A time-of-flight mass spectrometer assembly includes a flange with a vacuum chamber facing surface and an environment facing surface. The flange defines an opening that extends between the vacuum chamber facing surface and the environment facing surface. A plurality of stacked components are supported by the vacuum chamber facing surface of the flange. A secondary flange is removably secured within the opening of the flange. The secondary flange includes a vacuum chamber facing surface and an environment facing surface. A supported spectrometer component is supported by the vacuum chamber facing surface of the secondary flange such that removal of the secondary flange from the flange acts to remove the supported component from the plurality of stacked components supported by the vacuum chamber facing surface of the flange.

A time-of-flight mass spectrometer assembly includes a flange with a vacuum chamber facing surface and an environment facing surface. The flange defines an opening that extends between the vacuum chamber facing surface and the environment facing surface. A plurality of stacked components are supported by the vacuum chamber facing surface of the flange. A secondary flange is removably secured within the opening of the flange. The secondary flange includes a vacuum chamber facing surface and an environment facing surface. A supported spectrometer component is supported by the vacuum chamber facing surface of the secondary flange such that removal of the secondary flange from the flange acts to remove the supported component from the plurality of stacked components supported by the vacuum chamber facing surface of the flange.

A method of milling a sample that includes a first layer formed over a second layer, where the first and second layers are different materials, the method comprising: milling the region of the sample by scanning a focused ion beam over the region a plurality of iterations in which, for each iteration, the focused ion beam removes material from the sample generating byproducts from the milled region; detecting, during the milling, the partial pressures of one or more byproducts with a residual gas analyzer positioned to have a direct line of sight to the milled region; generating, in real-time, an output detection signal from the residual gas analyzer indicative of an amount of the one or more byproducts detected; and stopping the milling based on the output signal.

The present invention relates to a matrix-assisted laser desorption ionization mass spectrometry method and, specifically, a mass spectrometry method according to the present invention comprises the steps of: acquiring a mass spectrum of an analyte by performing matrix-assisted laser desorption ionization of the analyte, wherein a detection spectrum, which is the mass spectrum of the analyte, is acquired using each of two or more matrixes different from one another; and removing, from each detection spectrum, a peak of a corresponding matrix to obtain a matrix-removed spectrum, and then acquiring a corrected mass spectrum of the analyte on the basis of a matrix-removed spectrum for each of different matrixes.

The present invention relates to a matrix-assisted laser desorption ionization mass spectrometry method and, specifically, a mass spectrometry method according to the present invention comprises the steps of: acquiring a mass spectrum of an analyte by performing matrix-assisted laser desorption ionization of the analyte, wherein a detection spectrum, which is the mass spectrum of the analyte, is acquired using each of two or more matrixes different from one another; and removing, from each detection spectrum, a peak of a corresponding matrix to obtain a matrix-removed spectrum, and then acquiring a corrected mass spectrum of the analyte on the basis of a matrix-removed spectrum for each of different matrixes.

A secondary ion mass spectrometer comprising a primary ion beam device, and means for collecting, mass filtering and subsequently detecting secondary ions released from a sample due to the sample having been impacted by a plurality of primary ion beams. The secondary ion mass spectrometer is remarkable in that it uses a plurality of primary ion beams in parallel for scanning the surface of the sample.

A secondary ion mass spectrometer comprising a primary ion beam device, and means for collecting, mass filtering and subsequently detecting secondary ions released from a sample due to the sample having been impacted by a plurality of primary ion beams. The secondary ion mass spectrometer is remarkable in that it uses a plurality of primary ion beams in parallel for scanning the surface of the sample.

The present invention relates to an assembly comprising a vacuum chamber and a time-of-flight mass spectrometer wherein the time-of-flight mass spectrometer is contained within the vacuum chamber. The time-of-flight mass spectrometer comprising a first electrode and a second electrode, the second electrode being spaced apart from the first electrode at a distance defining a portion of an ion-flight path therebetween. The assembly further comprising a first support for supporting the first electrode, the first support arranged between an inner surface of the vacuum chamber and the first electrode. The first support is configured to permit relative movement between at least a portion of the inner surface of the vacuum chamber and the first electrode. The inner surface of the vacuum chamber and the first electrode are thermally coupled. The present invention also relates to a multi-reflection time-of-flight mass analyser. The present invention also relates to an apparatus for out-gassing to remove contaminants from surfaces within a vacuum chamber by heating and subsequently cooling the surfaces.

The present invention relates to an assembly comprising a vacuum chamber and a time-of-flight mass spectrometer wherein the time-of-flight mass spectrometer is contained within the vacuum chamber. The time-of-flight mass spectrometer comprising a first electrode and a second electrode, the second electrode being spaced apart from the first electrode at a distance defining a portion of an ion-flight path therebetween. The assembly further comprising a first support for supporting the first electrode, the first support arranged between an inner surface of the vacuum chamber and the first electrode. The first support is configured to permit relative movement between at least a portion of the inner surface of the vacuum chamber and the first electrode. The inner surface of the vacuum chamber and the first electrode are thermally coupled. The present invention also relates to a multi-reflection time-of-flight mass analyser. The present invention also relates to an apparatus for out-gassing to remove contaminants from surfaces within a vacuum chamber by heating and subsequently cooling the surfaces.

A method for assessing drug-resistant microorganism includes the following steps. A model establishing step is performed so as to obtain an antibiotic resistance assessing classifier. A test sample is provided. A sample pre-processing step is performed so as to obtain a processed sample. An analysis step is performed so as to obtain a target mass spectrum data. A spectrum pre-processing step is performed so as to obtain a normalized target mass spectrum data. A feature extraction step is performed so as to obtain a spectrum feature. An assessing step is performed, wherein the spectrum feature is analyzed by the antibiotic resistance assessing classifier so as to output an assessed result of drug-resistant microorganism, and the assessed result of drug-resistant microorganism is for assessing whether the test microorganism is a drug-resistant microorganism or not.