The disclosure includes an outer electrode and an inner electrode. The outer electrode defines an inner volume and is configured to receive injected electrons through at least one aperture. The inner electrode positioned in the inner volume. The outer electrode and inner electrode are configured to confine the received electrons in orbits around the inner electrode in response to an electric potential between the outer electrode and the inner electrode. The apparatus does not include a component configured to generate an electron-confining magnetic field.

In a vacuum apparatus including an ultrahigh vacuum evacuation pump, the ultrahigh vacuum evacuation pump is provided with a rod-shaped cathode including a non-evaporable getter alloy, a cylindrical anode disposed so as to surround the cathode, and a coil or a ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode. As a result, it is possible to reduce the size and weight of the ultrahigh vacuum evacuation pump and to dispose the vacuum evacuation pump at a desired location in the vacuum apparatus.

In a vacuum apparatus including an ultrahigh vacuum evacuation pump, the ultrahigh vacuum evacuation pump is provided with a rod-shaped cathode including a non-evaporable getter alloy, a cylindrical anode disposed so as to surround the cathode, and a coil or a ring-shaped permanent magnet disposed so as to sandwich upper and lower openings of the cylindrical anode and surround the rod-shaped cathode. As a result, it is possible to reduce the size and weight of the ultrahigh vacuum evacuation pump and to dispose the vacuum evacuation pump at a desired location in the vacuum apparatus.

An ion pump with a housing enclosing an interior, a gas inlet having a through-hole extending into the interior of the ion pump, at least one cathode, at least one anode positioned in proximity to the at least one cathode, a magnet disposed on an opposite side of the at least one cathode from the anode, and a blocking shield disposed between the gas inlet and the at least one cathode. The blocking shield is electrically connected to the at least one anode. An associated method installs the blocking shield by inserting components of the blocking shield assembly through the gas inlet, and assembling (inside the interior of the ion pump) the inserted components to form the blocking shield.

A vacuum pump includes a liquid getter that is sprayed into a pump chamber. The sprayed liquid getter can chemically bind with gaseous substance in the pump chamber to create ultra-low pressure in the pump chamber and an attached vacuum chamber. The liquefied getter can be circulated and recycled in the vacuum pump.

A vacuum pump includes a liquid getter that is sprayed into a pump chamber. The sprayed liquid getter can chemically bind with gaseous substance in the pump chamber to create ultra-low pressure in the pump chamber and an attached vacuum chamber. The liquefied getter can be circulated and recycled in the vacuum pump.

Provided is an ultra-high vacuum forming device containing an ion pump having a compact size in the central axis direction. The ultra-high vacuum forming device (1) is provided with at least one ion pump (100). The ion pump (100) is provided with: a casing (110) having at least one opening (111, 112); a board-shaped electrode group (120) formed by means of a central opening (120a) being formed along a predetermined central axis (C) disposed within the casing (110), and a plurality of electrodes (121) being joined with spaces therebetween; a pair of board-shaped electrodes (131, 132) having a different polarity than that of the electrode group (120) and that are disposed at positions sandwiching both sides of the electrode group (120) within the casing (110); and a pair of board-shaped magnets (141, 142) disposed at positions sandwiching both sides of the pair of board-shaped electrodes (131, 132).

Provided is an ultra-high vacuum forming device containing an ion pump having a compact size in the central axis direction. The ultra-high vacuum forming device (1) is provided with at least one ion pump (100). The ion pump (100) is provided with: a casing (110) having at least one opening (111, 112); a board-shaped electrode group (120) formed by means of a central opening (120a) being formed along a predetermined central axis (C) disposed within the casing (110), and a plurality of electrodes (121) being joined with spaces therebetween; a pair of board-shaped electrodes (131, 132) having a different polarity than that of the electrode group (120) and that are disposed at positions sandwiching both sides of the electrode group (120) within the casing (110); and a pair of board-shaped magnets (141, 142) disposed at positions sandwiching both sides of the pair of board-shaped electrodes (131, 132).

An apparatus includes a first pump module, a second pump module and a sealing disc. The first pump module includes a first flange having a first opening, a second flange having a second opening and at least one first pump. The second pump module includes a third flange having a third opening, a fourth flange having a fourth opening, and at least one second pump. The sealing disc is positioned between and in sealing contact with the second flange and the third flange and has a disc opening with a cross-sectional area that is less than a cross-sectional area of the second opening in the second flange and that is less than a cross-sectional area of the third opening in the third flange, where the disc opening is aligned with the first, second, third and fourth openings.

The present invention relates to cathodes electrodes compositions suitable to provide a pumping mechanism which exhibits an extremely high pumping speed and capacity of noble gas suitable to be used in several vacuum devices as for example sputter ion vacuum pumping systems comprising them as active element.