A power supply device includes a power supply circuit, a casing, a mold resin and a grounding member. The casing is conductive. At least part of a circuit portion of the power supply circuit is stored in the casing. A resin injector is formed in the casing. A mold resin is injected from the resin injector to fill the casing and enclose the circuit portion. The grounding member is conductive. The grounding member is arranged in the casing to shield the resin injector from the circuit portion while being in contact with the mold resin.

A transfer electrode unit (240) is configured by coaxially arranging a plurality of loop electrodes (241A, 241B, 241C), and guides ions to an orthogonal acceleration region (242C) by allowing the ions to pass through an inner side of the plurality of electrodes (241A, 241B, 241C) each of which is applied with a voltage. A voltage having a higher absolute value than the voltage applied to the plurality of electrodes (241A, 241B, 241C) is applied to a flight tube (246), and the ions accelerated in the orthogonal acceleration region (242C) are introduced to a flight space formed in the flight tube (246). A shield portion (241F) is provided between the transfer electrode unit (240) and the flight tube (246), and suppresses that an electric field derived from the voltage applied to the flight tube (246) enters the transfer electrode unit (240).

Charged particle beams (CPBs) are modulated using a beam blanker/deflector and an electrically pulsed extraction electrode in conjunction with a field emitter and a gun lens. With such modulation, CPBs can provide both pulsed and continuous mode operation as required for a particular application, while average CPB current is maintained within predetermined levels, such as levels that promote X-ray safe operation. Either the extraction electrode or the beam blanker/deflector can define CPB pulse width, CPB on/off ratio, or both.

A transfer electrode unit (240) is configured by coaxially arranging a plurality of loop electrodes (241A, 241B, 241C), and guides ions to an orthogonal acceleration region (242C) by allowing the ions to pass through an inner side of the plurality of electrodes (241A, 241B, 241C) each of which is applied with a voltage. A voltage having a higher absolute value than the voltage applied to the plurality of electrodes (241A, 241B, 241C) is applied to a flight tube (246), and the ions accelerated in the orthogonal acceleration region (242C) are introduced to a flight space formed in the flight tube (246). A shield portion (241F) is provided between the transfer electrode unit (240) and the flight tube (246), and suppresses that an electric field derived from the voltage applied to the flight tube (246) enters the transfer electrode unit (240).

A power supply device includes a power supply circuit, a casing, a mold resin and a grounding member. The casing is conductive. At least part of a circuit portion of the power supply circuit is stored in the casing. A resin injector is formed in the casing. A mold resin is injected from the resin injector to fill the casing and enclose the circuit portion. The grounding member is conductive. The grounding member is arranged in the casing to shield the resin injector from the circuit portion while being in contact with the mold resin.

Charged particle beams (CPBs) are modulated using a beam blanker/deflector and an electrically pulsed extraction electrode in conjunction with a field emitter and a gun lens. With such modulation, CPBs can provide both pulsed and continuous mode operation as required for a particular application, while average CPB current is maintained within predetermined levels, such as levels that promote X-ray safe operation. Either the extraction electrode or the beam blanker/deflector can define CPB pulse width, CPB on/off ratio, or both.

An ion implanter includes: a main body which includes a plurality of units which are disposed along a beamline along which an ion beam is transported, and a substrate transferring/processing unit which is disposed farthest downstream of the beamline, and has a neutron ray source in which a neutron ray is generated due to collision of a ultrahigh energy ion beam; an enclosure which at least partially encloses the main body; and a neutron ray scattering member which is disposed at a position where a neutron ray which is emitted from the neutron ray source is incident in a direction in which a distance from the neutron ray source to the enclosure is equal to or less than a predetermined value.

A vacuum apparatus according to an embodiment includes a chamber configured air-tightly, a vacuum pump configured to exhaust gas from the chamber, and an exhaustion structure placed between the chamber and an inlet port of the vacuum pump and having a ventilation path surrounded by a wall of the exhaustion structure. The vacuum pump exhausts gas from the chamber through the ventilation path of the exhaustion structure. A layer of thermal energy absorbing material is formed on at least part of an inner surface of the wall of the exhaustion structure to absorb energy of thermal radiation emitted from the inlet port of the vacuum pump.

A control mechanism for a high-voltage generator that provides voltage and current to an electronic radiation source in a high-temperature environment is provided, the control mechanism including at least an intermediate enveloping ground plane, and a ground-plane potential monitoring system that provides an input to a control processor that in turn drives the high-voltage generator. A method of controlling a high-voltage generator that powers an electronic radiation source is also provided, the method including at least: measuring an enveloping ground plane potential such that a change in the potential of said enveloping ground plane surrounding the generator is monitored and used to determine the beginning of one or more of a partial discharge and flash-over event.

An ion implanter includes: a plurality of devices which are disposed along a beamline along which an ion beam is transported; a plurality of neutron ray measuring instruments which are disposed at a plurality of positions in the vicinity of the beamline and measure neutron rays which are generated at a plurality of locations of the beamline due to collision of a high-energy ion beam; and a control device which monitors at least one of the plurality of devices, based on a measurement value in at least one of the plurality of neutron ray measuring instruments.