A microwave heating apparatus for heating a load by means of microwaves is provided. The microwave heating apparatus comprises a cavity arranged to receive a piece of food to be heated, a first microwave supply system configured to supply microwaves at the cavity bottom for energizing a browning function in the cavity, a second microwave supply system configured to supply microwaves into the cavity for exciting cavity modes and a control unit configured to control the first and second microwave supply systems based on a food category and/or a cooking program. The first supply system comprises at least one microwave source and at least one antenna arranged in a lower part of the cavity and the second microwave supply system comprises at least one microwave source and at least one feeding port arranged in an upper part of the cavity. The present invention is advantageous in that a microwave heating apparatus with an improved crisp function is provided.

A cooking apparatus includes a cooking chamber, a cooking plate having a visual representation distinguishing a plurality of areas on a top surface of the cooking plate, a plurality of heaters configured to supply heat to the plurality of areas and a controller configured to receive information about a cooking object including a plurality of pieces of food having different cooking conditions, based on the information about the cooking object, determine a first heating intensity to be used to heat the first piece of the food, and a second heating intensity to be used to heat the second piece of the food, control the plurality of heaters to supply heat of the first heating intensity to the first area, and control the plurality of heaters to supply heat of the second heating intensity to the second area.

The present invention provides a microwave processing apparatus, including: a cavity resonator having a cavity that forms a standing wave of a microwave; and a dielectric portion disposed occupying at least one-fifth of a volume of the cavity, in the cavity, in which an object to be processed being at through at least one end side of the cavity resonator is disposed in the cavity resonator, and the object to be processed is processed by the standing wave.

A microwave oven includes a housing defining an interior cavity, a magnetron positioned within the housing and outside of the interior cavity and a micro-wave antenna in electrical communication with the magnetron and positioned adjacent a lower surface of the interior cavity. The microwave oven further includes a heating plate that includes a glass-ceramic substrate defining at least a portion of the lower surface of the interior cavity. The heating plate further includes a resistive-heating coating applied on a portion of the glass-ceramic substrate and defining at least one open micro-wave transmissive path from the micro-wave antenna to the interior cavity.

A hand protecting cavity ventilation system for an oven is provided. The system includes an air duct, positioned at a top of a cavity of the oven, the air duct having a duct outlet aimed toward a door to the cavity to provide an airflow along an inner surface of the door. The air duct extends downward from the ceiling of the cavity in front of and below a heating element disposed below the ceiling of the cavity. The air duct forms a vertically displaced hand protection portion to act as a barrier in front of the heating element, thereby guarding the heating element when the door of the oven is opened.

A cooking apparatus is disclosed. The cooking apparatus according to one exemplary embodiment of the present disclosure comprises: an inner wall for forming a cooking chamber; an outer wall for encompassing the inner wall; a microwave generating part for emitting a microwave at a passage, which is a space surrounded by the inner wall and the outer wall; and an absorbing layer absorbing the microwave to be propagated along the passage, so as to emit an infrared ray at the cooking chamber.

A heating cooking apparatus (100) includes a heating cooking chamber (100A) and a microwave supply unit (15). An object to be heated (H) is accommodated in the heating cooking chamber (100A). A microwave supply unit (15) includes a radiation port (15C) and supplies microwaves to the heating cooking chamber (100A) through the radiation port (15C). The radiation port (15C) is positioned below the heating cooking chamber (100A). The heating cooking apparatus (100) further includes a partitioning member (15B) that covers the radiation port (15C) and a placing portion (22) on which the object to be heated (H) is placed.

The invention relates to the field of microwave emitting equipment, in particular to microwave oscillators. The proposed variants of an oscillator and a matrix-type microwave oscillator enable to efficiently direct microwave radiation from one or more microwave sources and sum up microwave radiations, thus ensuring high values of efficiency and output power, superior functional capabilities of the device, a high degree of synchronization of radiations emitted by said microwave sources. The microwave oscillator comprises a microwave source and a resonator with a microwave channel made therein. The resonator comprises a box and a base electrically connected to each other, while the microwave channel accommodates a suppressing means for suppressing a back wave. The matrix-type oscillator comprises a plurality of said microwave oscillators electrically connected to each other.

Methods and apparatus provide plasma generation for semiconductor process chambers. In some embodiments, the plasma is generated by a system that may comprise a process chamber having at least two upper microwave cavities separated from a lower microwave cavity by a metallic plate with a plurality of radiation slots, at least one microwave input port connected to a first one of the at least two upper microwave cavities, at least two microwave input ports connected to a second one of the at least two upper microwave cavities, and the lower microwave cavity receives radiation through the plurality of radiation slots in the metallic plate from both of the at least two upper microwave cavities, the lower microwave cavity is configured to form an electric field that provides uniform plasma distribution in a process volume of the process chamber.

A microwave hood system includes an outer wrapper with a top portion including a cooling air inlet, a cooling air outlet, an outside vent outlet, and a recirculation vent outlet, a first side portion, and a second side portion. A bottom portion includes a vent inlet and is operably coupled to the outer wrapper. A cooking cavity is disposed between the top portion and the bottom portion. A cooking component area is laterally adjacent one of the first side portion and the second side portion. A hood assembly includes a first hood fan disposed between the first side portion and the cooking cavity and a second hood fan disposed between the second side portion and the cooking cavity. A cooling fan is disposed in the cooking component area proximate the second side portion. The cooling fan is in fluid communication with the cooling air inlet.