A semiconductor circuit and semiconductor device for determining status of a fuse element are provided. The semiconductor circuit includes a configurable reference resistor unit with a first terminal receiving a first power signal and a second terminal electrically coupled to the fuse element. The semiconductor circuit also includes a latch circuit for reading a first status signal of a first node between the configurable reference resistor unit and the fuse element. The configurable reference resistor unit includes a first resistor, a first transistor connected in parallel with the first resistor, and a first configurable unit connected to a gate of the first transistor. The first configurable unit is configured to generate a first configurable signal to be provided to the gate of the first transistor.

The present disclosure provides a method for determining status of a fuse element of a memory device. The method includes providing the memory device including a first terminal and a second terminal and applying a first power signal on the first terminal of the semiconductor device. The memory device includes a configurable reference resistor unit electrically coupled to the fuse element. The method also includes obtaining an evaluation signal at the second terminal of the memory device and identifying the evaluation signal to determine whether the memory device is redundant. The configurable reference resistor unit includes a first resistor, a first transistor connected in parallel with the first resistor, and a first configurable unit connected to a gate of the first transistor. The first configurable unit is configured to generate a first configurable signal to turn on the first transistor.

A fuse structure includes a gate structure, a first electrode, a second electrode and an isolation structure. The gate structure is at least partially formed on an active area of a substrate. The first electrode is formed on the active area of the substrate and spaced apart from the gate structure. The second electrode is formed at least on a side of the gate structure. The isolation structure is formed between the active area and the second electrode.

A semiconductor device includes a one-time programmable (OTP) memory device, a key register and a key protection control logic. The OTP memory device stores a secret value, a key protection bit indicating whether to protect the secret value, and an end of life bit indicating whether to discard the semiconductor device. The key register loads the secret value from the OTP memory device and stores the secret value. The key protection control logic controls loading of the secret value from the OTP memory device to the key register based on the key protection bit and the end of life bit. Security of the secret value is enhanced and utilization of the secret value is optimized using the key protection bit and the end of life bit.

The present disclosure provides an antifuse array structure and a memory. The antifuse array structure includes a plurality of antifuse integrated structures arranged in a bit line extension direction and a word line extension direction to form an antifuse matrix. The antifuse integrated structure is arranged in a same active region, and an extension direction of the active region is the same as the bit line extension direction. Each antifuse integrated structure includes a first antifuse memory MOS transistor, a first switch transistor, a second switch transistor, and a second antifuse memory MOS transistor. The first switch transistor and the second switch transistor are respectively controlled through two adjacent word lines, the first antifuse memory MOS transistor and the second antifuse memory MOS transistor are respectively controlled through two adjacent programming wires, and the programming wire is further configured to control adjacent antifuse integrated structures.

An IC device includes an active area positioned in a substrate, first and second contact structures overlying and electrically connected to the active area, a conductive element overlying and electrically connected to each of the first and second contact structures, an anti-fuse transistor device including a dielectric layer between a gate structure and the active area, a first selection transistor overlying the active area adjacent to each of the anti-fuse transistor device and the first contact structure, and a second selection transistor overlying the active area adjacent to each of the anti-fuse transistor device and the second contact structure.

An antifuse-type one time programming memory cell at least includes an antifuse transistor. The antifuse transistor includes a first nanowire, a first gate structure, a first drain/source structure and a second drain/source structure. The first nanowire is surrounded by the first gate structure. The first gate structure comprises a first spacer, a second spacer, a first gate dielectric layer and a first gate layer. The first drain/source structure is electrically contacted with a first terminal of the first nanowire. The second drain/source structure is electrically contacted with a second terminal of the first nanowire.

An antifuse-type one time programming memory cell at least includes an antifuse transistor. The antifuse transistor includes a first nanowire, a first gate structure, a first drain/source structure and a second drain/source structure. The first nanowire is surrounded by the first gate structure. The first gate structure comprises a first spacer, a second spacer, a first gate dielectric layer and a first gate layer. The first drain/source structure is electrically contacted with a first terminal of the first nanowire. The second drain/source structure is electrically contacted with a second terminal of the first nanowire.

An anti-fuse array structure, an operation method thereof and a memory are provided. The anti-fuse array structure includes an anti-fuse array area and a selection circuit area. The anti-fuse array area includes a plurality of anti-fuse cells, and the selection circuit area includes a plurality of selection transistors. The selection circuit area is located on at least one side of the anti-fuse array area.

An anti-fuse array structure, an operation method thereof and a memory are provided. The anti-fuse array structure includes an anti-fuse array area and a selection circuit area. The anti-fuse array area includes a plurality of anti-fuse cells, and the selection circuit area includes a plurality of selection transistors. The selection circuit area is located on at least one side of the anti-fuse array area.