A beam shaping device included in a beam transport system is provided with: a pre-stage quadrupole electromagnet that reduces a distribution width of x-angle components that are inclinations in the x-direction of the charged particles in the beam with respect to the traveling direction; a penumbra expander that moderates an end profile of a particle-number distribution of the x-angle components in the beam having passed through the pre-stage quadrupole electromagnet; and a post-stage quadrupole electromagnet that adjusts a betatron phase in a phase-space distribution in the x-direction, of the beam having passed through the penumbra expander; wherein the post-stage quadrupole electromagnet adjusts a phase advance angle of the betatron phase from the penumbra expander to the isocenter, to be in a range of an odd multiple of 90 degrees45 degrees.

In a beam transport system, based on a beam temporal-variation related amount that has been calculated by a beam analyzer and that is a beam-position temporal variation amount or a beam diameter at a beam profile monitor, an optical parameter calculator calculates a start-point momentum dispersion function that is a momentum dispersion function (, ) of a charged particle beam at a start point in design of the beam transport system that is set on a beam trajectory of the accelerator; and calculates optical parameters using, as an initial condition, the start-point momentum dispersion function and a beginning condition at an irradiation position at the time of detecting profile data.

A particle beam apparatus includes: a transport route that guides a particle beam for irradiating an irradiation target to an irradiator; a beam adjustment unit that adjusts a beam size and a beam position of the particle beam; a calculation unit; a storage unit; and an optimization processing unit that searches for a parameter candidate value of the beam adjustment unit, in which the calculation unit adjusts the beam adjustment unit by using the parameter candidate value searched by the optimization processing unit.

A linear accelerator apparatus may include a beamline enclosure that defines a polygonal backbone, and a plurality of acceleration stages, disposed along a length of the beamline enclosure. A given acceleration stage may include a drift tube assembly to conduct an ion beam therethrough, a resonator, coupled to deliver an RF signal to the drift tube assembly, and a quadrupole assembly to shape the ion beam. As such, at a first acceleration stage, a first resonator may be disposed along a first side of the polygonal backbone, and at a second acceleration stage, adjacent to and downstream of the first acceleration stage, a second resonator may be disposed along a second side of the polygonal backbone, different from the first side.

An ion implantation system has a first linear accelerator for accelerating ions of an ion beam to a first energy along a beam path. A second linear accelerator positioned downstream of the first linear accelerator along the beam path accelerates the ions to a second energy. A charge stripper has a stripper tube with a passageway positioned between the first and second linear accelerators. A charge stripping medium is provided in the passageway to strip at least one electron from the ions as the ion beam passes through the charge stripping medium. A focusing apparatus is associated with the stripper tube to control a trajectory of the ions within the passageway of the stripper tube. The focusing apparatus can be two or more quadrupoles and include an electrostatic lens, a magnet, a solenoid, or a Einzel lens.