An apparatus for plating NdFeB magnet includes a cathode and a target source holder defining a predetermined distance of 5 mm to 200 mm therebetween. A pulse bias power supply having a first positive terminal connected to an anode and a first negative terminal connected to the cathode. A DC bias power supply having a second positive terminal connected to the anode and a second negative terminal connected to the target source holder. The anode is connected to the earth ground. A method for plating the NdFeB magnet includes steps of maintaining the predetermined distance of 5 mm to 200 mm between the cleaned NdFeB magnet and the target source material, increasing a first electric potential to the cathode and a second electric potential to the target source holder with the second electric potential greater than the first electric potential, and maintaining a potential differential of 0V to 500V therebetween.

There is provided a glow discharge mass spectroscope having a higher analytical sensitivity by increasing an amount of extracted ion beams without a significant change in device construction and drive conditions of conventional glow discharge systems. An extraction plate 25 that is disposed at an ion extraction port of a discharge cell 20 and functions as an extraction electrode includes a first plate 26 that has a projection 26a projected toward a discharge region 27 in an opening 25a and that is disposed on the discharge region 27 side, and a second plate 28 that is connected to the first plate 26 in an outer circumferential edge and that is disposed with a gap provided between the first plate 26 and the second plate 28.

To correct spectral interference due to a divalent ion of an interfering element on a measurement ion of an analysis element measured by a mass spectrometer using a plasma ion source by accounting for a mass-bias effect of the mass spectrometer, measurement values of ionic strength of divalent ions of two isotopes having different, odd mass numbers among isotopes of the interfering element are used. In measuring to obtain a measurement value where a correction method of the present invention is applied, it is suitable to set a mass resolution of the mass spectrometer to be higher than a time of normal analysis.

To correct spectral interference due to a divalent ion of an interfering element on a measurement ion of an analysis element measured by a mass spectrometer using a plasma ion source by accounting for a mass-bias effect of the mass spectrometer, measurement values of ionic strength of divalent ions of two isotopes having different, odd mass numbers among isotopes of the interfering element are used. In measuring to obtain a measurement value where a correction method of the present invention is applied, it is suitable to set a mass resolution of the mass spectrometer to be higher than a time of normal analysis.

An apparatus and a method for preparing glow discharge sputtering samples for materials microscopic characterization are provided. The apparatus includes a glow discharge sputtering unit, a glow discharge power supply, a gas circuit automatic control unit, a spectrometer, and a computer. The structure of the glow discharge sputtering unit is optimized to be more suitable for sample preparation by simulation. By adding a magnetic field to the glow discharge plasma, uniform sample sputtering is realized within a large size range of the sample surface. The spectrometer monitors multi-element signal in a depth direction of the sample sputtering, so that precise preparation of different layer microstructures is realized. In conjunction with the acquisition of the sample position marks and the precise spatial coordinates (x, y, z) information, the correspondence between the surface space coordinates and the microstructure of the sample is conveniently realized.

An apparatus and a method for preparing glow discharge sputtering samples for materials microscopic characterization are provided. The apparatus includes a glow discharge sputtering unit, a glow discharge power supply, a gas circuit automatic control unit, a spectrometer, and a computer. The structure of the glow discharge sputtering unit is optimized to be more suitable for sample preparation by simulation. By adding a magnetic field to the glow discharge plasma, uniform sample sputtering is realized within a large size range of the sample surface. The spectrometer monitors multi-element signal in a depth direction of the sample sputtering, so that precise preparation of different layer microstructures is realized. In conjunction with the acquisition of the sample position marks and the precise spatial coordinates (x, y, z) information, the correspondence between the surface space coordinates and the microstructure of the sample is conveniently realized.

A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.

A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.

An ionization device includes: a plasma generating device for generating metastable particles and/or ions of an ionization gas in a primary plasma region; a field generating device for generating a glow discharge in a secondary plasma region; an inlet for supplying a gas to be ionized into the secondary plasma region; and a further inlet for supplying the metastable particles and/or the ions of the ionization gas into the secondary plasma region. A mass spectrometer includes such an ionization device and a detector downstream of the outlet of the ionization device for the mass-spectrometric analysis of the ionized gas.

An ionization device includes: a plasma generating device for generating metastable particles and/or ions of an ionization gas in a primary plasma region; a field generating device for generating a glow discharge in a secondary plasma region; an inlet for supplying a gas to be ionized into the secondary plasma region; and a further inlet for supplying the metastable particles and/or the ions of the ionization gas into the secondary plasma region. A mass spectrometer includes such an ionization device and a detector downstream of the outlet of the ionization device for the mass-spectrometric analysis of the ionized gas.