This disclosure relates to a plasma generator including a porous ceramic dielectric. More specifically, this disclosure relates to a plasma generator for air purification capable of effectively generating ozone for removing bacteria, viruses, etc., and minimizing pressure loss while increasing air purification capacity by including a porous ceramic dielectric coated with an antibacterial material.

In the present invention, a high-voltage side electrode component further includes a conductive film disposed on an upper surface of a dielectric electrode independently of a metal electrode. The conductive film is disposed between at least one gas ejection port and the metal electrode in plan view, and the conductive film is set to ground potential.

Some embodiments include a pulsing power supply comprising a power supply and a transformer comprising: a transformer core; a primary winding wrapped around a portion of the transformer core, the primary winding having a first lead and a second lead; and a secondary winding wrapped around a portion of the transformer core. The pulsing power supply may also include a first switch electrically connected with the first lead of the primary winding and the power supply; and a second switch electrically connected with the second lead of the primary winding and the power supply, wherein the first switch and the second switch are opened and closed at different time intervals. The pulsing power supply may also include a pulsing output electrically coupled with the secondary winding of the transformer that outputs pulses having a voltage greater than about 2 kV and with pulse frequencies greater than 1 kHz.

A dielectric barrier plasma generator includes: a dielectric substrate, a high-voltage electrode provided on a first surface of the dielectric substrate, a low-voltage electrode provided to face a second surface of the dielectric substrate, a power introduction section provided at a first end of the high-voltage electrode, a gas channel formed from a first end to a second end thereof between the dielectric substrate and the low-voltage electrode to allow gas to flow from the first end of the gas channel to the second end thereof, and a blowout outlet formed at the second end of the gas channel to blow out the gas that has flown through the gas channel and plasma that has been generated in the gas channel. The dielectric substrate includes a portion having a thickness being thinner when being closer to the blowout outlet.

An active gas generation apparatus according to the present disclosure includes: a base flange having a central bottom surface region and a peripheral protruding part; a cooling plate provided on the peripheral protruding part of the base flange; an insulating plate provided between the cooling plate and the high voltage apply electrode part; and an electrode holding member provided on a lower surface of the cooling plate to support the high voltage apply electrode part from a lower side. Provided is a gas separation structure of separating a gas flow between an in-housing space and a discharge space by the cooling plate, the electrode holding member, and the high voltage apply electrode part.

A liquid treatment apparatus includes a water pump and a plasma jet generating device. A liquid inlet of the water pump is immersed in a liquid. A liquid outlet of the water pump is configured to eject the liquid from the liquid inlet out of the water pump without artificial bubbles in the liquid. A gas inlet of the plasma jet generating device is configured to be located out of the liquid. A pair of electrodes of the plasma jet generating device is configured to generate plasma jet by the gas from the gas inlet. The plasma jet outlet is configured to be immersed in the liquid and in proximity to the liquid outlet of the water pump so that the gas is automatically entrained into the gas inlet of the plasma jet generating device when the liquid is ejected out from the liquid outlet.

A plasma source (100), comprises an outer face (10) with an aperture (14) for delivering a plasma from the aperture. A transport mechanism is configured to transport a substrate (11) and the plasma source relative to each other parallel to the outer face, with a substrate surface to be processed in parallel with at least a part of the outer face that contains the aperture. First (4-1) and second tile (4-2) are arranged within a first plane of a working electrode (22) with neighbouring edges (12) bordering a first plasma collection space (6-1) and a third tile (4-3) is arranged in a second plane of the working electrode parallel to the first plane such that the third tile overlaps neighbouring edges in the first plane. At least one of the working and counter electrodes comprises a local modification (13,15) near said neighbouring edges to increase a plasma delivery to the aperture compensating for loss of plasma collection due to the neighbouring edges.

An atmospheric pressure plasma processing apparatus and method employing argon as a plasma gas in the absence of helium, including nanosecond pulse-powered electrodes having planar surfaces, and grounded electrodes having planar surfaces parallel to the surfaces of the powered electrodes and spaced-apart a chosen distance therefrom, forming plasma regions, are described. The absence of helium from the plasma discharge has been found not to affect the quality of the resulting plasma-polymerized coatings of the processed substrates.

Some embodiments include a high voltage, high frequency switching circuit. The switching circuit may include a high voltage switching power supply that produces pulses having a voltage greater than 1 kV and with frequencies greater than 10 kHz and an output. The switching circuit may also include a resistive output stage electrically coupled in parallel with the output and between the output stage and the high voltage switching power supply, the resistive output stage comprising at least one resistor that discharges a load coupled with the output. In some embodiments, the resistive output stage may be configured to discharge over about 1 kilowatt of average power during each pulse cycle. In some embodiments, the output can produce a high voltage pulse having a voltage greater than 1 kV and with frequencies greater than 10 kHz with a pulse fall time less than about 400 ns.

An electric discharge generator and power supply device of electric discharge generator includes a radical gas generation apparatus, a process chamber apparatus, and an n-phase inverter power supply device. The radical gas generation apparatus is located adjacent to the process chamber apparatus. The radical gas generation apparatus includes a plurality of (n) discharge cells. The n-phase inverter power supply device includes a power supply circuit configuration offering a means to control output of n-phase alternating current voltages and variably controls, according to positions of the plurality of discharge cells, the alternating current voltages of different phases.