H05B2203/005

Balanced heating of electro-optic device using active electrodes

A system for heating electro-optic media comprises an electro-optic device comprising: a first substrate having first and second surfaces; a second substrate having third and fourth surfaces; a chamber defined between the opposed third surface of the second substrate and the second surface of the first substrate; electro-optic medium in chamber; a first electrode associated with second surface of first substrate; and a second electrode associated with third surface of second substrate; and a circuit in communication with first and second electrodes, comprising: a first EMF source capable of producing a first voltage; a second EMF source capable of producing a second voltage different from the first voltage; a plurality of switches configured to control the application of first and second voltages to the first and second electrodes; and a controller configured to control the switches, the first EMF source, and the second EMF source.

Method of manufacturing an aerosol provision apparatus and an aerosol provision apparatus
11602173 · 2023-03-14 · ·

A method of manufacturing an aerosol provision apparatus for heating smokable material to volatilize at least one component of the smokable material, and an aerosol provision apparatus, are described. The method includes providing a heater arrangement for heating smokable material contained in use within the apparatus, the heater arrangement including at least a first heating zone and a second heating zone for heating different portions of the smokable material, providing a temperature sensor for each of the first and second heating zones, each temperature sensor for providing temperature measurements to be used as input temperature measurements for a temperature control loop, the control loop for controlling the heater arrangement to heat its associated respective heating zone to a target temperature based on the input temperature measurements acquired by the associated temperature sensor, and positioning each temperature sensor in its associated heating zone at a respective position selected so that if the heating arrangement were to heat the first and second heating zones so that the temperature sensors measure the same pre-selected target temperature, a temperature gradient across the length of the heating zones between the temperature sensors would be optimized as being substantially flat.

INFRARED RADIATOR ELEMENT AND METHODS
20230131181 · 2023-04-27 · ·

An IR radiator element (1) suitable for use as a miniature infrared emitter (micro-hotplate) in a gas sensor, IR-spectrometer or electron microscope. The micro-hotplate comprises a plate (2) supported by multiple support arms (4). The plate and arms are fabricated as a MEMS device comprising a single contiguous piece of electrically-conducting refractory ceramic such as hafnium carbide (HfC) or tantalum hafnium carbide (TaHfC). Each of the arms (4), in addition to providing structural cantilever support for the plate (2), acts as a heating element for the plate (2). The plate (2) is heated by applying a voltage across the arms (4). The arms (4) may also be shaped to absorb thermomechanical stress which arises during the heating and cooling of the arms and plate. The plate, which may have an area of less than 0.05 mm.sup.2 and a thickness of between 1% and 10% of the largest dimension of the plate (2), for example, can be heated to 4,000 K or more and cooled again with a duty cycle of as little 0.5 ms, thereby permitting pulsed operation at frequencies of up to 2 kHz. Its small size (10-200 μm) and low power consumption (e.g. 10-100 mW) make the micro-hotplate suitable for use in cryogenic applications, in miniaturized devices or in battery-powered devices such as mobile phones.

SUBSTRATE HOLDING UNIT AND SUBSTRATE PROCESSING APPARATUS

A substrate support unit includes: a ceramic body having a surface for supporting a substrate, the ceramic body including aluminum nitride (AlN), a heat generating resistor disposed in the ceramic body, and including molybdenum (Mo), and a coating layer surrounding the heat generating resistor, and including molybdenum aluminum nitride (MoAlN).

APPARATUS FOR TREATING SUBSTRATES AND TEMPERATURE CONTROL METHOD OF HEATING ELEMENTS
20230070679 · 2023-03-09 · ·

The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a chamber having a treating space; and a support unit configured to support and heat a substrate in the treating space, and wherein the support unit includes: at least one heating element for adjusting a temperature of the substrate; a power source for generating a power applied to at least one heating element; a power supply line for transmitting the power generated by the power source to the at least one heating element; a power return line for grounding the at least one heating element; and a current measuring resistor provided on the power supply line or the power return line and used for estimating a temperature of the at least one heating element.

Electric heater and electric heating apparatus having same
11602016 · 2023-03-07 · ·

An electric heater includes a substrate, an outer pattern part disposed on one surface of the substrate, an inner pattern part disposed on the one surface of the substrate so as to be located such that the outer pattern part surrounds the inner pattern part, and to be spaced apart from the outer pattern part. A pair of first electrodes is connected to the outer pattern part and a pair of second electrodes is connected to the inner pattern part and spaced apart from the pair of first electrodes, and the pair of second electrodes are located inside the outer pattern part.

Substrate processing method

A substrate processing method includes forming, by supplying a chemical liquid onto a central portion of a substrate while rotating a rotary table at a first speed, a liquid film of the chemical liquid having a first thickness; forming, by supplying the chemical liquid onto the central portion while rotating the rotary table at a second speed lower than the first speed after the forming of the liquid film having the first thickness, a liquid film of the chemical liquid having a second thickness larger than the first thickness; and heating, by heating the rotary table in a state that the rotary table is rotated at a third speed lower than the second speed or in a state that the rotating of the rotary table is stopped after the forming of the liquid film having the second thickness, the substrate and the liquid film of the chemical liquid.

VAPORIZER WITH SPACED HEATING MODULES
20230120630 · 2023-04-20 ·

A cartridge for a vaporizer can include an elongated reservoir body and a plurality of longitudinally spaced heating modules configured to heat corresponding portions or zones of the reservoir body for vaporizing a vaporizable substance disposed therein. The plurality of heating modules can be individually controlled or controllable for optimizing user control over a vaporizer operation. The reservoir body can be disposed in or through openings in the heating modules with a gap there between and the heating modules can be configured to heat the reservoir body from a plurality of directions.

Heater and smoking device including the heater
20220322744 · 2022-10-13 ·

The present application discloses a heater and a smoking set including the heater. The heater includes: a base, having an inner surface and an outer surface; an infrared radiation layer, formed on the surface of the base; the infrared radiation layer is configured to generate infrared rays and at least heat an aerosol-forming matrix by radiation; a heating body arranged at the periphery of the base, and used to receive electric power from a power supply to generate heat. The heating body is configured to transfer the heat to heat the infrared radiation layer to generate the infrared rays. According to the present application, the infrared radiation layer is heated up by the heating body so that the infrared radiation layer generates infrared radiation to heat the aerosol-forming matrix, thereby reducing the preheating time of the aerosol-forming matrix and improving the user experience.

SUPPORTING UNIT AND APPARATUS FOR TREATING SUBSTRATE
20230060901 · 2023-03-02 · ·

The inventive concept provides a support unit for supporting a substrate. The support unit for supporting the substrate includes a first plate; heating elements provided at the first plate for controlling a temperature of respective region of the substrate; a power supply module configured to generate at least two powers having a different frequency; a power line transmitting a power generated by the power supply module to the heating elements; and filters installed at the power line to selectively filter a power supplied to the heating elements.