a first substrate having a first side and an opposite second side; depositing a diamond layer having a first side and an opposite second side on said first substrate, wherein the second side of the diamond layer is in contact with said first side of the first substrate; removing the first substrate; forming a piezoelectric layer on the second side of the diamond layer; applying a second substrate to the first side of the diamond layer.

The invention relates to a method for manufacturing an electroacoustic resonator comprising the steps of: Providing a first substrate having a first side and an opposite second side; depositing a diamond layer having a first side and an opposite second side on said first substrate, wherein the second side of the diamond layer is in contact with said first side of the first substrate; removing the first substrate; forming a piezoelectric layer on the second side of the diamond layer; applying a second substrate to the first side of the diamond layer.