The nonvolatile memory device includes a semiconductor substrate, a first and a second diffusion regions formed under a surface of the semiconductor substrate, a storage layer formed on the semiconductor substrate, a gate stacked on the storage layer, wherein the first diffusion region may at least one of active regions being separated by a part of the semiconductor substrate forming a channel region, wherein the second diffusion region may include an active region intersecting the gate insulating layer, wherein the storage layer may include an insulating layer or a variable resistor, and may service as a data storage layer to store data, and may be selected by a structure including the first and the second diffusion regions.

A semiconductor module includes first and second switching devices and first and second control devices all sealed in a package rectangular in a plan view, signal terminals on a side surface of a first long side input signals to the first and second control devices, each of the first and second switching devices outputs one of the signals from an output terminal on a side surface of a second long side, each of the first and second control devices includes a control ground connected to a control ground terminal on the side surface of the first long side, a main power terminal and a power ground terminal are disposed on the side surface of the second long side, and the power ground terminal is electrically connected inside the package to the control ground terminal through a current detection resistor outside the package and an impedance component inside the package.

The present disclosure relates to a process that includes the simultaneous formation of a first transistor in and on a first region of a substrate, of a second transistor in and on a second region of the substrate, of a third transistor in and on a third region of the substrate and of a memory cell in and on a fourth region of the substrate. The method includes the following successive steps: forming a first gate stack on the first region, a second gate stack on the second region, a third gate stack on the third region and a fourth stack on line with the fourth region; simultaneously etching a part of the third gate stack and the fourth stack the first and the second gate stacks being protected with a first mask; and simultaneously etching the first and the second gate stacks, the third gate stack and the fourth region of the semiconductor substrate being protected with a second mask.

A method of fabricating a memory device is disclosed. In one aspect, the method comprises patterning a first conductive line extending in a first direction. The method additionally includes forming a free-standing pillar of a memory cell stack on the first conductive line after patterning the first conductive line. Forming the free-standing pillar includes depositing a memory cell stack comprising a selector material and a storage material over the conductive line and patterning the memory cell stack to form the free-standing pillar. The method further includes patterning a second conductive line on the pillar after patterning the memory cell stack, the second conductive line extending in a second direction crossing the first direction.

In order to provide a crossbar switch type memory circuit designed to be usable in normal circumstances even when a resistance change element is in an adverse state, the present invention is provided with: a first unit including a first column wiring to which one end of a first resistance change element is connected, a first power supply-side transistor for controlling the connection of the first column wiring and a power supply node, a first ground-side transistor, of a reverse operation type to the first power supply-side transistor, for controlling the connection of the first column wiring and a ground node, and a first polarity control line for causing the first power supply-side transistor or the first ground-side transistor to turn on and the other to turn off by a polar signal from a polar signal terminal, the first polarity control line being connected to the control terminals of the first power supply-side transistor and first ground-side transistor; a second unit including a second column wiring to which one end of a second resistance change element is connected, a second power supply-side transistor, of the same operation type as the first power supply-side transistor, for controlling the connection of the second column wiring and the power supply node, a second ground-side transistor, of a reverse operation type to the second power supply-side transistor, for controlling the connection of the second column wiring and the ground node, a logic inversion circuit for inverting the polarity of the polar signal from the polar signal terminal and outputting the polarity-inverted signal, and a second polarity control line for causing the second power supply-side transistor or the second ground-side transistor to turn on and the other to turn off by a polar signal from the logic inversion circuit, the second polarity control line being connected to the control terminals of the second power supply-side transistor and second ground-side transistor; and n row wirings (n: positive integer) to which the other ends of the first and second resistance change elements are connected.

Semiconductor memory is provided wherein a memory cell includes a capacitorless transistor having a floating body configured to store data as charge therein when power is applied to the cell. The cell further includes a nonvolatile memory comprising a resistance change element configured to store data stored in the floating body under any one of a plurality of predetermined conditions. A method of operating semiconductor memory to function as volatile memory, while having the ability to retain stored data when power is discontinued to the semiconductor memory is described.

Embodiments of the present disclosure generally relate to electronic devices, and more specifically, to multi-level phase change devices. In one embodiment, a memory cell device is provided. The memory cell device generally includes a top surface, a bottom surface and a cell body between the top surface and the bottom surface. The cell body may include a plurality of phase change material layers, which may be used to store data of the cell. In another embodiment, a method of programming a memory cell is provided. The method generally may include applying a sequence of different pulses to each phase change material layer of the cell as the voltage of each pulse in the sequence is ratcheted down from the start of a write cycle to the end of a write cycle.

A memory device includes a first electrode line layer including a plurality of first electrode lines extending on a substrate in a first direction and being spaced apart from each other, a second electrode line layer including a plurality of second electrode lines extending on the first electrode line layer in a second direction that is different from the first direction and being spaced apart from each other, and a memory cell layer including a plurality of first memory cells located at a plurality of intersections between the plurality of first electrode lines and the plurality of second electrode lines, each first memory cell including a selection device layer, an intermediate electrode and a variable resistance layer that are sequentially stacked. A side surface of the variable resistance layer is perpendicular to a top surface of the substrate or inclined to be gradually wider toward an upper portion of the variable resistance layer. The first memory cell has a side surface slope so as to have a width gradually decreasing toward its upper portion.

A thermally optimized phase change memory cell includes a phase change material element disposed between first and second electrodes. The second electrode includes a thermally insulating region having a first thermal resistivity over the first electrode and a metallic contact region interposed between the phase change material element and the thermally insulating region, where the metallic contact layer has a second thermal resistivity lower than the first thermal resistivity.

Bipolar transistors and MOS transistors are formed in a common process. A semiconductor layer is arranged on an insulating layer. On a side of the bipolar transistors: an insulating region including the insulating layer is formed; openings are etched through the insulating region to delimit insulating walls; the openings are filled with first epitaxial portions; and the first epitaxial portions and a first region extending under the first epitaxial portions and under the insulating walls are doped. On the side of the bipolar transistors and on a side of the MOS transistors: gate structures are formed; second epitaxial portions are made; and the second epitaxial portions covering the first epitaxial portions are doped.