Patent classifications
H05H2007/041
METHOD AND APPARATUS FOR PRODUCING A HIGH GAIN FREE ELECTRON LASER USING A LARGE ENERGY SPREAD ELECTRON BEAM
A system including an electron beam source for providing an electron beam and at least one undulator system configured to produce free-electron laser (FEL) radiation is described. The undulator system includes undulators and at least one optical section between the undulators. The undulators are configured to induce the electron beam to microbunch and radiate coherently. The optical section(s) are configured to operate on the electron beam and the FEL radiation generated by the electron beam.
Light Source for High Power Coherent Light, Imaging System, and Method of Using Relativistic Electrons for Imaging and Treatment
A light source for high power coherent light can include multiparticle relativistic bunches of electrons generating high intensity propagating fields. Coherent emission between electrons may also be utilized. The source may be independent of any medium or media to remove all constraints on the wavelength of the light emitted. And at least a portion of a single alternating magnetic field for accelerating the electron bunches can be included. The color or wavelength of the produced light can be determined solely by the parameters of the electron bunches and the alternating field. The source can be used for imaging, such as medical imaging or for security, including concealed weapons, and for quality control.
Magnetic undulator shim
A magnetic undulator shim having three interconnected sections arranged one after the other in a direction substantially parallel to the beam axis. The first section is adapted to magnetically engage a magnet having a horizontal surface and configured to extend partially onto the horizontal surface of the magnet. The magnet is adjacent to a pole and the magnet and the pole form a boundary. The second third sections are interconnected to form a shape. The shape corresponds to the boundary. The third section is adapted to magnetically engage a surface of the pole.
Helical superconducting undulator for 3rd and 4th generation of synchrotron light source and FELs
A helical superconducting undulator includes a cylindrical magnetic core through which a bore hole allows the passage of charged particles. A single superconducting wire wraps the magnetic core guided by helical flights and cylindrical protrusions, to create interleaved helical windings on the magnetic core. An electrical current may be supplied to the superconducting wire to generate a periodic helical magnetic field in the bore. The helical superconducting undulator also includes a strong-back enclosure that acts as an epoxy mold during epoxy impregnation, a structural support to ensure straightness of the undulator after epoxy impregnation, and assists in cooling and thermal control of the magnetic core and superconducting wire during device operation.
PERMANENT MAGNET INSERTION DEVICE AND METHODS OF USE THEREOF
The present technology relates to a permanent magnet insertion device that includes a frame and a plurality of single pole assemblies adjacently disposed within the frame. Each of the single pole assemblies includes a first member bearing a first permanent-magnet and a second member bearing a second permanent-magnet. The first permanent-magnet and the second permanent-magnet are spaced apart by a gap. At least one of the first member or the second member is movable relative to the other of the first member or the second member to increase or to decrease a dimensional value of the gap. A hydraulic driver is configured to move the first member relative to the second member to increase or to decrease the dimensional value of the gap. A mechanical driver is configured to move the first member relative to the second member to increase or to decrease the dimensional value of the gap.
Lithographic method
A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
EUV light generator
An EUV light generator including the following components: A. an electron storage ring including a first linear section and a second linear section; B. an electron supplier configured to supply the electron storage ring with an electron bunch; C. a high-frequency acceleration cavity disposed in the first linear section and configured to accelerate the electron bunch in such a way that a length Lez of the electron bunch satisfies 0.09 mLez3 m; and D. an undulator disposed in the second linear section and configured to output EUV light when the electron bunch enters the undulator.
HELICAL SUPERCONDUCTING UNDULATOR FOR 3RD AND 4TH GENERATION OF SYNCHROTRON LIGHT SOURCE AND FELS
A helical superconducting undulator includes a cylindrical magnetic core through which a bore hole allows the passage of charged particles. A single superconducting wire wraps the magnetic core guided by helical flights and cylindrical protrusions, to create interleaved helical windings on the magnetic core. An electrical current may be supplied to the superconducting wire to generate a periodic helical magnetic field in the bore. The helical superconducting undulator also includes a strong-back enclosure that acts as an epoxy mold during epoxy impregnation, a structural support to ensure straightness of the undulator after epoxy impregnation, and assists in cooling and thermal control of the magnetic core and superconducting wire during device operation.
FAST-SWITCH UNDULATOR AND METHOD FOR POLARIZING ELECTRON BEAM
An undulator is adapted to a synchrotron storage ring or free electron lasers (FEL), especially to an undulator capable of switching polarization mode rapidly. In comparison with the EPU (elliptically polarized undulator) of APPLE II (Advanced Planar Polarized Light Emitter II) which conceived by Dr. S. Sasaki, the provided undulator does not use mechanical transmission mechanisms to drive the four magnetic pole arrays composed of permanent magnets. Hence, the polarization mode can be switched rapidly. Moreover, a polarization method of electron beam is also provided.
Insertion device
A device includes: a first magnet array; a first magnet support body; a second magnet array; a second magnet support body; a gap drive mechanism for performing vertical drive of the magnet support bodies to change a gap; first, second connection beams connected to the magnet support bodies; a mechanism for connecting the connection beams to the gap drive mechanism; a cancellation spring mechanism for cancelling a suction force that acts between magnet arrays; and a spring interlocking mechanism for connecting the cancellation spring mechanism to the magnet support bodies. In the spring interlocking mechanism, first and second spring support frames that are connected to the first and second connection beams via a connecting portion, and a guide mechanism for guiding vertical movements of the first and second spring support frames are mounted, and the cancellation spring mechanism are mounted to both the first and second spring support frames.