Provided is an apparatus and a method for coating objects and in particular containers with at least one first and one second coating station, wherein these coating stations each have at least one first coating electrode and one second coating electrode, and with a supply device for electrical supply of in each case at least one of the coating electrodes. The supply device has a high-frequency generator device for generating an a.c. voltage and/or voltage pulses as well as an a.c. voltage distribution device which distributes this a.c. voltage and/or the voltage pulses respectively to in each case at least one electrode of the first coating station and at least one electrode of the second coating station, wherein the a.c. voltage distribution device is suitable and intended for distributing the a.c. voltages and/or the voltage pulses with a time delay to the electrodes.

A method of coating an interior surface of a housing defining a volume includes partitioning the volume into a first zone and a second zone, the first zone isolated from fluid communication with the second zone; introducing one or more reactant gases, plasma, ions, or a combination thereof to the first zone and the second zone; and forming one or more coating layers on all or a portion of the interior surface within the first and second zones via reaction of the reactant gases, the plasma, or the combination thereof. A device for coating an interior surface of a housing is also provided.

A device for coating an interior surface of a housing defining a volume comprising a plurality of reactant gas sources including reactant gases for one or more surface coating processes; first and second closures to sealingly engage with an inlet and outlet of the volume of the housing to provide an enclosed volume; a delivery line fluidically coupled to the first closure and the plurality of reactant gas sources to deliver the reactant gases to the enclosed volume; and an output line fluidically coupled to the second closure to remove one or more reactant gases, byproduct gases, or both from the enclosed volume. A method for coating an interior surface of a housing is also provided.

A film formation method is provided with a step for disposing a non-electroconductive long thin tube 102 in a chamber 101 in which the internal pressure thereof is adjustable, generating a plasma inside the long thin tube 102 in a state in which a starting material gas including a hydrocarbon is supplied, and forming a diamond-like carbon film on an inner wall surface of the long thin tube 102. The long thin tube 102 is disposed in the chamber 101 in a state in which a discharge electrode 125 is disposed in one end part of the long thin tube 102 and the other end part is open. An alternating-current bias is intermittently applied between the discharge electrode 125 and a counter electrode 126 provided so as to be separated from the long thin tube 102.

A radial magnetron system for plasma surface modification and deposition of high-quality coatings for multi-dimensional structures is described. The system includes an axial electrode, a target material disposed on a portion of the axial electrode, an applied potential from an external electrical power source, and a high-current contact attached to the axial electrode for the applied potential. The system further includes a primary permanent magnet assembly comprising individual magnetic material elements configured to produce a target-region magnetic field for generating a Hall-effect dense plasma region under application of the applied potential to the axial electrode, and a magnet substrate that supports the primary permanent magnet assembly within the axial electrode. The magnet substrate is configured to provide a passageway for cooling the primary permanent magnet assembly and the axial electrode.

The invention concerns a method for treating in an enclosure an inner surface of a container made from polymer material, in order to deposit a barrier-effect coating there, comprising: inserting the container into the enclosure introducing a so-called precursor gas intended into the container intended, once transformed into the plasma state, to be deposited at least partially on the inner surface of the container in order to constitute the coating, the method further comprising: transforming the precursor gas into the plasma state by a combination of excitations comprising a main excitation by means of electromagnetic waves of the microwave type, and a secondary excitation by means of an electrical discharge of alternating voltage having a frequency between 1 kHz and 15 MHz. The invention also relates to a device for implementing the method of the invention.

A plasma processing system is described. The system may include a showerhead. The system may further include a first RF generator in electrical communication with the showerhead. The first RF generator may be configured to deliver a first voltage at a first frequency to the showerhead. Additionally, the system may include a second RF generator in electrical communication with a pedestal. The second RF generator may be configured to deliver a second voltage at a second frequency to the pedestal. The second frequency may be less than the first frequency. The system may also include a terminator in electrical communication with the showerhead. The terminator may provide a path to ground for the second voltage. Methods of depositing material using the plasma processing system are described. A method of seasoning a chamber by depositing silicon oxide and silicon nitride on the wall of the chamber is also described.

The invention provides an apparatus for treating surfaces of a container. The apparatus comprises an openable reaction chamber housing, an exhaust escapement and an electrode assembly. The electrode assembly comprises a probe assembly coupled with a power source, the probe assembly comprising an elongate wand body, and a helically configured primary electrode and a helically configured counter electrode disposed about an outer circumferential surface of the wand body in an alternating helical configuration. The elongate wand body has a fluid passageway defined therewithin, and one or more outlet openings that are formed on an outer circumferential surface of the wand body and that extend inward through said outer circumferential surface and upto the fluid passageway. One or both of the primary electrode and the counter electrode may be energizable by the power source.

The present invention resides in the unifying idea of synchronizing a positive voltage pulse supplied to an electrically conductive or ferromagnetic tube and a exciting negative voltage pulse on a hollow cathode induced on the background of a high-frequency capacitive discharge.

In one embodiment, the invention relates to a method of generating low-temperature plasma in a vacuum chamber comprising a hollow cathode and an electrode, the method comprising the step of igniting the pulsed DC discharge in the hollow cathode wherein the positive voltage pulse at least partially overlaps with the negative voltage pulse, and the positive voltage pulse at least partially overlaps with the negative voltage pulse on the hollow cathode.

In another embodiment, the present invention relates to a method of coating the inner walls of hollow tubes which utilizes the above-mentioned low-temperature plasma generation process.

In another embodiment, the invention relates to a low-temperature plasma generating device comprising a hollow cathode located in the vacuum chamber, a RF plasma source, a pulse DC burst source, and a bipolar pulse source.

In another embodiment, an object of the invention is an apparatus adapted to coat the inner sides of hollow tubes comprising a low-temperature plasma generating device.

A wafer has a substrate and a functional layer disposed on the substrate along a plurality of projected dicing lines. A method of processing the wafer includes applying a laser beam to the wafer along the projected dicing lines to remove portions of the functional layer, forming processed grooves in the functional layer through which the substrate is exposed, removing damaged regions produced in an interface between the substrate and the functional layer by the laser beam, and forming recesses extending outwardly from side surfaces of the processed grooves, a recess exposing step of removing portions of the functional layer that overhang the recesses, thereby exposing the recesses, and processing the substrate along the projected dicing line after the recess exposing step has been carried out.