A contact assembly is for a vacuum switching apparatus. The vacuum switching apparatus includes a vacuum envelope. The vacuum envelope has an interior. The contact assembly includes: a number of electrical contacts located in the interior of the vacuum envelope, at least one electrical contact having a hole; and a number of electrodes each engaging a corresponding one of the number of electrical contacts, at least one electrode including a base and a protrusion. The protrusion extends from the base into the hole of the electrical contact in order to secure the electrical contact to the electrode.

The present invention is an electrode material constituting a movable electrode of a thermal fuse, having a five-layer clad structure including a core material layer, an intermediate layer formed on the both sides of the core material layer, and a surface layer formed on the intermediate layer, wherein the core material layer includes Cu, the intermediate layer includes an AgCu-based alloy, the surface layer includes an AgCuO-based oxide-dispersed strengthened alloy, and the ratio of the thickness of the intermediate layer to the thickness of the surface layer (intermediate layer/surface layer) is 0.2 or more and 1.0 or less. This electrode material can be manufactured by partially internally oxidizing a three-layer clad material in which plate materials made of an AgCu-based alloy are clad-jointed to both sides of the plate material made of Cu.

An electrical contact assembly including an elongate stud having a coupling end and an opposing butt end, the butt end having a recess formed therein, the recess having a head portion and a shank portion defining a shoulder at a juncture therebetween, the head portion bounded by a collar and having a diameter that is larger than a diameter of the shank portion, and a contact pad having a head and a shank, the head having a top surface and a bottom surface with a tapered sidewall extending therebetween, the shank extending from the bottom surface of the head and having a diameter that is smaller than a diameter of the bottom surface, wherein the contact pad is disposed within the recess with the bottom surface of the head disposed on the shoulder and with the collar extending over and engaging the angled sidewall of the head.

An arc-ablation resistant tungsten alloy switch contact and preparation method is disclosed. A contact member has a three-layer structure, wherein a first layer is a hydrophobic rubber layer, a second layer is a sheet metal layer, and a third layer is a tungsten alloy chemical deposition layer. A plating bath adopted in the chemical deposition contains 25-125 g/L soluble tungsten compound, 0-60 g/L soluble compound of a transition metal like ferrum, nickel, cobalt, copper or manganese, and 0-30 g/L soluble compound of tin, stibium, lead or bismuth. When a layered complex of the hydrophobic rubber layer and the sheet metal layer is chemically plated by the plating bath, a tungsten alloy plated layer is selectively deposited on a metal surface, and chemical deposition of the tungsten alloy does not occur on a surface of the hydrophobic rubber fundamentally.

A method for the production of an electric contact carrier includes producing a basic profile from a basic material. A contact material is applied on a contact accepting area of the basic profile. The contact material is formed into a contact of the contact carrier. Then, the contact carrier is removed from the basic material.

A contact element of a MEMS relay. The contact element includes a defined number greater than one of electrically conductive contact bodies, wherein the contact bodies are arranged at least partially within a layer that is plastically deformable in a defined manner, wherein a hardness of the plastically deformable layer is less than a hardness of the contact bodies, wherein, by exerting a compressive force on the contact bodies, the contact bodies can be pressed into the plastically deformable layer and brought to a substantially uniform height level, and wherein the plastically deformable layer is arranged at least partially within an insulation layer.

A contact pin for a high-voltage and/or medium-voltage switch includes a contact tip of arc-erosion resistant material, a tubular support sleeve connected to the contact tip and a support core in the sleeve. The contact tip is in a forward region of the contact pin where arcs arise during use. The sleeve is in a rearward region of the contact pin, adjoining the forward region, where no arcs arise during use. A pipe contact includes an arc-erosion resistant annular contact and a support pipe connected to the annular contact. The annular contact is in a forward region of the pipe contact where arcs arise during use, and the support pipe is in a rearward region of the pipe contact, adjoining the forward region, where no arcs arise during use. Methods for producing a contact pin and a pipe contact are also provided.

A contact assembly is for a vacuum switching apparatus. The vacuum switching apparatus includes a vacuum envelope. The vacuum envelope has an interior. The contact assembly includes: a number of electrical contacts located in the interior of the vacuum envelope, at least one electrical contact having a hole; and a number of electrodes each engaging a corresponding one of the number of electrical contacts, at least one electrode including a base and a protrusion. The protrusion extends from the base into the hole of the electrical contact in order to secure the electrical contact to the electrode.

A contact assembly is for a vacuum switching apparatus. The vacuum switching apparatus includes a vacuum envelope. The vacuum envelope has an interior. The contact assembly includes: a number of electrical contacts located in the interior of the vacuum envelope, at least one electrical contact having a hole; and a number of electrodes each engaging a corresponding one of the number of electrical contacts, at least one electrode including a base and a protrusion. The protrusion extends from the base into the hole of the electrical contact in order to secure the electrical contact to the electrode.

An arc-ablation resistant tungsten alloy switch contact and preparation method is disclosed. A contact member has a three-layer structure, wherein a first layer is a hydrophobic rubber layer, a second layer is a sheet metal layer, and a third layer is a tungsten alloy chemical deposition layer. A plating bath adopted in the chemical deposition contains 25-125 g/L soluble tungsten compound, 0-60 g/L soluble compound of a transition metal like ferrum, nickel, cobalt, copper or manganese, and 0-30 g/L soluble compound of tin, stibium, lead or bismuth. When a layered complex of the hydrophobic rubber layer and the sheet metal layer is chemically plated by the plating bath, a tungsten alloy plated layer is selectively deposited on a metal surface, and chemical deposition of the tungsten alloy does not occur on a surface of the hydrophobic rubber fundamentally.