Patent classifications
H03H9/17
Bulk acoustic resonator
A bulk acoustic resonator includes: a substrate; a first electrode disposed on the substrate; a piezoelectric layer disposed to cover at least a portion of the first electrode; a second electrode disposed to cover at least a portion of the piezoelectric layer; a metal pad connected to the first electrode and the second electrode; and a protective layer disposed to cover at least the metal pad.
Bulk acoustic resonator
A bulk acoustic resonator includes: a substrate; a first electrode disposed on the substrate; a piezoelectric layer disposed to cover at least a portion of the first electrode; a second electrode disposed to cover at least a portion of the piezoelectric layer; a metal pad connected to the first electrode and the second electrode; and a protective layer disposed to cover at least the metal pad.
ACOUSTIC WAVE DEVICE
An acoustic wave device includes a piezoelectric layer, first and second upper electrodes, first and second lower electrodes, and first and second acoustic reflection films. In plan view, first and second resonator portions are respectively defined by portions where the first upper electrode and the first lower electrode overlap and where the second upper electrode and the second lower electrode overlap. The first and second acoustic reflection films respectively include first and second metal layers. First and second overlapping portions are respectively defined by portions where only the first upper electrode overlaps with the first metal layer and where only the second upper electrode overlaps with the second metal layer. An area of the first resonator portion is smaller than an area of the second resonator portion and an area of the first overlapping portion is larger than an area of the second overlapping portion.
BAW RESONANCE DEVICE, FILTER DEVICE AND RF FRONT-END DEVICE
A BAW resonance device, a filter device and an RF front-end device are provided. The BAW resonance device comprises a first passive part including a first substrate and a first heat-dissipation layer located over the first substrate; a first active part including a first piezoelectric layer, a first electrode layer and a second electrode layer, wherein the first piezoelectric layer is located over the first passive part and has a first side and a second side opposite to the first side, the first passive part is located on the first side, the first electrode layer is also located on the first side and is disposed between the first passive part and the first piezoelectric layer, and the second electrode layer is located on the second side; and a first cavity located on the first side and disposed between the first passive part and the first piezoelectric layer, wherein at least one part of the first electrode layer is located on or in the first cavity. The first heat-dissipation layer can improve or flexibly adjust the heat-dissipation performance of the SAW resonance device.
BAW RESONANCE DEVICE, FILTER DEVICE AND RF FRONT-END DEVICE
A BAW resonance device, a filter device and an RF front-end device are provided. The BAW resonance device comprises a first passive part including a first substrate and a first heat-dissipation layer located over the first substrate; a first active part including a first piezoelectric layer, a first electrode layer and a second electrode layer, wherein the first piezoelectric layer is located over the first passive part and has a first side and a second side opposite to the first side, the first passive part is located on the first side, the first electrode layer is also located on the first side and is disposed between the first passive part and the first piezoelectric layer, and the second electrode layer is located on the second side; and a first cavity located on the first side and disposed between the first passive part and the first piezoelectric layer, wherein at least one part of the first electrode layer is located on or in the first cavity. The first heat-dissipation layer can improve or flexibly adjust the heat-dissipation performance of the SAW resonance device.
RESONATOR AND RESONANCE DEVICE
A vibration member is provided that includes a base with front and rear ends opposite to each other, and vibration arms fixed to the front end, extending away therefrom, and including at least one first vibration arm and a pair of second vibration arms positioned on both sides of a first vibration arm group including the at least one first vibration arm in a direction intersecting a longitudinal direction. A holding arm is provided that has one end connected to the base and the other end connected to a frame. A plurality of vibration portions include a piezoelectric film, and a lower electrode and an upper electrode that sandwich the piezoelectric film. A connection wiring line that connects the respective upper electrodes of the pair of second vibration arms to each other is provided in a region of at least either of the base or the holding arm.
RESONATOR AND RESONANCE DEVICE
A vibration member is provided that includes a base with front and rear ends opposite to each other, and vibration arms fixed to the front end, extending away therefrom, and including at least one first vibration arm and a pair of second vibration arms positioned on both sides of a first vibration arm group including the at least one first vibration arm in a direction intersecting a longitudinal direction. A holding arm is provided that has one end connected to the base and the other end connected to a frame. A plurality of vibration portions include a piezoelectric film, and a lower electrode and an upper electrode that sandwich the piezoelectric film. A connection wiring line that connects the respective upper electrodes of the pair of second vibration arms to each other is provided in a region of at least either of the base or the holding arm.
ACOUSTIC WAVE DEVICE
An acoustic wave device includes a piezoelectric substrate and an IDT electrode including electrode fingers. A portion of the IDT electrode in which the electrode fingers overlap with each other in a propagation direction of an acoustic wave is an intersecting region. The intersecting region includes a central region on a center side in an extending direction of the electrode fingers, and a first region and a second region located on respective sides of the central region in the extending direction of the electrode fingers. In the central region, a dielectric film is provided between the electrode fingers, and the dielectric film does not overlap with at least a portion of the electrode fingers when seen in plan view.
ACOUSTIC WAVE DEVICE
An acoustic wave device includes a piezoelectric substrate and an IDT electrode including electrode fingers. A portion of the IDT electrode in which the electrode fingers overlap with each other in a propagation direction of an acoustic wave is an intersecting region. The intersecting region includes a central region on a center side in an extending direction of the electrode fingers, and a first region and a second region located on respective sides of the central region in the extending direction of the electrode fingers. In the central region, a dielectric film is provided between the electrode fingers, and the dielectric film does not overlap with at least a portion of the electrode fingers when seen in plan view.
ACOUSTIC WAVE DEVICE
An acoustic wave device includes a support substrate, a piezoelectric layer overlapping the support substrate viewed in a first direction, a functional electrode on at least a first main surface of the piezoelectric layer, and a wiring electrode connected to the functional electrode. A space is provided on a second main surface side opposite to the first main surface of the piezoelectric layer. The space is covered with the piezoelectric layer, the wiring electrode covers a portion of the functional electrode, and an air gap or an insulating film is provided between the functional electrode and the wiring electrode in a region where the functional electrode is covered with the wiring electrode.