Frequency adjustable quarter-wavelength resonators have a movable end wall defined by a surface of a sphere that is moved within the resonator tube. The sphere can be ferromagnetic, enabling it to be moved by magnetic interactions with moving external magnetic elements, or by a variable external magnetic field, controlled by power modulation to external electromagnets. The resonators can optionally be helical or otherwise curved, and the spherical shape of the structure forming the end wall enables it to navigate curves in the resonator tube.

Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

An electrical arrangement, which may, for example be a magnetron, has a sealed chamber 12 and electrically insulating fluid contained within the chamber. A temperature expansion compensation bladder comprising a helical tube 13 is located within the chamber 12, the helical tube 13 having an end 15 open to ambient atmosphere outside the chamber 12 and having a closed end 14 within the chamber.

An electrical arrangement, which may, for example be a magnetron, has a sealed chamber 12 and electrically insulating fluid contained within the chamber. A temperature expansion compensation bladder comprising a helical tube 13 is located within the chamber 12, the helical tube 13 having an end 15 open to ambient atmosphere outside the chamber 12 and having a closed end 14 within the chamber.

A microwave magnetron includes a cathode for emitting electrons, a filament for receiving a filament current to heat the cathode to enable to cathode to emit the electrons, and an anode to which anodic power can be applied to affect a flow of the electrons. An anodic power input receives the anodic power to be applied to the anode, the anodic power being characterized by an anodic current, an anodic voltage, and an anodic impedance, the anodic impedance being a quotient of the anodic voltage and the anodic current. An electromagnet power input receives electromagnet power and applies the electromagnet power to an electromagnet to control an intensity of a magnetic field, the electromagnet power being characterized by an electromagnet current. A controller adjusts at least one of the parameters of the magnetron to affect the flow of electrons while maintaining the anodic impedance constant.

A microwave magnetron includes a cathode for emitting electrons, a filament for receiving a filament current to heat the cathode to enable to cathode to emit the electrons, and an anode to which anodic power can be applied to affect a flow of the electrons. An anodic power input receives the anodic power to be applied to the anode, the anodic power being characterized by an anodic current, an anodic voltage, and an anodic impedance, the anodic impedance being a quotient of the anodic voltage and the anodic current. An electromagnet power input receives electromagnet power and applies the electromagnet power to an electromagnet to control an intensity of a magnetic field, the electromagnet power being characterized by an electromagnet current. A controller adjusts at least one of the parameters of the magnetron to affect the flow of electrons while maintaining the anodic impedance constant.

Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

Embodiments of the invention provide a magnetron and a magnetron sputtering device, including an inner magnetic pole and an outer magnetic pole with opposite polarities. Both the inner magnetic pole and the outer magnetic pole comprise multiple spirals. The spirals of the outer magnetic pole surround the spirals of the inner magnetic pole, and a gap exists therebetween. In addition, the gap has different widths in different locations from a spiral center to an edge. Moreover, both the spirals of the outer magnetic pole and the spirals of the inner magnetic pole follow a polar equation: r=an+b(cos )m+c(tan )k+d, 0<=n<=2, 0<=m<=2, c=0 or k=0. Because the gap between the inner magnetic pole and the outer magnetic pole has the different widths in a spiral discrete direction, width sizes of the gap in the different locations can be changed to control magnetic field strength distribution in a plane, thus adjusting uniformity of a membrane thickness.

Embodiments of the invention provide a magnetron and a magnetron sputtering device, including an inner magnetic pole and an outer magnetic pole with opposite polarities. Both the inner magnetic pole and the outer magnetic pole comprise multiple spirals. The spirals of the outer magnetic pole surround the spirals of the inner magnetic pole, and a gap exists therebetween. In addition, the gap has different widths in different locations from a spiral center to an edge. Moreover, both the spirals of the outer magnetic pole and the spirals of the inner magnetic pole follow a polar equation: r=an+b(cos )m+c(tan )k+d, 0<=n<=2, 0<=m<=2, c=0 or k=0. Because the gap between the inner magnetic pole and the outer magnetic pole has the different widths in a spiral discrete direction, width sizes of the gap in the different locations can be changed to control magnetic field strength distribution in a plane, thus adjusting uniformity of a membrane thickness.