Methods for programming data to an array of memory cells having a first memory cell, a second memory cell that is adjacent to the first memory cell in a first direction along a first axis, and a third memory cell that is adjacent to the first memory cell in a second direction along a second axis.

Systems having a resistive memory device having control circuitry configured to build a data word from remapped data bits from a received data word such that pairs of data bits are mapped to adjacent locations in the built data word, the control circuitry further configured to program the built data word to memory cells coupled to a selected data line such that, during a same program operation, pairs of adjacent memory cells along the selected data line are programmed with the pairs of data.

Some aspects of this disclosure relate to a memory device. The memory device includes a collector region having a first conductivity type and which is coupled to a source line of the memory device. A base region is formed over the collector region and has a second conductivity type. A gate structure is coupled to the base region and acts as a shared word line for first and second neighboring memory cells of the memory device. First and second emitter regions are formed over the base region and have the first conductivity type. The first and second emitter regions are arranged on opposite sides of the gate structure. First and second contacts extend upwardly from the first and second emitter regions, respectively, and couple the first and second emitter regions to first and second data storage elements, respectively, of the first and second neighboring memory cells, respectively.

The disclosed technology relates generally to integrated circuit devices, and in particular to cross-point memory arrays and methods for fabricating the same. In one aspect, a memory device of the memory array comprises a substrate and a memory cell stack formed between and electrically connected to first and second conductive lines. The memory cell stack comprises a first memory element over the substrate and a second memory element formed over the first element, wherein one of the first and second memory elements comprises a storage element and the other of the first and second memory elements comprises a selector element. The memory cell stack additionally comprises a first pair of sidewalls opposing each other and a second pair of sidewalls opposing each other and intersecting the first pair of sidewalls. The memory device additionally comprises first protective dielectric insulating materials formed on a lower portion of the first pair of sidewalls and an isolation dielectric formed on the first protective dielectric insulating material and further formed on an upper portion of the first pair of sidewalls.

Clamp elements, memories, apparatuses, and methods for forming the same are disclosed herein. An example memory may include an array of memory cells and a plurality of clamp elements. A clamp element of the plurality of clamp elements may include a cell structure formed non-orthogonally relative to at least one of a bit line or a word line of the array of memory cells and may be configured to control a voltage of a respective bit line.

Methods for programming data to an array of memory cells having a first memory cell, a second memory cell that is adjacent to the first memory cell in a first direction along a first axis, and a third memory cell that is adjacent to the first memory cell in a second direction along a second axis.

Systems having a resistive memory device having control circuitry configured to build a data word from remapped data bits from a received data word such that pairs of data bits are mapped to adjacent locations in the built data word, the control circuitry further configured to program the built data word to memory cells coupled to a selected data line such that, during a same program operation, pairs of adjacent memory cells along the selected data line are programmed with the pairs of data.

A method and resulting structure, is disclosed to fabricate vertical bipolar junction transistors including a regular array of base contact pillars and emitter contact pillars with a at least one dimension below the minimum lithographical resolution, F, of the lithographic technique employed. A storage element, such as a phase change storage element, can be formed above the regular array of base contact pillars and emitter contact pillars.

A memory device includes a first electrode line layer including a plurality of first electrode lines extending on a substrate in a first direction and being spaced apart from each other, a second electrode line layer including a plurality of second electrode lines extending on the first electrode line layer in a second direction that is different from the first direction and being spaced apart from each other, and a memory cell layer including a plurality of first memory cells located at a plurality of intersections between the plurality of first electrode lines and the plurality of second electrode lines, each first memory cell including a selection device layer, an intermediate electrode and a variable resistance layer that are sequentially stacked. A side surface of the variable resistance layer is perpendicular to a top surface of the substrate or inclined to be gradually wider toward an upper portion of the variable resistance layer. The first memory cell has a side surface slope so as to have a width gradually decreasing toward its upper portion.

A semiconductor device includes: a memory array; a modulation circuit including a first resistive element, a second resistive element and a third resistive element; a regulator including a transistor; and a controller configured to: determine an operation mode of the memory array; generate a first regulated voltage at a drain terminal of the transistor, wherein the first regulated voltage corresponds to a positive temperature coefficient, a negative temperature coefficient or a zero temperature coefficient according to a first resistance ratio between the first resistive element and the second resistive element and a second resistance ratio between the second resistive element and the third resistive element; provide a first access voltage to the memory array in response to the first regulated voltage corresponding to the positive temperature coefficient; and provide a second access voltage to the memory array in response to the first regulated voltage corresponding to the negative temperature coefficient.