An acoustic wave device includes a support substrate, a piezoelectric layer overlapping the support substrate viewed in a first direction, a functional electrode on at least a first main surface of the piezoelectric layer, and a wiring electrode connected to the functional electrode. A space is provided on a second main surface side opposite to the first main surface of the piezoelectric layer. The space is covered with the piezoelectric layer, the wiring electrode covers a portion of the functional electrode, and an air gap or an insulating film is provided between the functional electrode and the wiring electrode in a region where the functional electrode is covered with the wiring electrode.

An acoustic wave device includes a piezoelectric substrate, a first interdigital transducer electrode on the piezoelectric substrate, and a first reflector and a second reflector. The first interdigital transducer electrode, the first reflector, and the second reflector each include a plurality of electrode fingers. At least one of the first interdigital transducer electrode, the first reflector, and the second reflector has a nonuniform duty ratio area where three successive electrode fingers in an acoustic wave propagation direction all have different duty ratios.

An acoustic wave device includes a piezoelectric substrate, a first interdigital transducer electrode on the piezoelectric substrate, and a first reflector and a second reflector. The first interdigital transducer electrode, the first reflector, and the second reflector each include a plurality of electrode fingers. At least one of the first interdigital transducer electrode, the first reflector, and the second reflector has a nonuniform duty ratio area where three successive electrode fingers in an acoustic wave propagation direction all have different duty ratios.

An acoustic wave device includes a support substrate, an inorganic film over the support substrate, a piezoelectric layer over the inorganic film, and an electrode over the piezoelectric layer. A portion of the support substrate includes a hollow that overlaps at least a portion of the electrode in a thickness direction of the support substrate. An inner wall of the inorganic film is located farther from the hollow than a location on an inner wall of the support substrate, the location being closest to the piezoelectric layer, the inner wall of the support substrate defining the hollow.

The present disclosure provides a single crystal film bulk acoustic resonator, a manufacturing method for a single crystal film bulk acoustic resonator, and a filter, and relates to the technical field of filters. The method includes: sequentially forming a buffer layer, a piezoelectric layer, and a first electrode that are stacked on a temporary base substrate; forming a first bonding layer on the first electrode; providing a substrate; etching the substrate to form a plurality of first bumps on a surface of the substrate; forming a second bonding layer covering top surfaces of the plurality of first bumps on the surface of the substrate; and bonding the second bonding layer located at the top surfaces of the plurality of first bumps to the first bonding layer. During bonding, the area of the top surfaces of the first bumps can be controlled by etched grooves, so the area of the second bonding layer located at the top surfaces of the first bumps can be controlled, thereby realizing the control of a bonding area. By controlling the bonding area, the balance between the bonding requirement and the bonding reliability is realized.

The present disclosure relates to a Bulk Acoustic Wave (BAW) resonator with tunable electromechanical coupling. The disclosed BAW resonator includes a bottom electrode, a top electrode, and a multilayer transduction structure sandwiched therebetween. Herein, the multilayer transduction structure is composed of multiple transduction layers, and at least one of the transduction layers is formed of a ferroelectric material, whose polarization will vary with an electric field across the ferroelectric material. Upon adjusting direct current (DC) bias voltage across the bottom electrode and the top electrode, an overall polarization of the multilayer transduction structure and an overall electromechanical coupling coefficient of the multilayer transduction structure are capable of being changed. Once the change of the overall electromechanical coupling coefficient of the multilayer transduction structure is completed, the overall electromechanical coupling coefficient of the multilayer transduction structure will remain unchanged after removing the DC bias voltage.

The present disclosure relates to a Bulk Acoustic Wave (BAW) resonator, which includes a bottom electrode, a top electrode structure, and a ferroelectric layer sandwiched in between. Herein, the ferroelectric layer is formed of a ferroelectric material, which has a box-shape polarization-electric field (P-E) curve. The ferroelectric layer includes a ferroelectric border (BO) portion positioned at a periphery of the ferroelectric layer and a ferroelectric central portion surrounded by the ferroelectric BO portion. The ferroelectric BO portion has a first polarization and a first electromechanical coupling coefficient, and the ferroelectric central portion has a second polarization and a second electromechanical coupling coefficient. An absolute value of the first polarization is less than an absolute value of the second polarization, and the first electromechanical coupling coefficient is less than the second electromechanical coupling coefficient. The ferroelectric central portion is configured to provide a resonance of the BAW resonator.

The present disclosure relates to a Bulk Acoustic Wave (BAW) resonator, which includes a bottom electrode, a top electrode structure, and a ferroelectric layer sandwiched in between. Herein, the ferroelectric layer is formed of a ferroelectric material, which has a box-shape polarization-electric field (P-E) curve. The ferroelectric layer includes a ferroelectric border (BO) portion positioned at a periphery of the ferroelectric layer and a ferroelectric central portion surrounded by the ferroelectric BO portion. The ferroelectric BO portion has a first polarization and a first electromechanical coupling coefficient, and the ferroelectric central portion has a second polarization and a second electromechanical coupling coefficient. An absolute value of the first polarization is less than an absolute value of the second polarization, and the first electromechanical coupling coefficient is less than the second electromechanical coupling coefficient. The ferroelectric central portion is configured to provide a resonance of the BAW resonator.

A bulk-acoustic wave resonator may include: a substrate; a resonator unit including a first electrode disposed on the substrate, a piezoelectric layer disposed on the first electrode, and a second electrode disposed on the piezoelectric layer; and a protective layer disposed on a surface of the resonator unit. The protective layer is formed of a diamond film, and a grain size of the diamond film is 50 nm or more.

A multiplexer includes a transmission-side filter electrically connected to a common terminal and a transmission input terminal, and a transmission-side filter electrically connected to the common terminal and a transmission input terminal. The transmission-side filter includes a plurality of series arm resonators and a plurality of parallel arm resonators. Capacitance elements are respectively electrically connected in parallel to the series arm resonator and the parallel arm resonator, which are connected most proximately to the common terminal. IDT electrodes of a series arm resonator and a parallel arm resonator connected most proximately to the common terminal do not include a thinning electrode, and others of the series arm resonators and the parallel arm resonators include thinning electrodes.