Provided is a plasma generator for improving uniformity of plasma. The plasma generator which includes a pair of source electrode unit 110 and bias electrode unit 120 disposed to face each other in a vacuum chamber and an RF power unit 132 and a bias RF power unit 142 supplying RF power to the source electrode unit 110 and the bias electrode unit 120, respectively, comprises a common contact point cc which is connected with a plurality of contact points cp disposed along the edge of the source electrode unit 110; and an impedance controller 150 which is connected with the common contact point cc to control the impedance.

Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.

Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.

Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.

Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.

Provided herein are high energy ion beam generator systems and methods that provide low cost, high performance, robust, consistent, uniform, low gas consumption and high current/high-moderate voltage generation of neutrons and protons. Such systems and methods find use for the commercial-scale generation of neutrons and protons for a wide variety of research, medical, security, and industrial processes.

A radio-frequency (RF) generator is provided that includes an exciter, a power amplifier, a filter, a sensor, and a frequency-tuning subsystem. The frequency-tuning subsystem includes a non-transitory, tangible, machine-readable medium containing instructions to perform a method that includes receiving an impedance trajectory of the plasma load; receiving a reference point in a complex-reflection-coefficient plane, the reference point lying on a reference vector passing through the reference point and the origin; receiving, from the sensor, a measured impedance of the plasma load; determining a measurement angle between a reference vector and a line passing through the reference point and a point in the complex-reflection-coefficient plane corresponding to the measured impedance; scaling the measurement angle by a predetermined constant to produce a frequency step; adding the frequency step to the initial frequency to produce an adjusted frequency; and causing the exciter to generate a signal oscillating at the adjusted frequency.

A hybrid linear accelerator is disclosed comprising a standing wave linear accelerator section (SW section) followed by a travelling wave linear accelerator section (TW section). In one example, RF power is provided to the TW section and power not used by the TW section is provided to the SW section via a waveguide. An RF switch, an RF phase adjuster, and/or an RF power adjuster is provided along the waveguide to change the energy and/or phase of the RF power provided to the SW section. In another example, RF power is provided to both the SW section and the TW section, and RF power not used by the TW section is provided to the SW section, via an RF switch, an RF phase adjuster, and/or an RF power. In another example, an RF load is matched to the output of the TW section by an RF switch.

An ion source has an arc chamber having an arc chamber body. An electrode extends into an interior region of the arc chamber body, and a cathode shield has a body that is cylindrical having an axial hole. The axial hole is configured to pass the electrode therethrough. First and second ends of the body have respective first and second gas conductance limiters. The first gas conductance limiter extends from an outer diameter of the body and has a U-shaped lip. The second gas conductance limiter has a recess for a seal to protect the seal from corrosive gases and maintain an integrity of the seal. A gas source introduces a gas to the arc chamber body. A liner has an opening configured to pass the cathode shield therethrough, where the liner has a recess. A gap is defined between the U-shaped lip and the liner, wherein the U-shaped lip reduces a conductance of gas into the gap and the recess further reduces conductance of gas into the region.

A plasma processing apparatus includes a processing chamber, a carrier wave group generation unit and a plasma generation unit. The carrier wave group generation unit is configured to generate a carrier wave group including a plurality of carrier waves having different frequencies in a frequency domain. The carrier wave group is represented by an amplitude waveform in which a first peak and a second peak of which absolute value is smaller than an absolute value of the first peak alternately appear in a time domain. The plasma generation unit is configured to generate a plasma in the processing chamber by using the carrier wave group.