A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate.

A flexible conductive film and its manufacturing method are provided. A flexible touch screen and a flexible touch display panel including the flexible conductive film are also provided. The manufacturing method of a flexible conductive film includes: providing a first substrate; applying a first conductive metal ink on the first substrate and forming a first conductive metal pattern; applying a polyimide varnish on a surface of the first substrate having the first conductive metal pattern; soaking the first substrate in deionized water after the polyimide varnish has been solidified; and detaching the solidified polyimide varnish and the first conductive metal pattern from the first substrate to obtain the flexible conductive film. The flexible conductive film prepared can be used in a flexible touch screen and a flexible display panel to improve the adhesion of nanosilver material to a flexible substrate, and to improve its stability of mechanical strength.

An ultramicro circuit board based on an ultrathin adhesiveless flexible carbon-based material and a preparation method thereof. The method comprises the steps of: S1. depositing to form a PI film on a surface of a quantum carbon-based film through a chemical vapor deposition (CVD) reaction, and manufacturing a flexible circuit board base material with a quantum carbon-based film/PI double-layer composite structure; and S2. manufacturing a high-frequency ultramicro circuit antenna on the flexible circuit board base material through a laser scanning etching method. The preparation method has the advantages of being good in environmental friendliness, high in efficiency, low in manufacturing cost and the like, and the manufactured antenna ultramicro circuit board has the advantages of being high in thermal and electrical conductivity, ultra-flexible, low in dielectric, low in loss and high in shielding performance, which can be applied to 5G equipment.

The present invention discloses a super-flexible high electrical and thermal conductivity flexible base material and a preparation method thereof, wherein the method comprises the steps of: S1. carbonizing and blackleading a polyimide thin film, doping nano-metal to the polyimide thin film, and performing ion implantation and ion exchange; S2. performing plasma irradiation modification treatment on a surface of the material obtained after the step S1 to form a heterogeneous surface layer; and S3. forming a metal conductor layer on the heterogeneous surface layer by physical vapor deposition (PVD) or chemical vapor deposition (CVD), so as to obtain the super-flexible high-ductility high electrical and thermal conductivity flexible base material. The method can obtain the C-C-FPC, C-C-COF or C-C-FCCL flexible circuit base material with super flexibility, high ductility, high electrical conductivity, high thermal conductivity and high frequency performance.

Electronic substrates, contact pads for electronic substrates, and related methods are disclosed. Electronic substrates may include an electrically conductive layer that forms at least one contact pad and at least one metal trace on a non-conductive layer. The contact pads are arranged with greater thicknesses or heights above the non-conductive layer than the metal traces. Dielectric layers are disclosed that cover the metal traces while leaving top surfaces of the contact pads exposed. Top surfaces of the dielectric layers may be arranged to be coplanar with top surfaces of the contact pads to provide electronic substrates having generally planar top faces. Bottom faces of electronic substrates may include mounting pads that are coplanar with additional dielectric layers. Methods are disclosed that include forming dielectric layers to cover contact pads and metal traces, and removing surface portions of the dielectric layers until the contact pads are accessible through the dielectric layers.

An interconnect substrate includes an insulating layer and an interconnect layer formed on a surface of the insulating layer, wherein the surface of the insulating layer has grooves formed therein, the grooves having a meander shape on an order of nanometers in a plan view, and wherein the interconnect layer has anchor portions fitted into the grooves.

A plasma ashing system includes a plasma generator configured to generate a plasma from a gas source. The system further includes a plasma reaction chamber configured to house a substrate comprising a Parylene coating, wherein the plasma reaction chamber is configured to expose surfaces of the Parylene coating on the substrate to the plasma, wherein the plasma is configured to remove portions of the Parylene coating on the substrate.

A method for depositing coating onto a substrate includes providing a monomer for creation of a protective coating on a substrate, energizing the monomer with a plasma generation system, and polymerizing the energized monomer onto the substrate in a plasma-enhanced chemical vapor deposition (PECVD) chamber.

A method for applying a metal on a substrate comprises: a) applying a coating by treatment in a plasma, comprising a compound selected from alkanes up to 10 carbon atoms, and unsaturated monomers, and b1) producing polymers on the surface of the substrate, the polymers comprising carboxylic groups and adsorbed ions of a second metal, reducing the ions to the second metal, or alternatively b2) producing polymers on the surface, bringing the surface of the substrate in contact with a dispersion of colloidal metal particles of at least one second metal, and c) depositing the first metal on the second metal. Advantages include that materials sensitive to, for instance, low pH or solvents can be coated. Substrates including glass, SiO.sub.2 with very few or no abstractable hydrogen atoms as well as polymer materials containing halogen atoms can be coated with good adhesion.

A plasma chamber (11) for coating a substrate with a polymer layer, the plasma chamber includes a first electrode set (14) and a second electrode set (14), the first and second electrode sets are arranged either side of a sample chamber for receiving a substrate, wherein the first and second electrode sets include plural electrode layers (141, 142) and wherein each electrode set includes plural radiofrequency electrode layers or plural ground electrode layers for coating polymer to each surface of a substrate.