A method of time-resolved pump-probe electron microscopy, comprises the steps of irradiating a sample (1) with a photonic pump pulse (2) being directed on a pump pulse path (3) from a photonic source to the sample (1), irradiating the sample (1) with an electron probe pulse (4) being directed on an electron pulse path (5) from an electron pulse source (10) to the sample (1), wherein the photonic pump pulse (2) and the electron probe pulse (4) arrive at the sample (1) with a predetermined temporal relationship relative to each other, and detecting a sample response to the electron probe pulse (4) irradiation with a detector device (20), wherein the photonic source comprises a photonic lattice structure (30) being arranged adjacent to the electron pulse path (5), and the photonic pump pulse (2) is created by an interaction of the electron probe pulse (4) with the photonic lattice structure (30). Furthermore, an electron microscopy apparatus, configured for time-resolved pump-probe electron microscopy, and a sample supply device (200) for an electron microscopy apparatus (100) are described.

An optical vacuum cooling cryostage for correlative light and electron microscopy comprises a vacuum chamber, an anti-contamination system adapter interface, an electron microscope specimen holder adapter interface, an upper optical window, a lower optical window, a vacuum pumping system adapter interface and a vacuum valve, wherein the anti-contamination system adapter interface is arranged in one end of the vacuum chamber, the electron microscope specimen holder adapter interface is arranged in the other end of the vacuum chamber, the upper optical window is arranged on the upper wall of the vacuum chamber, the lower optical window is arranged on the lower wall of the vacuum chamber and opposite to the upper optical window.

A system and a method for monitoring a beam in an inspection system are provided. The system includes an image sensor configured to collect a sequence of images of a beam spot of a beam formed on a surface, each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller configured to combine the sequence of images to obtain a beam profile of the beam.

A method and an apparatus are provided for inspecting a sample. The apparatus includes a sample holder for holding the sample, a charged particle column for generating and focusing one or more charged particle beams at one or more charged particle beam spots onto the sample, a scanning deflector for moving the charged particle beam spot(s) over the sample, a photon detector configured for detecting photons created when the one or more charged particle beams impinge on the sample or when the one or more charged particle beams impinge onto a layer of luminescent material after transmission through the sample, an optical assembly for projecting or imaging at least part of the photons from the charged particle beam spot(s) along an optical beam path onto the photon detector, and a shifting unit for shifting the optical beam path and/or the photon detector with respect to each other.

Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

Situating samples on an optical axis of a charged particle microscope can be performed based a 3D map of the samples. The 3D map is produced with back-side illumination of the samples and telecentric imaging to produce profile images. The profile images are a combined to form the 3D map. Using the 3D map, the processor is coupled to a sample stage to situate a selected sample or sample portion for imaging in the charged particle microscope. In some examples, the processor is responsive to selection of a sample using a graphical interface so that the sample stage is controlled to safely situate the selected sample without further operator intervention.

The invention relates to an apparatus and a method for inspecting a sample. The apparatus includes a sample holder for holding the sample, at least the sample holder comprises a cooling system which is configured for cooling at least the sample, preferably to cryogenic temperatures; a charged particle exposure system includes an assembly for projecting a focused beam of primary charged particles onto the sample held by the sample holder; and a light optical microscope. The sample holder includes a sheet of a scintillator material, and the sample holder is configured to position the sample in between the charged particle optical column and the sheet of the scintillator material. The light optical microscope includes a detection system configured for acquiring an optical image of at least a part of the sheet of the scintillator material.

In order to improve a yield of light generated by a collision between secondary electrons and gas molecules, the invention provides a charged particle beam device including: a charged particle beam source configured to irradiate a sample with a charged particle beam; a sample chamber configured to hold the sample and a gas molecule; a positive electrode configured to form an electric field that accelerates a secondary electron emitted from the sample; a photodetector configured to detect light generated by a collision between the accelerated secondary electron and the gas molecule; and a light condensing unit disposed between the sample and the photodetector, having a light emitting space in which the light is generated, and configured to condense the light generated in the light emitting space on a photodetector side.

An object of the invention is to obtain an observation image in which a plurality of pieces of feature data of a sample are emphasized in a charged particle beam device that acquires an observation image of the sample by irradiating the sample with a charged particle beam and light. The charged particle beam device according to the invention calculates a sequence for modulating a light irradiation condition according to an irradiation condition of a charged particle beam, and controls the light irradiation condition according to the sequence (see FIG. 2).

The invention relates to an apparatus and a method for inspecting a sample. The apparatus includes a sample holder for holding the sample, at least the sample holder comprises a cooling system which is configured for cooling at least the sample, preferably to cryogenic temperatures; a charged particle exposure system includes an assembly for projecting a focused beam of primary charged particles onto the sample held by the sample holder; and a light optical microscope. The sample holder includes a sheet of a scintillator material, and the sample holder is configured to position the sample in between the charged particle optical column and the sheet of the scintillator material. The light optical microscope includes a detection system configured for acquiring an optical image of at least a part of the sheet of the scintillator material.