The present application relates to a device for generating X-ray radiation and particle radiation by means of nuclear fusion, comprising: an anode and a cathode, which are separated from each other by an insulator and are arranged coaxially to each other, wherein the anode and the cathode are arranged at least partially in a reactor chamber and the cathode has a plurality of cathode electrodes a pre-discharge device for generating a pre-discharge that forms a low-impedance bridging across the insulator a gas that is contained in the reactor chamber; an electrical pre-discharge source, especially with high internal resistance that is connected with the pre-discharge device; and an electrical discharge source that is electrically connected to the confined anode and the cathode, wherein a dense, magnetically confined plasmoid is generated in front of the anode as a result of an electrical discharge from the electrical discharge source and one or more ion beams, one or more X-rays or combinations thereof are emitted.

A method of controlling a droplet illumination module/droplet detection module system of an extreme ultraviolet (EUV) radiation source includes irradiating a target droplet with light from a droplet illumination module and detecting light reflected and/or scattered by the target droplet. The method includes determining whether an intensity of the detected light is within an acceptable range. In response to determining that the intensity of the detected light is not within the acceptable range, a parameter of the droplet illumination module is automatically adjusted to set the intensity of the detected light within the acceptable range.

An extreme ultraviolet radiation source is provided, including a vessel and a gas scrubber. The vessel has a gas inlet from which a cleaning gas is supplied into the vessel and a gas outlet from which the cleaning gas exits the vessel. The gas scrubber is disposed within the vessel, arranged such that the cleaning gas leaves the vessel through the gas outlet after flowing through the gas scrubber. The gas scrubber has a number of gas passages to allow the cleaning gas to flow through, and the sizes of the gas passages vary according to the distance between each of the gas passages and the gas outlet.

An extreme ultraviolet light generation apparatus may include: a chamber device including an internal space; a target supply unit disposed at the chamber device and configured to supply a droplet of a target substance to the internal space; a target collection unit disposed at the chamber device, communicated with the internal space through an opening provided to an inner wall of the chamber device, and configured to collect the droplet passing through the opening; a detection unit disposed at the chamber device and configured to detect the target substance accumulating in the vicinity of the opening of the inner wall; and a control unit configured to stop the target supply unit depending on a result of the detection by the detection unit.

A light source apparatus includes a disk-shaped rotation body, a raw material supply mechanism, a chamber body, and a foil trap. The raw material supply mechanism supplies a front surface of the rotation body with liquid raw material that is irradiated with an energy beam to generate plasma. The chamber body includes a beam introduction section that introduces the energy beam, a radiation extraction section that extracts radiation from the plasma that has been generated, and a plasma generation section that accommodates the rotation body. The foil trap includes a shaft member rotatably disposed in the chamber body and a plurality of foils radially arranged around the shaft member, and the plurality of foils is arranged between the rotation body and the radiation extraction section to capture debris that has been generated from the plasma.

An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment N setting of the adjustable transformation optics.

An extreme ultraviolet light generation apparatus includes a chamber (10) having an internal space in which extreme ultraviolet light is generated when a target substance supplied to the internal space is irradiated with a laser beam (301), a gas supply unit (63) configured to supply etching gas to the internal space, a discharge unit (61) configured to discharge residual gas from the internal space, a pressure sensor (26) configured to measure a pressure in the internal space, and a control unit (20), and the control unit (20) may predict a time until the pressure in the internal space reaches a predetermined pressure by using a relation between an elapsed time since start of a predetermined duration including a duration in which the extreme ultraviolet light is generated and a pressure measured in the predetermined duration.

Laser plasma optical device comprising a laser system for outputting driving light pulses and signal light pulses, a vacuum target chamber, a gas target generating device for generating gas and forming a required plasma channel target through high voltage capillary discharge ionization (or through laser picosecond pre-pulse ablation) of gas, and a focusing element. The driving light pulse is focused on the generated plasma channel target through the focusing element to generate a density-modulated plasma wake; and after a predetermined delay time T, the signal light pulse is focused onto a leading edge region of a second plasma density cavitation bubble of the plasma wake through the focusing element, so that the frequency of the signal light pulse is red-shifted to generate an ultra-intense near-single-cycle mid-infrared pulse.

An extreme ultraviolet light generation device according to an aspect of the present disclosure includes: a chamber; a mirror configured to condense extreme ultraviolet light radiated from plasma generated by irradiating a target supplied into the chamber with a laser beam; an electromagnet disposed outside the chamber to form a magnetic field between a generation region of the plasma in the chamber and the mirror; a current inversion device configured to invert the direction of current flowing through the electromagnet; and a controller configured to control the current inversion device to invert the direction of the current when a set condition is satisfied.

A chamber device may include a concentrating mirror, a central gas supply port, an inner wall, an exhaust port, a recessed portion, and a lateral gas supply port. The recessed portion may be on a side lateral to the focal line and recessed outward from the inner wall when viewed from a direction perpendicular to the focal line. The lateral gas supply port is formed at the recessed portion and may supply gas toward gas supplied from the central gas supply port so that a flow direction of the gas supplied from the central gas supply port is bent from a direction along the focal line toward the exhaust port and an internal space of the recessed portion.