Patent classifications
H01J35/18
Fluid cooled reflective x-ray source
During operation of a reflection target x-ray source, heat must be removed from many components. The electron beam must be steered to the target and may interact with structures along this path. There is also heat generated in the target itself. This can be excessive, since only a very small percentage of the electron beam's energy is transformed into x-rays. Finally, the x-rays must exit the vacuum through the window, which can also be heated both by the x-rays, reflected electrons, and radiant heat from the target. A water cooled reflective x-ray source provides for water or other fluid cooling of the centering aperture, x-ray target, and/or exit window.
Fluid cooled reflective x-ray source
During operation of a reflection target x-ray source, heat must be removed from many components. The electron beam must be steered to the target and may interact with structures along this path. There is also heat generated in the target itself. This can be excessive, since only a very small percentage of the electron beam's energy is transformed into x-rays. Finally, the x-rays must exit the vacuum through the window, which can also be heated both by the x-rays, reflected electrons, and radiant heat from the target. A water cooled reflective x-ray source provides for water or other fluid cooling of the centering aperture, x-ray target, and/or exit window.
On-chip miniature X-ray source and manufacturing method therefor
Provided are an on-chip miniature X-ray source and a method for manufacturing the same. The on-chip miniature X-ray source includes: an on-chip miniature electron source; a first insulating spacer provided on an electron-emitting side of the on-chip miniature electron source, where the first insulating spacer has a cavity structure; and an anode provided on the first insulating spacer, where a closed vacuum cavity is formed between the on-chip miniature electron source and the anode. The on-chip miniature X-ray source has the advantages of stable X-ray dose, low working requirements for vacuum, fast switch response, capability of integration and batch fabrication, and can be used in various types of small and portable X-ray detection, analysis and treatment devices.
Graphite X-ray window
The x-ray windows herein can have low gas permeability, low outgassing, high strength, low visible and infrared light transmission, high x-ray flux, low atomic number materials, corrosion resistance, high reliability, and low-cost. The x-ray window can include a film 11 with a polymer layer 22 and a graphite layer 21. The film 11 can consist essentially of graphite and polymer. Most of the film 11 can be the graphite layer 21. The polymer layer 22 can be a small portion of the film 11.
Graphite X-ray window
The x-ray windows herein can have low gas permeability, low outgassing, high strength, low visible and infrared light transmission, high x-ray flux, low atomic number materials, corrosion resistance, high reliability, and low-cost. The x-ray window can include a film 11 with a polymer layer 22 and a graphite layer 21. The film 11 can consist essentially of graphite and polymer. Most of the film 11 can be the graphite layer 21. The polymer layer 22 can be a small portion of the film 11.
X-ray beam generation system using a lead-bismuth alloy
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.
X-ray beam generation system using a lead-bismuth alloy
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.
System for constant flow generation of X-ray beams
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.
System for constant flow generation of X-ray beams
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.
Constant flow vacuum and beam generation system
A system for generating X-ray beams from a liquid target includes a vacuum chamber, a diamond window assembly, an electron source, a target material flow system, and an X-ray detector/imager. An electron beam from the electron source travels through the diamond window assembly and into a dynamic target material of the flow system. Preferably, the dynamic target material is lead bismuth eutectic in a liquid state. Upon colliding with the dynamic target material, X-rays are generated. The generated X-rays exit through an X-ray exit window to be captured by the X-ray detector/imager. Since the dynamic target material is constantly in fluid motion within a pipeline of the flow system, the electron beam always has a new target area which is at a controlled operational temperature and thus, prevents overheating issues. By providing a small focus area for the electron beams, the overall imaging resolution of the X-rays is also improved.