Various RF plasma systems are disclosed that do not require a matching network. In some embodiments, the RF plasma system includes an energy storage capacitor; a switching circuit coupled with the energy storage capacitor, the switching circuit producing a plurality of pulses with a pulse amplitude and a pulse frequency, the pulse amplitude being greater than 100 volts; a resonant circuit coupled with the switching circuit. In some embodiments, the resonant circuit includes: a transformer having a primary side and a secondary side; and at least one of a capacitor, an inductor, and a resistor. In some embodiments, the resonant circuit having a resonant frequency substantially equal to the pulse frequency, and the resonant circuit increases the pulse amplitude to a voltage greater than 2 kV.

A semiconductor device includes a setting circuit and a reset circuit. The setting circuit includes a latch circuit having first and second inverters driven by a first power voltage whose level is fixed and a first transistor which is switched between an ON state and an OFF state on the basis of a level of a second power voltage whose level varies depending on a surrounding environment, and sets data corresponding to a reference voltage to the latch circuit in response to the first transistor being switched to the ON state. The reset circuit includes an N-type second transistor connected to an output of the first inverter and an input of the second inverter. The second transistor sets data corresponding to the reference voltage to the latch circuit in response to the second voltage being equal to or lower than a predetermined voltage value.

A semiconductor device includes a setting circuit and a reset circuit. The setting circuit includes a latch circuit having first and second inverters driven by a first power voltage whose level is fixed and a first transistor which is switched between an ON state and an OFF state on the basis of a level of a second power voltage whose level varies depending on a surrounding environment, and sets data corresponding to a reference voltage to the latch circuit in response to the first transistor being switched to the ON state. The reset circuit includes an N-type second transistor connected to an output of the first inverter and an input of the second inverter. The second transistor sets data corresponding to the reference voltage to the latch circuit in response to the second voltage being equal to or lower than a predetermined voltage value.

A semiconductor device includes a setting circuit and a reset circuit. The setting circuit includes a latch circuit having first and second inverters driven by a first power voltage whose level is fixed and a first transistor which is switched between an ON state and an OFF state on the basis of a level of a second power voltage whose level varies depending on a surrounding environment, and sets data corresponding to a reference voltage to the latch circuit in response to the first transistor being switched to the ON state. The reset circuit includes an N-type second transistor connected to an output of the first inverter and an input of the second inverter. The second transistor sets data corresponding to the reference voltage to the latch circuit in response to the second voltage being equal to or lower than a predetermined voltage value.

Various RF plasma systems are disclosed that do not require a matching network. In some embodiments, the RF plasma system includes an energy storage capacitor; a switching circuit coupled with the energy storage capacitor, the switching circuit producing a plurality of pulses with a pulse amplitude and a pulse frequency, the pulse amplitude being greater than 100 volts; a resonant circuit coupled with the switching circuit. In some embodiments, the resonant circuit includes: a transformer having a primary side and a secondary side; and at least one of a capacitor, an inductor, and a resistor. In some embodiments, the resonant circuit having a resonant frequency substantially equal to the pulse frequency, and the resonant circuit increases the pulse amplitude to a voltage greater than 2 kV.

Various RF plasma systems are disclosed that do not require a matching network. In some embodiments, the RF plasma system includes an energy storage capacitor; a switching circuit coupled with the energy storage capacitor, the switching circuit producing a plurality of pulses with a pulse amplitude and a pulse frequency, the pulse amplitude being greater than 100 volts; a resonant circuit coupled with the switching circuit. In some embodiments, the resonant circuit includes: a transformer having a primary side and a secondary side; and at least one of a capacitor, an inductor, and a resistor. In some embodiments, the resonant circuit having a resonant frequency substantially equal to the pulse frequency, and the resonant circuit increases the pulse amplitude to a voltage greater than 2 kV.

A pulse signal multiplier for the provision of a secondary pulse signal without retroactive effect from a primary pulse signal of a pulse signal generator, in particular for the multiplication of speed sensor signals for use in train protection systems, includes an input circuit which taps off the primary pulse signal via a shielded branch signal line, an output circuit which receives the signal transmitted via the potential barrier, and an optical signal transmission path bridging the potential barrier between the input circuit and the output circuit.

A pulse signal multiplier for the provision of a secondary pulse signal without retroactive effect from a primary pulse signal of a pulse signal generator, in particular for the multiplication of speed sensor signals for use in train protection systems, includes an input circuit which taps off the primary pulse signal via a shielded branch signal line, an output circuit which receives the signal transmitted via the potential barrier, and an optical signal transmission path bridging the potential barrier between the input circuit and the output circuit.

Ferroelectric semiconductor devices are provided by including a ferroelectric layer in the device that is made of a material that is not ferroelectric in bulk. Such layers can be disposed at interfaces to promote ferroelectric switching in a semiconductor device. Switching of conduction in the semiconductor is effected by the polarization of a mechanically bi-stable material. This material is not ferroelectric in bulk but can be considered to be when the thickness is sufficiently reduced down to a few atomic layers. Devices including such ferroelectric layers are suitable for various applications, such as transistors and memory cells (both volatile and non-volatile).

Ferroelectric semiconductor devices are provided by including a ferroelectric layer in the device that is made of a material that is not ferroelectric in bulk. Such layers can be disposed at interfaces to promote ferroelectric switching in a semiconductor device. Switching of conduction in the semiconductor is effected by the polarization of a mechanically bi-stable material. This material is not ferroelectric in bulk but can be considered to be when the thickness is sufficiently reduced down to a few atomic layers. Devices including such ferroelectric layers are suitable for various applications, such as transistors and memory cells (both volatile and non-volatile).