An adjusting mechanism for adjusting a deformation of a panel and an electron beam detection apparatus comprising the same are disclosed, the adjusting mechanism including: a support plate, which is provided opposite to the panel, with a periphery of the support plate being in positive fit with a periphery of the panel; and at least one screw set, each screw set comprising: at least one first screw, each first screw penetrating through the support plate, and in turn being connected to the panel by being screwed into the panel; and at least one second screw, each second screw being screwed to penetrate through the support plate and to abut against the panel; the support has its structural rigidity larger than a structural rigidity of the panel.

An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns, each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system configured to move one or more of the electron beam columns relative to another one or more of the electron beam columns, the actuator system including a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

The present disclosure relates to an electron microscope having a deep learning module in which electron microscopy images and control parameters are used as training input information of the deep learning model, and the deep learning model trained using focus, contrast and brightness among the control parameters as targets of the deep learning model generates a command for optimal target it is possible to automatically provide a sample image with high quality based on data trained based on artificial intelligence without any manual manipulation of control parameter values, thereby allowing beginners as well as people with advanced skills to easily use the electron microscope, which contributes to thriving electron microscope market.

Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

To shorten a time required for evaluation of a recipe while suppressing an increase in a data amount. A charged particle beam device includes a microscope that scans a charged particle beam on a sample, detects secondary particles emitted from the sample, and outputs a detection signal and a computer system that generates a frame image based on the detection signal and processes an image based on the frame images. The computer system calculates a moment image between a plurality of the frame images, and calculates a feature amount data of the frame image based on a moment.

The disclosure relates to a method of determining an energy width of a charged particle beam, comprising the steps of providing a charged particle beam, directing said beam towards a specimen, and forming an energy-dispersed beam from a flux of charged particles transmitted through the specimen. As defined herein, the method comprises the steps of providing a slit element in a slit plane, and using said slit element for blocking a part of said energy-dispersed beam, as well as the step of modifying said energy-dispersed beam at the location of said slit plane in such a way that said energy dispersed beam is partially blocked at said slit element. The unblocked part of said energy-dispersed beam is imaged and an intensity gradient of said imaged energy-dispersed beam is determined, with which the energy width of the charged particle beam can be determined.

The present invention discloses an imaging method and an apparatus for direct electron detection cameras and a computer device, and relates to the technical field of electron microscope cameras. The present invention is mainly capable of improving the signal-to-noise ratio (SNR) of an image so as to improve the detective quantum efficiency of electron. The method includes the steps of classifying clusters in an original image to obtain low SNR clusters and high SNR clusters; performing three-dimensional reconstruction by using the images corresponding to the low SNR clusters and the high SNR clusters, respectively, to obtain three-dimensional models corresponding to the low SNR clusters and the high SNR clusters, respectively; performing filtering on the image corresponding to the low SNR clusters by using the filtering function, and superimposing the image to obtain m output image corresponding to the vitrified sample.

Methods and systems for performing a hybrid machine learning method for enhancing scanning electron microscopy (SEM) images are disclosed herein. Methods include the steps of acquiring a plurality of images of a region of a sample that were each generated by irradiating the sample with a pulsed charged particle beam, upscaling each of the individual images to generate a plurality of upscaled images of the region of the sample, and combining the plurality of upscaled images to form a noise reduced image of the region of the sample.

Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

The present disclosure is related to a Schottky thermal field (TFE) source for emitting an electron beam. Electron optics can adjust a shape of the electron beam before the electron beam impacts a scintillator screen. Thereafter, the scintillator screen generates an emission image in the form of light. An emission image can be adjusted and captured by a camera sensor in a camera at a desired magnification to create a final image of the Schottky TFE source's tip. The final image can be displayed and analyzed to for defects.